Invention Grant
- Patent Title: Wavefront-aberration measuring device and exposure apparatus including the device
- Patent Title (中): 波前像差测量装置和包括该装置的曝光装置
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Application No.: US11418990Application Date: 2006-05-04
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Publication No.: US07623247B2Publication Date: 2009-11-24
- Inventor: Kazuki Yamamoto
- Applicant: Kazuki Yamamoto
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. I.P. Division
- Priority: JP2005-143922 20050517
- Main IPC: G01B11/02
- IPC: G01B11/02

Abstract:
A measuring device for measuring a wavefront aberration of an optical system includes a first mask for defining light that enters the optical system, and a second mask having first to fourth openings. The first opening transmits a component of the light passing through the optical system without removing information about the wavefront aberration of the optical system, and the second to fourth openings transmit components of the light passing through the optical system having the information about the wavefront aberration of the optical system removed.
Public/Granted literature
- US20060262323A1 Wavefront-aberration measuring device and exposure apparatus including the device Public/Granted day:2006-11-23
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