Quantitative phase measurement apparatus
    1.
    发明授权
    Quantitative phase measurement apparatus 有权
    定量相位测量装置

    公开(公告)号:US09222765B2

    公开(公告)日:2015-12-29

    申请号:US14119173

    申请日:2011-12-22

    申请人: Kazuki Yamamoto

    发明人: Kazuki Yamamoto

    IPC分类号: G01B9/02 G02B21/14 G02B27/28

    摘要: Provided is a small-sized quantitative phase measurement apparatus. The quantitative phase measurement apparatus 1 includes a reflective polarization splitting element 17. The reflective polarization splitting element 17 is disposed at a focusing position of the converging light L4, and performs splitting of the converging light L4 into two polarized beams having different polarization directions and reflection of the two polarized beams to form a first polarized beam L5 and a second polarized beam L6 both travelling toward the converging optical system 16.

    摘要翻译: 提供了一种小尺寸的定量相位测量装置。 定量相位测量装置1包括反射偏振分束元件17.反射偏振分束元件17设置在会聚光L4的聚焦位置,并且将会聚光L4分割成具有不同偏振方向和反射的两个偏振光束 以形成朝向会聚光学系统16行进的第一偏振光束L5和第二偏振光束L6。

    Microanalysis measuring apparatus and microanalysis measuring method using the same
    2.
    发明授权
    Microanalysis measuring apparatus and microanalysis measuring method using the same 有权
    微量分析测量仪器及微量分析测量方法采用该方法

    公开(公告)号:US08058072B2

    公开(公告)日:2011-11-15

    申请号:US12445942

    申请日:2007-10-18

    摘要: This invention provides a measuring apparatus for microanalysis, which can be simply manufactured and can realize a number of analyses and measurements in a small analyte amount and particularly can analyze and measure a number of analytes having different concentrations and different analytes in a simultaneous and easy manner, and a measurement method of microanalysis using the apparatus. The measuring apparatus for microanalysis is characterized by comprising detection parts of m lines and n rows in communication with a micropassage for a waste solution, chambers of m lines and n rows in communication with the respective detection parts through a mixing flow passage, n first micropassages in communication with the respective line chambers through a passive valve, m second micropassages in communication with respective row chambers through a passive valve, and third micropassages in communication with the respective chambers for supplying gas and/or a washing solution.

    摘要翻译: 本发明提供了一种用于微量分析的测量装置,其可以简单地制造并且可以以小的分析物量实现多个分析和测量,并且特别可以以同时且容易的方式分析和测量具有不同浓度和不同分析物的多种分析物 ,以及使用该装置的微量分析的测定方法。 用于微量分析的测量装置的特征在于包括与用于废液的微型连接的m行和n行的检测部分,m行和n行的腔室通过混合流动通道与各个检测部分连通,n个第一微量 通过被动阀与相应的行室连通,m个与相应的行室通过被动阀连通的第二微量抽气器,以及与用于供应气体和/或洗涤溶液的各个室连通的第三微量抽气器。

    MICRO FLUID DEVICE
    3.
    发明申请
    MICRO FLUID DEVICE 有权
    微流体装置

    公开(公告)号:US20110044863A1

    公开(公告)日:2011-02-24

    申请号:US12921247

    申请日:2009-03-11

    IPC分类号: B01L3/00

    摘要: The present invention provides a microfluidic device with a micro-pump system in which the production process is simplified and the device is further downsized. A microfluidic device 1 has a gas generation portion 3. The gas generation portion 3 has a substrate 10 and a gas generation layer 20. The substrate 10 has a first main surface 10a and a second main surface 10b. The substrate 10 has a micro-channel 14 with an opening at least on the first main surface 10a. The gas generation layer 20 is disposed on the first main surface 10a of the substrate 10 so as to cover an opening 14a. The gas generation layer 20 generates gas by receiving an external stimulus.

