公开(公告)号：US20080096359A1

公开(公告)日：2008-04-24

申请号：US11541373

申请日：2006-09-29

Applicant: Atul Gupta ,  Joseph C. Olson

Inventor： Atul Gupta ,  Joseph C. Olson

IPC: H01L21/66 ,  H01L21/336 ,  H01L21/425

CPC classification number: H01L22/14 ,  H01J37/1471 ,  H01J37/3171 ,  H01J2237/1501 ,  H01J2237/24528 ,  H01J2237/24535 ,  H01J2237/24578 ,  H01J2237/3045 ,  H01J2237/31703

Abstract: A method includes directing an ion beam at a plurality of differing incident angles with respect to a target surface of a substrate to implant ions into a plurality of portions of the substrate, wherein each one of the plurality of differing incident angles is associated with a different one of the plurality of portions, measuring angle sensitive data from each of the plurality of portions of the substrate, and determining an angle misalignment between the target surface and the ion beam incident on the target surface from the angle sensitive data. A method of determining a substrate miscut is also provided.

Abstract translation: 一种方法包括将离子束相对于衬底的目标表面以多个不同的入射角引导，以将离子注入到衬底的多个部分中，其中多个不同入射角中的每一个与不同的入射角相关联 多个部分中的一个，测量来自基板的多个部分中的每个部分的角度敏感数据，以及从角度敏感数据确定入射到目标表面上的目标表面和离子束之间的角度偏移。 还提供了确定衬底杂交的方法。

公开(公告)号：US20070235659A1

公开(公告)日：2007-10-11

申请号：US11689870

申请日：2007-03-22

Applicant: Asher Pearl

Inventor： Asher Pearl

IPC: G21K1/08

CPC classification number: H01J37/1471 ,  H01J37/153 ,  H01J37/22 ,  H01J37/263 ,  H01J37/265 ,  H01J37/304 ,  H01J2237/045 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/221

Abstract: The invention provides a method and apparatus for automatically aligning a beam of charged particles with an aperture. Thereby, a defocusing is introduced and a signal calculated based on an image shift is applied to a deflection unit. Further, a method for correction of astigmatism is provided. Thereby, the sharpness is evaluated for a set of frames generated whilst varying the signals to a stigmator.

Abstract translation: 本发明提供一种用于将带电粒子束自动对准孔的方法和装置。 由此，引入散焦，并将基于图像偏移计算的信号应用于偏转单元。 此外，提供了用于校正散光的方法。 因此，对于在将信号改变为标示符时产生的一组帧来评估清晰度。

公开(公告)号：US07271396B2

公开(公告)日：2007-09-18

申请号：US10492574

申请日：2002-10-04

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: H01J37/26

CPC classification number: H01J37/1471 ,  H01J37/153 ,  H01J37/22 ,  H01J37/263 ,  H01J37/265 ,  H01J37/304 ,  H01J2237/045 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/221

Abstract: The invention provides a method for automatically aligning a beam of charged particles with an aperture. Thereby, the beam is defelcted to two edges of the aperture. From the signals required to obtain an extinction, a correction deflection field is calculated. Furter, a method for automatically aligning a beam of charged particles with an optical axis is provided. Thereby a defocusing is introduced and a signal calculated based on an introduced image shift is applied to a deflection unit. Further, a method for correction of the astigmatism is provided. Thereby the sharpness is evaluated for a sequence of frames measured whilst varying the signals to a stigmator.

Abstract translation: 本发明提供一种用于将带电粒子束自动对准孔的方法。 由此，光束被消除到光圈的两个边缘。 根据获得消光所需的信号，计算校正偏转场。 Furter提供了一种用于将带电粒子束自动对准光轴的方法。 从而引入散焦，并将基于引入的图像偏移计算的信号应用于偏转单元。 此外，提供了用于校正像散的方法。 因此，对于在将信号改变为瞄准器的同时测量的帧序列来评估锐度。

公开(公告)号：US20070120065A1

公开(公告)日：2007-05-31

申请号：US11599611

申请日：2006-11-15

Applicant: Atsushi Takane ,  Satoru Yamaguchi ,  Mitsugu Sato

Inventor： Atsushi Takane ,  Satoru Yamaguchi ,  Mitsugu Sato

IPC: G01K1/08

CPC classification number: H01J37/1471 ,  H01J37/265 ,  H01J2237/1501 ,  H01J2237/216 ,  H01J2237/28

