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    Semiconductor Light Emitting Device And Illuminating Device Using It
    1.
    发明申请
    Semiconductor Light Emitting Device And Illuminating Device Using It 有权
    半导体发光装置及照明装置

    公开(公告)号：US20090001409A1

    公开(公告)日：2009-01-01

    申请号：US11991418

    申请日：2006-09-04

    申请人： Takayoshi Takano ,  Yukihiro Kondo ,  Junji Ikeda ,  Hideki Hirayama

    发明人： Takayoshi Takano ,  Yukihiro Kondo ,  Junji Ikeda ,  Hideki Hirayama

    IPC分类号： H01L33/00

    CPC分类号： H01L33/12 ,  H01L33/06 ,  H01L33/22 ,  H01L33/32

    摘要： The semiconductor light emitting device of the present invention comprises an n-type nitride semiconductor layer 3 formed on one surface side of a single-crystal substrate 1 for epitaxial growth through a first buffer layer 2, an emission layer 5 formed on a surface side of the n-type nitride semiconductor layer 3, and a p-type nitride semiconductor layer 6 formed on a surface side of the emission layer 5. The emission layer 5 has an AlGaInN quantum well structure, and a second buffer layer 4 having the same composition as a barrier layer 5a of the emission layer 5 is provided between the n-type nitride semiconductor layer 3 and the emission layer 5. In the semiconductor light emitting device, it is possible to increase emission intensity of the ultraviolet radiation as compared with a conventional configuration while using AlGaInN as a material of the emission layer.

    摘要翻译： 本发明的半导体发光器件包括在单晶衬底1的一个表面侧上形成的用于通过第一缓冲层2进行外延生长的n型氮化物半导体层3，形成在第一缓冲层2的表面侧的发射层5 n型氮化物半导体层3和形成在发光层5的表面侧的p型氮化物半导体层6.发光层5具有AlGaInN量子阱结构和具有相同组成的第二缓冲层4 作为发光层5的阻挡层5a设置在n型氮化物半导体层3和发光层5之间。在半导体发光器件中，与常规的相比，可以增加紫外线辐射的发射强度 使用AlGaInN作为发光层的材料。

    Exclusive access controlling apparatus, exclusive access controlling method and recording medium recorded with exclusive access controlling program, for electronic information
    2.
    发明授权
    Exclusive access controlling apparatus, exclusive access controlling method and recording medium recorded with exclusive access controlling program, for electronic information 失效
    专用访问控制装置，独占访问控制方法以及记录有专用访问控制程序的记录介质，用于电子信息

    公开(公告)号：US07117492B2

    公开(公告)日：2006-10-03

    申请号：US09823755

    申请日：2001-04-03

    申请人： Junji Ikeda ,  Hiroyuki Akamatsu ,  Tsuyoshi Ebata ,  Nobuyuki Kanaya

    发明人： Junji Ikeda ,  Hiroyuki Akamatsu ,  Tsuyoshi Ebata ,  Nobuyuki Kanaya

    IPC分类号： G06F9/44 ,  G06F7/20

    CPC分类号： G07F7/082 ,  G06F9/44536 ,  G06F9/468 ,  G06Q20/341 ,  G06Q20/3576 ,  G07F7/1008 ,  Y10S707/99938

    摘要： An electronic information name of electronic information prepared by attaching a version number of the electronic information with a unique appellation of the electronic information is distributed to users of electronic information. Based on this electronic information name, accesses to the electronic information are conducted. There is further provided a table for holding the version number of the electronic information, and the version number held in the table is changed such as by a locking request, a locking release request for the electronic information. Upon an access request to the electronic information, the version number included in the electronic information name is compared with the version number held in the table, so as to judge whether or not the access to the electronic information is to be permitted, to thereby conduct an exclusive access control of the electronic information.

    摘要翻译： 通过将电子信息的唯一称呼的电子信息的版本号附加到电子信息的电子信息名称被分发给电子信息的用户。 基于该电子信息名称，进行对电子信息的访问。 还提供了用于保持电子信息的版本号的表，并且通过锁定请求，电子信息的锁定解除请求来改变保持在表中的版本号。 在对电子信息的访问请求时，将包括在电子信息名称中的版本号与表中保存的版本号进行比较，以判断是否允许访问电子信息，从而进行 电子信息的独占访问控制。

    Charged-particle-beam mapping projection-optical systems and methods for adjusting same
    3.
    发明授权
    Charged-particle-beam mapping projection-optical systems and methods for adjusting same 有权
    带电粒子束映射投影光学系统及其调整方法

