Invention Grant
US07623247B2 Wavefront-aberration measuring device and exposure apparatus including the device 失效
波前像差测量装置和包括该装置的曝光装置

Wavefront-aberration measuring device and exposure apparatus including the device
Abstract:
A measuring device for measuring a wavefront aberration of an optical system includes a first mask for defining light that enters the optical system, and a second mask having first to fourth openings. The first opening transmits a component of the light passing through the optical system without removing information about the wavefront aberration of the optical system, and the second to fourth openings transmit components of the light passing through the optical system having the information about the wavefront aberration of the optical system removed.
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