Abstract: A charged particle beam apparatus is provided which can prevent the accuracy of positional shift detection from being degraded owing to differences in picture quality, so that even when the state of a charged particle beam is changed at the time that optical conditions are changed or the optical axis changes with time, an auto adjustment of the optical axis can be realized easily and highly accurately. In the charged particle beam apparatus, evaluation or adjustment of focusing is conducted before the deflection condition of an alignment deflector for optical axis adjustment is changed or a table of focus adjustment amounts in correspondence with deflection conditions of the alignment deflector is provided, whereby when the deflection condition of the alignment deflector is changed, a focus adjustment is carried out in accordance with the table.

Abstract translation: 提供一种带电粒子束装置，其可以防止由于图像质量的差异而导致的位置偏移检测的精度降低，使得即使当光学条件改变时带电粒子束的状态改变或光学条件改变时， 轴随时间变化，可以容易且高精度地实现光轴的自动调节。 在带电粒子束装置中，在用于光轴调节的对准偏转器的偏转状态改变之前进行聚焦的评估或调整，或者提供与对准偏转器的偏转条件相对应的焦点调整量表， 改变对准偏转器的偏转状态，根据该表进行焦点调整。

公开(公告)号：US20060289781A1

公开(公告)日：2006-12-28

申请号：US11475014

申请日：2006-06-27

Applicant: Sayaka Tanimoto ,  Yasunari Sohda ,  Yasuhiro Someda ,  Masaki Hosoda

Inventor： Sayaka Tanimoto ,  Yasunari Sohda ,  Yasuhiro Someda ,  Masaki Hosoda

IPC: H01J3/14 ,  G21K1/08

CPC classification number: H01J37/304 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/3174 ,  H01J2237/0458 ,  H01J2237/1501 ,  H01J2237/31774 ,  H01J2237/31776

Abstract: In a charged particle beam applying apparatus such as an electron beams lithography system, there is a technology that facilitates positional adjustment of a crossover and improves throughput of the apparatus. A front focal plane of a condenser lens is provided with a sharp end face (crossover regulation edge) for regulating the height of the crossover on a beam axis. By using the crossover regulation edge to measure the shape of an electron beam, the shape of the beam on the front focal plane of the condenser lens can be always checked even if the height of the crossover formed by an electron gun or the resistance of a source forming lens is changed.

Abstract translation: 在诸如电子束光刻系统的带电粒子束施加装置中，存在促进交叉的位置调整并提高装置的生产量的技术。 聚光透镜的前焦平面设置有用于调节光束轴上的交叉点的高度的尖端（交叉调节边缘）。 通过使用交叉调节边缘来测量电子束的形状，即使电子枪形成的交叉点的高度或电子枪的电阻，也可以始终检查聚光透镜的前焦平面上的光束的形状 源形成透镜改变。

公开(公告)号：US07064339B2

公开(公告)日：2006-06-20

申请号：US10816467

申请日：2004-03-31

Applicant: Hiroshi Nishimura ,  Naoto Kihara ,  Kinya Kato ,  Toru Takagi ,  Akihiro Goto ,  Junji Ikeda ,  Kazuya Okamoto

Inventor： Hiroshi Nishimura ,  Naoto Kihara ,  Kinya Kato ,  Toru Takagi ,  Akihiro Goto ,  Junji Ikeda ,  Kazuya Okamoto

IPC: G01N21/00 ,  G21K7/00

CPC classification number: H01J37/26 ,  G01N23/225 ,  H01J37/1471 ,  H01J37/226 ,  H01J37/265 ,  H01J2237/0492 ,  H01J2237/057 ,  H01J2237/1501 ,  H01J2237/2482 ,  H01J2237/2538 ,  H01J2237/262 ,  H01J2237/2806 ,  H01J2237/2817 ,  H01J2237/282 ,  H01J2237/2823 ,  H01J2237/2826 ,  H01J2237/30438

Abstract: Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the E×B in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g., in the plane of the object surface) can be used that are optimized for the CPB-optical system and the off-axis optical system. Desirably, the image formed on the detector when electrical voltage and current are not applied to the E×B is in the same position as the image formed on the detector when electrical voltage and current are applied to the E×B. Also provided are “evaluation charts” for use in such alignments that do not require adjustment of the optical axis of the irradiation-optical system, and from which the kinetic-energy distribution of the emitted adjustment beam is stable.

