摘要:
A depression force of an accelerator pedal 2 is increased than a base depression force by a predetermined amount when an accelerator opening degree becomes a predetermined accelerator opening degree threshold value at which an engine speed necessary at a start of a vehicle can be obtained by a depression of the accelerator pedal 2 in a state where a clutch 102 is disengaged at the start of the vehicle. With this, at the start of the vehicle, a driver becomes easy to hold the accelerator pedal 2 in a constant accelerator opening degree at which the engine speed necessary at the start can be obtained. It is possible to smoothly engage the clutch 102, and then to attain the smooth start of the vehicle.
摘要:
When an accelerator opening exceeds an opening threshold value, a base pedaling force of an accelerator pedal is increased. An increment to a pedaling force is changed in accordance with the accelerator opening in a manner to make the pedaling force approach a characteristic that the pedaling force increases at a constant rate with respect to increase of the accelerator opening. For example, when a mechanism is employed which has a convex-up characteristic wherein the rate of increase of base pedaling force decreases as the accelerator opening increases, the increment is set to increase as the accelerator opening increases. Conversely, when a mechanism is employed which has a convex-down characteristic wherein the rate of base pedaling force increases as the accelerator opening increases, the increment is set to decrease as the accelerator opening increases.
摘要:
One embodiment of a process in accordance with our invention includes the step of forming a P type region on a semiconductor substrate. After the P type region is formed, an N type layer is epitaxially grown on the P type region. A Schottky gate is then formed on the N type epitaxial layer. A first portion of the epitaxial layer serves as a transistor source, a second portion of the epitaxial layer serves as the transistor drain, and a third portion of the epitaxial layer serves as the channel. Of importance, the P type semiconductor region helps prevent various short channel effects caused when current carriers flowing between the source and drain flow too far from the Schottky gate.
摘要:
A microwave field effect transistor (FET) comprises source, gate, and drain electrodes deposited on an epitaxial layer grown on a semi-insulating substrate. The FET has lowered thermal resistance, lowered source lead inductance, and lowered gate series resistance, together with concomitant performance improvements, through the use of a novel source electrode connection which comprises a deposited or plated through metallic contact extending from the bottom of the wafer, through a hole in the substrate and epitaxial layer, to the underside of the source or other electrode which is deposited on the top side of the epitaxial layer. The chip, comprising the substrate, epitaxial layer, and top electrodes, is mounted on a heat sink. The chip's underside, including the bottom surface of the plated through source contact, is conductively bonded to the top surface of the heat sink.
摘要:
A depression force of an accelerator pedal 2 is increased than a base depression force by a predetermined amount when an accelerator opening degree becomes a predetermined accelerator opening degree threshold value at which an engine speed necessary at a start of a vehicle can be obtained by a depression of the accelerator pedal 2 in a state where a clutch 102 is disengaged at the start of the vehicle. With this, at the start of the vehicle, a driver becomes easy to hold the accelerator pedal 2 in a constant accelerator opening degree at which the engine speed necessary at the start can be obtained. It is possible to smoothly engage the clutch 102, and then to attain the smooth start of the vehicle.
摘要:
When a depression force of an accelerator pedal is increased than a base depression force by a predetermined increase amount when an accelerator opening degree becomes greater than an accelerator opening degree threshold value, an overshoot control is performed so that a depression force increase command is once increased than a depression force increase target command value which increases the depression force of the accelerator pedal than the base depression force by the predetermined amount, and returned to the depression force increase target command value. In this overshoot control, an overshoot controlled variable of the overshoot control is set based on a magnitude of a hysteresis of the base depression force of the accelerator pedal.
摘要:
When the accelerator opening degree becomes equal to or smaller than an increase amount cancel threshold value (timing t2) while the depression force of an accelerator pedal 2 is increased than a base depression force by a predetermined increase amount of the depression force, the predetermined increase amount of the depression force is decreased at a predetermined rate, and moreover, when the accelerator opening degree becomes greater than a predetermined accelerator opening degree threshold value (timing t3) while the predetermined increase amount of the depression force is decreased, the depression force of the accelerator pedal 2 is increased with respect to the base depression force so that the increase amount of the depression force with respect to the base depression force becomes greater than the predetermined increase amount of the depression force.
摘要:
An accelerator reaction force control apparatus has an accelerator position detecting device that detects an accelerator position and a reaction force varying device that varies a reaction force of an accelerator. The reaction force varying device increases the accelerator's reaction force beyond a base reaction force in response to the accelerator position being equal to or larger than a reaction force increase threshold, and decreases the accelerator's reaction force toward the base reaction force in response to the accelerator position becoming equal to or smaller than a reaction force increase cancellation threshold after the reaction force has been increased beyond the base reaction force. The reaction force varying device varies a reaction force decrease rate at which the accelerator's reaction force is decreased based on an accelerator position change condition existing at a time when the accelerator position becomes equal to or smaller than the reaction force increase cancellation threshold.
摘要:
An accelerator reaction force control apparatus is provided with an accelerator position detecting device, a reaction force varying device and a threshold value setting device. The reaction force varying device varies a reaction force of the accelerator so as to increase a reaction force of the accelerator by a prescribed increase amount with respect to a base reaction force when the accelerator position is equal to or larger than an accelerator position threshold value. The reaction force varying device also varies a reaction force increase rate at a first increase rate during a first reaction force increase period of the increase of the reaction force, and at a second increase rate during a second reaction force increase period of the increase of the reaction force. The second increase rate is larger during the second reaction force increase period than during the first reaction force increase period.
摘要:
A protective coating useful as a passivation layer for semiconductor devices incorporates a thin film of an amorphous diamond-like carbon. In one implementation, a thin film of amorphous silicon is deposited over the carbon material. The semiconductive passivation coating eliminates electrical shorts, dissipates charge build-up and protects against chemical contamination.