    摘要翻译: 本发明提供了具有微型泵系统的微流体装置,其中生产过程被简化并且装置进一步小型化。 微流体装置1具有气体产生部3.气体生成部3具有基板10和气体生成层20.基板10具有第一主面10a和第二主面10b。 衬底10具有至少在第一主表面10a上具有开口的微通道14。 气体产生层20设置在基板10的第一主表面10a上以覆盖开口14a。 气体生成层20通过接收外部刺激而产生气体。

    MICROANALYSIS MEASURING APPARATUS AND MICROANALYSIS MEASURING METHOD USING THE SAME
    4.
    发明申请
    MICROANALYSIS MEASURING APPARATUS AND MICROANALYSIS MEASURING METHOD USING THE SAME 有权
    微分测量装置和使用其的微观测量方法

    公开(公告)号:US20100317538A1

    公开(公告)日:2010-12-16

    申请号:US12445942

    申请日:2007-10-18

    IPC分类号: C40B30/04 C40B40/00 C40B30/10

    摘要: This invention provides a measuring apparatus for microanalysis, which can be simply manufactured and can realize a number of analyses and measurements in a small analyte amount and particularly can analyze and measure a number of analytes having different concentrations and different analytes in a simultaneous and easy manner, and a measurement method of microanalysis using the apparatus. The measuring apparatus for microanalysis is characterized by comprising detection parts of m lines and n rows in communication with a micropassage for a waste solution, chambers of m lines and n rows in communication with the respective detection parts through a mixing flow passage, n first micropassages in communication with the respective line chambers through a passive valve, m second micropassages in communication with respective row chambers through a passive valve, and third micropassages in communication with the respective chambers for supplying gas and/or a washing solution.

    摘要翻译: 本发明提供了一种用于微量分析的测量装置,其可以简单地制造并且可以以小的分析物量实现多个分析和测量,并且特别可以以同时且容易的方式分析和测量具有不同浓度和不同分析物的多种分析物 ,以及使用该装置的微量分析的测定方法。 用于微量分析的测量装置的特征在于包括与用于废液的微型连接的m行和n行的检测部分,m行和n行的腔室通过混合流动通道与各个检测部分连通,n个第一微量 通过被动阀与相应的行室连通,m个与相应的行室通过被动阀连通的第二微量抽气器,以及与用于供应气体和/或洗涤溶液的各个室连通的第三微量抽气器。

    Wavefront-aberration measuring device and exposure apparatus including the device
    5.
    发明授权
    Wavefront-aberration measuring device and exposure apparatus including the device 失效
    波前像差测量装置和包括该装置的曝光装置

    公开(公告)号:US07623247B2

    公开(公告)日:2009-11-24

    申请号:US11418990

    申请日:2006-05-04

    申请人: Kazuki Yamamoto

    发明人: Kazuki Yamamoto

    IPC分类号: G01B11/02

    CPC分类号: G03F7/706

    摘要: A measuring device for measuring a wavefront aberration of an optical system includes a first mask for defining light that enters the optical system, and a second mask having first to fourth openings. The first opening transmits a component of the light passing through the optical system without removing information about the wavefront aberration of the optical system, and the second to fourth openings transmit components of the light passing through the optical system having the information about the wavefront aberration of the optical system removed.

    摘要翻译: 用于测量光学系统的波前像差的测量装置包括用于限定进入光学系统的光的第一掩模和具有第一至第四开口的第二掩模。 第一开口透射通过光学系统的光的分量,而不去除关于光学系统的波前像差的信息,并且第二至第四开口传输通过具有关于波前像差的信息的光学系统的光的分量 光学系统被去除。

    MEASUREMENT METHOD AND APPARATUS, EXPOSURE APPARATUS
    6.
    发明申请
    MEASUREMENT METHOD AND APPARATUS, EXPOSURE APPARATUS 失效
    测量方法和装置,曝光装置

    公开(公告)号:US20070229848A1

    公开(公告)日:2007-10-04

    申请号:US11695240

    申请日:2007-04-02

    申请人: Kazuki Yamamoto

    发明人: Kazuki Yamamoto

    IPC分类号: G01B9/02

    摘要: A measurement method for measuring a wavefront aberration of a target optical system using a measurement apparatus that measures the wavefront aberration of the target optical system by detecting an interference pattern includes the steps of measuring as a system parameter a shift from a design value of a value that defines a structure of the measurement apparatus and the target optical system, and measuring the wavefront aberration of the target optical system using the system parameter.