Abstract translation: 公开了可以快速且准确地执行这种系统的带电粒子束（CPB）映射投影光学系统和调整方法。 在典型的系统中，照射光束从光源发出，通过照射光学系统，并进入维恩滤光片（“ExB”）。 当通过ExB时，照射光束通过物镜光学系统并且入射到物体表面上。 这种冲击产生观察光束，该观察光束经由成像光学系统通过物镜 - 光学系统和ExB以不同的方向返回到检测器。 调整光束源发射用于调整和对准例如物体表面的位置和/或ExB的维恩状态的调节光束。 调节光束可以相对于物镜光学系统偏轴。 对于这种调整和对准，可以使用为CPB光学系统和离轴光学系统优化的基准标记（例如位于物体表面的平面中）。 理想地，当电压和电流未施加到ExB时，在检测器上形成的图像与当将电压和电流施加到ExB时形成在检测器上的图像位于相同的位置。 还提供了用于这种对准的“评估图”，其不需要调整照射光学系统的光轴，并且发射的调节光束的动能分布从该对准是稳定的。

公开(公告)号：US20060097200A1

公开(公告)日：2006-05-11

申请号：US11304680

申请日：2005-12-16

Applicant: Mamoru Nakasuji ,  Takao Kato ,  Nobuharu Noji ,  Tohru Satake ,  Takeshi Murakami ,  Kenji Watanabe

Inventor： Mamoru Nakasuji ,  Takao Kato ,  Nobuharu Noji ,  Tohru Satake ,  Takeshi Murakami ,  Kenji Watanabe

IPC: G21G4/00

CPC classification number: H01J3/10 ,  B82Y10/00 ,  B82Y40/00 ,  G01N23/225 ,  H01J3/021 ,  H01J37/063 ,  H01J37/073 ,  H01J37/1471 ,  H01J37/1472 ,  H01J37/3174 ,  H01J2237/06316 ,  H01J2237/2817

Abstract: An electron beam apparatus, in which an electron beam emitted from an electron gun having a cathode and an anode is focused and irradiated onto a sample, and secondary electrons emanated from the sample are directed into a detector, the apparatus further comprising means for optimizing irradiation of the electron beam emitted from the electron gun onto the sample, the optimizing means may be two-stage deflectors disposed in proximity to the electron gun which deflects and directs the electron beam emitted in a specific direction so as to be in alignment with the optical axis direction of the electron beam apparatus, the electron beam emitted in the specific direction being at a certain angle with respect to the optical axis due to the fact that, among the crystal orientations of said cathode, a specific crystal orientation allowing a higher level of electron beam emission out of alignment with the optical axis direction.

公开(公告)号：US06870171B2

公开(公告)日：2005-03-22

申请号：US10806190

申请日：2004-03-23

Applicant: Masaki Hosoda ,  Masato Muraki ,  Hiroya Ohta ,  Haruo Yoda

Inventor： Masaki Hosoda ,  Masato Muraki ,  Hiroya Ohta ,  Haruo Yoda

IPC: G03F7/20 ,  H01J37/147 ,  H01J37/317 ,  H01L21/027 ,  H01J37/302 ,  H01J37/04 ,  H01J37/30

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/3177 ,  H01J2237/30455

Abstract: An electron beam exposure apparatus which exposes a wafer (118) by using a plurality of electron beams corrects the positional error of the electron beams by using multi-deflector arrays (105, 106) capable of independently deflecting the positions of the electron beams, and pattern data to be projected onto the wafer (118). More specifically, when each of the electron beams is deflected to a predetermined exposure position on the basis of the pattern data, a static positional error independent of the deflection position is corrected by the multi-deflector arrays (105, 106), and a dynamic positional error depending on the deflection position is corrected on the basis of the pattern data.