    公开(公告)号：US07064339B2

    公开(公告)日：2006-06-20

    申请号：US10816467

    申请日：2004-03-31

    申请人： Hiroshi Nishimura ,  Naoto Kihara ,  Kinya Kato ,  Toru Takagi ,  Akihiro Goto ,  Junji Ikeda ,  Kazuya Okamoto

    发明人： Hiroshi Nishimura ,  Naoto Kihara ,  Kinya Kato ,  Toru Takagi ,  Akihiro Goto ,  Junji Ikeda ,  Kazuya Okamoto

    IPC分类号： G01N21/00 ,  G21K7/00

    CPC分类号： H01J37/26 ,  G01N23/225 ,  H01J37/1471 ,  H01J37/226 ,  H01J37/265 ,  H01J2237/0492 ,  H01J2237/057 ,  H01J2237/1501 ,  H01J2237/2482 ,  H01J2237/2538 ,  H01J2237/262 ,  H01J2237/2806 ,  H01J2237/2817 ,  H01J2237/282 ,  H01J2237/2823 ,  H01J2237/2826 ,  H01J2237/30438

    摘要： Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the E×B in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g., in the plane of the object surface) can be used that are optimized for the CPB-optical system and the off-axis optical system. Desirably, the image formed on the detector when electrical voltage and current are not applied to the E×B is in the same position as the image formed on the detector when electrical voltage and current are applied to the E×B. Also provided are “evaluation charts” for use in such alignments that do not require adjustment of the optical axis of the irradiation-optical system, and from which the kinetic-energy distribution of the emitted adjustment beam is stable.

    摘要翻译： 公开了可以快速且准确地执行这种系统的带电粒子束（CPB）映射投影光学系统和调整方法。 在典型的系统中，照射光束从光源发出，通过照射光学系统，并进入维恩滤光片（“ExB”）。 当通过ExB时，照射光束通过物镜光学系统并且入射到物体表面上。 这种冲击产生观察光束，该观察光束经由成像光学系统通过物镜 - 光学系统和ExB以不同的方向返回到检测器。 调整光束源发射用于调整和对准例如物体表面的位置和/或ExB的维恩状态的调节光束。 调节光束可以相对于物镜光学系统偏轴。 对于这种调整和对准，可以使用为CPB光学系统和离轴光学系统优化的基准标记（例如位于物体表面的平面中）。 理想地，当电压和电流未施加到ExB时，在检测器上形成的图像与当将电压和电流施加到ExB时形成在检测器上的图像位于相同的位置。 还提供了用于这种对准的“评估图”，其不需要调整照射光学系统的光轴，并且发射的调节光束的动能分布从该对准是稳定的。

    Assembly of chip parts
    6.
    发明授权
    Assembly of chip parts 失效
    芯片部件装配

    公开(公告)号：US5791484A

    公开(公告)日：1998-08-11

    申请号：US498767

    申请日：1995-07-06

    申请人： Junji Ikeda ,  Osamu Yamazaki ,  Youichi Nakamura ,  Yoshifumi Kitayama

    发明人： Junji Ikeda ,  Osamu Yamazaki ,  Youichi Nakamura ,  Yoshifumi Kitayama

    IPC分类号： H01L21/60 ,  B65D73/02 ,  H01G13/00 ,  H05K3/30 ,  H05K3/34 ,  H05K13/04

    CPC分类号： B65D73/02 ,  H05K3/3442 ,  H05K3/3478 ,  H05K3/3489 ,  H05K2201/10424 ,  H05K2201/10537 ,  H05K2201/10636 ,  H05K2201/10984 ,  H05K2203/0405 ,  H05K3/303 ,  Y02P70/611 ,  Y02P70/613 ,  Y10S206/813 ,  Y10S206/82

    摘要： By a manufacturing method including a process of supplying a connection-releasable connecting material (4) onto a surface of a plurality of chip parts (3) and a process of connecting the plurality of chip parts (3) by the connecting material (4), there is formed a chip assembly (1) comprised of the plurality of chip parts (3) connected with each other by means of the releasable connecting material (4). Further provided is a method of preparing the chip assembly (1), a process of releasing connection achieved by the connecting material (4) between a target chip part and an adjacent chip part, and a process of mounting the target chip part separated through releasing of the connection onto a board and soldering the same, thereby providing chip parts capable of easily coping with an increase of operation speed of chip parts on the process of mounting line, achieving an improved space efficiency, and suppressing waste of resources.