    摘要翻译: 使用通过检测干涉图案测量目标光学系统的波面像差的测量装置测量目标光学系统的波前像差的测量方法包括以下步骤:从系统参数测量从值的设计值 其定义了测量装置和目标光学系统的结构,并且使用系统参数测量目标光学系统的波前像差。

    Document information filing system
    7.
    发明授权
    Document information filing system 失效
    文件资料档案系统

    公开(公告)号:US4498107A

    公开(公告)日:1985-02-05

    申请号:US256253

    申请日:1981-04-21

    摘要: A document information filing system has a function of displaying a plurality of its operation modes such as "SEARCH", "RECORD", "DELETE" and "CHANGE" modes on a display device. When a given operation mode is selected by a keyboard, sequential guidance for the procedure of operation for the selected operation mode is displayed on the display device, whereby the operation of the selected operation mode can be executed by operating the keyboard in conformity to the display guidance.

    摘要翻译: 文档信息归档系统具有在显示装置上显示诸如“搜索”,“记录”,“删除”和“更改”模式的多种操作模式的功能。 当通过键盘选择给定的操作模式时,在显示装置上显示用于所选操作模式的操作过程的顺序引导,由此可以通过按照显示器操作键盘来执行所选择的操作模式的操作 指导。

    3D SHAPE MEASUREMENT APPARATUS
    9.
    发明申请
    3D SHAPE MEASUREMENT APPARATUS 审中-公开
    3D形状测量装置

    公开(公告)号:US20150130905A1

    公开(公告)日:2015-05-14

    申请号:US14382368

    申请日:2012-03-12

    申请人: Kazuki Yamamoto

    发明人: Kazuki Yamamoto

    摘要: Provided is a 3D shape measurement apparatus that can obtain a phase delay distribution image of an object to be measured from a single image and has simple optics. The 3D shape measurement apparatus 1 includes a coherent light source 10, a random phase modulation optical system 11, a mount 12, a Fourier transform optical system 13, an image pickup device 14, and an operation part 15. The random phase modulation optical system 11 two-dimensionally and randomly phase-modulates the coherent light to produce two-dimensionally and randomly phase-modulated flat light. The Fourier transform optical system 13 optically Fourier-transforms the light having passed through the object 16 to be measured to generate a light intensity distribution image. The image pickup device 14 takes the light intensity distribution image. The operation part 15 computes phase information on the object 16 to be measured from the taken light intensity distribution image. The operation part 15 further calculates a 3D shape of the object 16 to be measured from the phase information.

    摘要翻译: 提供一种能够从单个图像获得待测对象的相位延迟分布图像并具有简单的光学的3D形状测量装置。 3D形状测量装置1包括相干光源10,随机相位调制光学系统11,安装件12,傅立叶变换光学系统13,图像拾取装置14和操作部分15.随机相位调制光学系统 11二维和随机地相关调制相干光以产生二维和随机的相位调制平面光。 傅里叶变换光学系统13对已经通过待测物体16的光进行光学傅立叶变换,以产生光强分布图像。 图像拾取装置14获取光强分布图像。 操作部15从拍摄的光强分布图像中计算关于被测量物体16的相位信息。 操作部15进一步根据相位信息计算待测量物体16的3D形状。

    WAVEFRONT ABERRATION MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE
    10.
    发明申请
    WAVEFRONT ABERRATION MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE 有权
    WAVEFRONT ABERRATION MEASUREMENT设备,曝光设备及其制造方法

    公开(公告)号:US20100309448A1

    公开(公告)日:2010-12-09

    申请号:US12793873

    申请日:2010-06-04

    IPC分类号: G03B27/42 G01B9/02 G03F7/20

    摘要: A measurement apparatus, which measures a wavefront aberration of an optical system to be measured, comprises: a calculation unit configured to calculate the wavefront aberration based on an interference fringe generated by light which passed through the optical system to be measured; and a determination unit configured to calculate an evaluation value indicating a wavefront state based on the wavefront aberration calculated by the calculation unit, and determine the calculated wavefront aberration as the wavefront aberration of the optical system if the evaluation value falls within an allowable range.

    摘要翻译: 测量要测量的光学系统的波前像差的测量装置包括:计算单元,被配置为基于通过待测量的光学系统的光产生的干涉条纹来计算波前像差; 以及确定单元,被配置为基于由所述计算单元计算的所述波前像差来计算指示波前状态的评估值,并且如果所述评估值在允许范围内,则将所计算的波前像差确定为所述光学系统的波面像差。