Abstract translation: 通过使用多个电子束使晶片（118）曝光的电子束曝光装置通过使用能够独立地偏转电子束的位置的多偏转阵列（105,106）来校正电子束的位置误差，以及 图案数据被投影到晶片（118）上。 更具体地说，当基于图案数据将每个电子束偏转到预定曝光位置时，通过多偏转器阵列（105,106）校正与偏转位置无关的静态位置误差，并且动态 基于图案数据来校正取决于偏转位置的位置误差。

公开(公告)号：US06838682B2

公开(公告)日：2005-01-04

申请号：US10634878

申请日：2003-08-06

Applicant: Yasunari Sohda ,  Osamu Kamimura ,  Hiroya Ohta ,  Susumu Gotoh

Inventor： Yasunari Sohda ,  Osamu Kamimura ,  Hiroya Ohta ,  Susumu Gotoh

IPC: G03F7/20 ,  G03F9/02 ,  H01J37/04 ,  H01J37/141 ,  H01J37/304 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

CPC classification number: H01J37/1471 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J37/3045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1501

Abstract: There is provided an electron beam exposure technique which permits optical adjustment in an electron optics system using a doublet lens necessary for large field projection.Electron beam exposure equipment having a part forming one image by at least two electromagnetic lenses, has means measuring the position of an electron beam near an image plane with changing excitation of at least two lenses at the same time; and control means feeding back the measured result to aligners or the intensity of the lenses.

Abstract translation: 提供了一种使用电子光学系统进行光学调节的电子束曝光技术，该系统使用大场投影所需的双重透镜。具有通过至少两个电磁透镜形成一个图像的部分的电子束曝光设备具有测量位置 同时改变至少两个透镜的激发的图像平面附近的电子束; 并且控制装置将测量结果反馈到对准器或透镜的强度。

公开(公告)号：US20040251428A1

公开(公告)日：2004-12-16

申请号：US10816467

申请日：2004-03-31

Applicant: Nikon Corporation.

Inventor： Hiroshi Nishimura ,  Naoto Kihara ,  Kinya Kato ,  Toru Takagi ,  Akihiro Goto ,  Junji Ikeda ,  Kazuya Okamoto

IPC: G21K007/00

CPC classification number: H01J37/26 ,  G01N23/225 ,  H01J37/1471 ,  H01J37/226 ,  H01J37/265 ,  H01J2237/0492 ,  H01J2237/057 ,  H01J2237/1501 ,  H01J2237/2482 ,  H01J2237/2538 ,  H01J2237/262 ,  H01J2237/2806 ,  H01J2237/2817 ,  H01J2237/282 ,  H01J2237/2823 ,  H01J2237/2826 ,  H01J2237/30438

Abstract: Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (nullEnullBnull). Upon passing through the EnullB, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the EnullB in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the EnullB. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g., in the plane of the object surface) can be used that are optimized for the CPB-optical system and the off-axis optical system. Desirably, the image formed on the detector when electrical voltage and current are not applied to the EnullB is in the same position as the image formed on the detector when electrical voltage and current are applied to the EnullB. Also provided are nullevaluation chartsnull for use in such alignments that do not require adjustment of the optical axis of the irradiation-optical system, and from which the kinetic-energy distribution of the emitted adjustment beam is stable.

Abstract translation: 公开了可以快速且准确地执行这种系统的带电粒子束（CPB）映射投影光学系统和调整方法。 在典型的系统中，照射光束从光源发出，通过照射光学系统，并进入维恩滤光片（“ExB”）。 当通过ExB时，照射光束通过物镜光学系统并且入射到物体表面上。 这种冲击产生观察光束，该观察光束经由成像光学系统通过物镜 - 光学系统和ExB以不同的方向返回到检测器。 调整光束源发射用于调整和对准例如物体表面的位置和/或ExB的维恩状态的调节光束。 调节光束可以相对于物镜光学系统偏轴。 对于这种调整和对准，可以使用为CPB光学系统和离轴光学系统优化的基准标记（例如位于物体表面的平面中）。 理想地，当电压和电流未施加到ExB时，在检测器上形成的图像与当将电压和电流施加到ExB时形成在检测器上的图像位于相同的位置。 还提供了用于这种对准的“评估图”，其不需要调整照射光学系统的光轴，并且发射的调节光束的动能分布从该对准是稳定的。