    摘要翻译： 通过一种制造方法，包括将连接可释放连接材料（4）供应到多个芯片部分（3）的表面上的过程和通过连接材料（4）连接多个芯片部分（3）的过程， 形成有由可释放的连接材料（4）彼此连接的多个芯片部分（3）组成的芯片组件（1）。 还提供了一种制备芯片组件（1）的方法，在目标芯片部分和相邻芯片部分之间释放通过连接材料（4）实现的连接的过程，以及通过释放分离安装目标芯片部分的过程 连接到电路板上并对其进行焊接，从而提供能够容易地应对在安装线路的工艺中芯片部件的运行速度的提高的芯片部件，实现提高的空间效率和抑制资源的浪费。

    System for detecting an optical information and scanning microscope system
    8.
    发明授权
    System for detecting an optical information and scanning microscope system 失效
    用于检测光学信息和扫描显微系统的系统

    公开(公告)号：US5617500A

    公开(公告)日：1997-04-01

    申请号：US443225

    申请日：1995-05-17

    申请人： Takashi Shionoya ,  Junji Ikeda

    发明人： Takashi Shionoya ,  Junji Ikeda

    IPC分类号： G02B21/00 ,  G02B6/10 ,  G11B7/00

    CPC分类号： G02B21/002

    摘要： This laser scanning microscope has a second light source for emitting second light into one of branch channel waveguides, and a third photodetector for detecting a light intensity distribution formed on the end face of the trunk channel waveguide based on the second light, and a controller for controlling the voltage to be applied from a voltage application unit to electrode on the waveguide in accordance with the output signal from the third photodetector.

    摘要翻译： 该激光扫描显微镜具有用于将第二光发射到分支通道波导中的一个的第二光源，以及用于基于第二光检测形成在主干道波导的端面上的光强度分布的第三光电检测器，以及用于 根据来自第三光电检测器的输出信号，控制从电压施加单元施加到波导上的电极的电压。

    Physical activity measuring system
    10.
    发明授权
    Physical activity measuring system 有权
    身体活动测量系统

    公开(公告)号：US07867141B2

    公开(公告)日：2011-01-11

    申请号：US11072403

    申请日：2005-03-07

    申请人： Yoshihiro Matsumura ,  Matsuki Yamamoto ,  Hideki Nakamura ,  Yasuko Yamamoto ,  Junji Ikeda ,  Masayuki Mitsui ,  Tadaharu Kitadou ,  Kazunori Kidera

    发明人： Yoshihiro Matsumura ,  Matsuki Yamamoto ,  Hideki Nakamura ,  Yasuko Yamamoto ,  Junji Ikeda ,  Masayuki Mitsui ,  Tadaharu Kitadou ,  Kazunori Kidera

    IPC分类号： A63B71/00 ,  G01C21/00

    CPC分类号： A63B71/06 ,  A61B5/1118 ,  A61B5/1123 ,  A61B5/221 ,  A61B5/4866 ,  A61B5/742 ,  A61B2562/0219 ,  A63B2220/803 ,  A63B2230/75

    摘要： A physical activity measuring system analyzes analyzing body motions of a user to accurately determine the exercise intensity. The system includes a portable device which is adapted to be carried by the user and is equipped with a body sensor and an indicator for indication of the exercise intensity. The body sensor senses the user's body motions to give corresponding motion strength. The portable device has a processor which constitutes an exercise calculator which has a predetermined relationship between a default standard deviation of the motion strength and an exercise intensity scale. The exercise intensity calculator collects a time series data of the motion strengths within a predetermined first time frame, obtains a standard deviation of thus collected motion strengths, and converting the standard deviation into an instant exercise intensity within the intensity scale in accordance with the predetermined relationship. The standard deviation with regard to the motion strengths can be well concordant with the exercise intensity, and therefore gives the accurate exercise intensity on a real-time basis.

    摘要翻译： 身体活动测量系统分析用户的身体运动，以准确地确定运动强度。 该系统包括便携式设备，其适于由用户携带并且配备有身体传感器和用于指示运动强度的指示器。 身体传感器感测使用者的身体运动以给出相应的运动强度。 便携式装置具有构成运动计算器的处理器，该运动计算器在运动强度的默认标准偏差和运动强度标度之间具有预定的关系。 运动强度计算器在预定的第一时间帧内收集运动强度的时间序列数据，获得如此收集的运动强度的标准偏差，并根据预定关系将标准偏差转换成强度量表内的即时运动强度 。 关于运动强度的标准偏差可以很好地与运动强度一致，因此可以实时准确地提供运动强度。