摘要:
Provided is a small-sized quantitative phase measurement apparatus. The quantitative phase measurement apparatus 1 includes a reflective polarization splitting element 17. The reflective polarization splitting element 17 is disposed at a focusing position of the converging light L4, and performs splitting of the converging light L4 into two polarized beams having different polarization directions and reflection of the two polarized beams to form a first polarized beam L5 and a second polarized beam L6 both travelling toward the converging optical system 16.
摘要:
This invention provides a measuring apparatus for microanalysis, which can be simply manufactured and can realize a number of analyses and measurements in a small analyte amount and particularly can analyze and measure a number of analytes having different concentrations and different analytes in a simultaneous and easy manner, and a measurement method of microanalysis using the apparatus. The measuring apparatus for microanalysis is characterized by comprising detection parts of m lines and n rows in communication with a micropassage for a waste solution, chambers of m lines and n rows in communication with the respective detection parts through a mixing flow passage, n first micropassages in communication with the respective line chambers through a passive valve, m second micropassages in communication with respective row chambers through a passive valve, and third micropassages in communication with the respective chambers for supplying gas and/or a washing solution.
摘要:
The present invention provides a microfluidic device with a micro-pump system in which the production process is simplified and the device is further downsized. A microfluidic device 1 has a gas generation portion 3. The gas generation portion 3 has a substrate 10 and a gas generation layer 20. The substrate 10 has a first main surface 10a and a second main surface 10b. The substrate 10 has a micro-channel 14 with an opening at least on the first main surface 10a. The gas generation layer 20 is disposed on the first main surface 10a of the substrate 10 so as to cover an opening 14a. The gas generation layer 20 generates gas by receiving an external stimulus.
摘要:
This invention provides a measuring apparatus for microanalysis, which can be simply manufactured and can realize a number of analyses and measurements in a small analyte amount and particularly can analyze and measure a number of analytes having different concentrations and different analytes in a simultaneous and easy manner, and a measurement method of microanalysis using the apparatus. The measuring apparatus for microanalysis is characterized by comprising detection parts of m lines and n rows in communication with a micropassage for a waste solution, chambers of m lines and n rows in communication with the respective detection parts through a mixing flow passage, n first micropassages in communication with the respective line chambers through a passive valve, m second micropassages in communication with respective row chambers through a passive valve, and third micropassages in communication with the respective chambers for supplying gas and/or a washing solution.
摘要:
A measuring device for measuring a wavefront aberration of an optical system includes a first mask for defining light that enters the optical system, and a second mask having first to fourth openings. The first opening transmits a component of the light passing through the optical system without removing information about the wavefront aberration of the optical system, and the second to fourth openings transmit components of the light passing through the optical system having the information about the wavefront aberration of the optical system removed.
摘要:
A measurement method for measuring a wavefront aberration of a target optical system using a measurement apparatus that measures the wavefront aberration of the target optical system by detecting an interference pattern includes the steps of measuring as a system parameter a shift from a design value of a value that defines a structure of the measurement apparatus and the target optical system, and measuring the wavefront aberration of the target optical system using the system parameter.
摘要:
A document information filing system has a function of displaying a plurality of its operation modes such as "SEARCH", "RECORD", "DELETE" and "CHANGE" modes on a display device. When a given operation mode is selected by a keyboard, sequential guidance for the procedure of operation for the selected operation mode is displayed on the display device, whereby the operation of the selected operation mode can be executed by operating the keyboard in conformity to the display guidance.
摘要:
Provided is a nucleic acid amplification reactor that can easily perform a nucleic acid amplification reaction. A nucleic acid amplification reactor 1 includes a reaction chamber 20 to which a thermoplastic hydrogel 50 is applied. The thermoplastic hydrogel 50 contains a DNA polymerase, a set of oligonucleotide primers, a nucleotide, and a gelator.
摘要:
Provided is a 3D shape measurement apparatus that can obtain a phase delay distribution image of an object to be measured from a single image and has simple optics. The 3D shape measurement apparatus 1 includes a coherent light source 10, a random phase modulation optical system 11, a mount 12, a Fourier transform optical system 13, an image pickup device 14, and an operation part 15. The random phase modulation optical system 11 two-dimensionally and randomly phase-modulates the coherent light to produce two-dimensionally and randomly phase-modulated flat light. The Fourier transform optical system 13 optically Fourier-transforms the light having passed through the object 16 to be measured to generate a light intensity distribution image. The image pickup device 14 takes the light intensity distribution image. The operation part 15 computes phase information on the object 16 to be measured from the taken light intensity distribution image. The operation part 15 further calculates a 3D shape of the object 16 to be measured from the phase information.
摘要:
A measurement apparatus, which measures a wavefront aberration of an optical system to be measured, comprises: a calculation unit configured to calculate the wavefront aberration based on an interference fringe generated by light which passed through the optical system to be measured; and a determination unit configured to calculate an evaluation value indicating a wavefront state based on the wavefront aberration calculated by the calculation unit, and determine the calculated wavefront aberration as the wavefront aberration of the optical system if the evaluation value falls within an allowable range.