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71.发明公开公开(公告)号：US20240312758A1
公开(公告)日：2024-09-19
申请号：US18571186
申请日：2022-05-30
Inventor： Zheng FAN , Bruno LA FONTAINE , He Sheng LU , Gao Xing YIN , Shun ZHANG , Zhenfeng ZHAO
IPC: H01J37/24 , H01J37/065 , H01J37/28
CPC classification number: H01J37/243 , H01J37/065 , H01J37/28 , H01J2237/04735 , H01J2237/24535
Abstract: Apparatuses, systems, and methods for adjusting beam current using a feedback loop are provided. In some embodiments, a system may include a first anode aperture configured to measure a current of an emitted beam during inspection of a sample, wherein the first anode aperture is positioned in an environment that is configured to support a vacuum pressure of less than 3×10−10 torr and a controller including circuitry configured to cause the system to perform: generating a feedback signal when a difference between the measured current and a setpoint current exceeds a threshold value and adjusting a voltage of an extractor voltage supply based on the feedback signal during inspection of the sample such that a difference between an adjusted current of the emitted beam and the setpoint current is below the threshold value.
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72.发明公开公开(公告)号：US20240312756A1
公开(公告)日：2024-09-19
申请号：US18674282
申请日：2024-05-24
Applicant: ASML Netherlands B.V.
Inventor： Jasper Hendrik GRASMAN , Niels Johannes Maria BOSCH , Patrick Peter Hubert Helena PHILIPS , Peter Paul HEMPENIUS , Joan SANS MERCADER , Gerardus Wilhelmus SARS , Hans BUTLER , Willem Henk URBANUS
IPC: H01J37/20
CPC classification number: H01J37/20 , H01J2237/20235
Abstract: Disclosed herein is a platform for a charged particle apparatus, the platform comprising: a base frame; a chamber arranged to comprise a substrate; a metrology frame arranged to support a charged particle beam generator for irradiating a substrate in the chamber with a charged particle beam; and a bellow arranged between the metrology frame and the chamber; wherein: the chamber is rigidly connected to the base frame; the bellow comprises a flexible material such that the metrology frame is substantially isolated from any vibrations that are generated in the chamber; and the bellow is air tight so that a substantial vacuum may be established in the chamber.
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公开(公告)号：US12087541B2
公开(公告)日：2024-09-10
申请号：US17460381
申请日：2021-08-30
Applicant: ASML Netherlands B.V.
Inventor： Weiming Ren , Shuai Li , Xuedong Liu , Zhongwei Chen
IPC: H01J37/28 , H01J37/12 , H01J37/147
CPC classification number: H01J37/28 , H01J37/12 , H01J37/1472 , H01J37/1477 , H01J2237/04924 , H01J2237/083 , H01J2237/1205 , H01J2237/1516 , H01J2237/2817
Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
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74.发明授权公开(公告)号：US12086973B2
公开(公告)日：2024-09-10
申请号：US17608015
申请日：2020-04-02
Applicant: ASML Netherlands B.V.
Inventor： Teunis Willem Tukker , Arie Jeffrey Den Boef , Nitesh Pandey , Marinus Petrus Reijnders , Ferry Zijp
CPC classification number: G06T7/0004 , G01N21/4788 , G02B5/3083 , G02B27/283 , G02B27/4205 , G03F7/70616 , G03F7/706851 , G06T2207/10148 , G06T2207/30148
Abstract: Disclosed is a detection apparatus for simultaneous acquisition of multiple images of an object at a plurality of different focus levels; comprising: a modulator for obtaining multiple beam copies of an incoming beam; and a detector operable to capture said multiple beam copies, such that at two of said multiple beam copies are captured at different focus levels. Also disclosed is an inspection apparatus comprising such a detection system.
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公开(公告)号：US12085863B2
公开(公告)日：2024-09-10
申请号：US18138383
申请日：2023-04-24
Applicant: ASML NETHERLANDS B.V.
Inventor： Jiyou Fu
CPC classification number: G03F7/70625 , G06T7/001 , G06T2207/10061 , G06T2207/30148
Abstract: A method for determining stochastic edge placement error associated with a pattern. The method includes acquiring, via a metrology tool, a plurality of images of the pattern at a defined location on the substrate without performing a substrate alignment therebetween; and generating at least two data: (i) first data associated with the pattern using a first set of images of the plurality of images, and (ii) second data associated with the pattern using a second set of images of the plurality of images. The first set of images and the second set of images include at least one different image. The method further includes determining (e.g., via a decomposition algorithm), using the first data and the second data associated with the pattern at the defined location, the stochastic edge placement error associated with the pattern.
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Patent Agency Ranking
公开(公告)号：US12085862B2
公开(公告)日：2024-09-10
申请号：US17633643
申请日：2020-08-14
Applicant: ASML Netherlands B.V.
Inventor： Matthew Ryan Graham , Spencer Rich , Sean W. McGrogan
CPC classification number: G03F7/70266 , G03F7/70033 , H05G2/008
Abstract: Disclosed is an apparatus and a method in which off-droplet measurements instead of on-droplet measurements of prepulse energy are used for pulse energy control. Prepulse energy is measured during an off-droplet nonexposure period and controlled to a prepulse energy setpoint. The prepulse energy can then be controlled open-loop to the prepulse energy setpoint during on-droplet periods. This effectively decouples the EUV dose control loop from the prepulse energy control loop and avoids negative side effects of coupling such loops, for example, loss of the part of the dose adjustment range available to the dose controller.
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公开(公告)号：US12072620B2
公开(公告)日：2024-08-27
申请号：US17278356
申请日：2019-10-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Pieter-Jan Van Zwol , Sander Baltussen , Dennis De Graaf , Johannes Christiaan Leonardus Franken , Adrianus Johannes Maria Giesbers , Alexander Ludwig Klein , Johan Hendrik Klootwijk , Peter Simon Antonius Knapen , Evgenia Kurganova , Alexey Sergeevich Kuznetsov , Arnoud Willem Notenboom , Mahdiar Valefi , Marcus Adrianus Van de Kerkhof , Wilhelmus Theodorus Anthonius Johannes Van den Einden , Ties Wouter Van der Woord , Hendrikus Jan Wondergem , Aleksandar Nikolov Zdravkov
CPC classification number: G03F1/64 , G03F7/7015
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.
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公开(公告)号：US20240280909A1
公开(公告)日：2024-08-22
申请号：US18567931
申请日：2022-06-23
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/70266 , G02B26/0825 , G03F7/70233 , G03F7/70833
Abstract: A deformable mirror system (300, 400, 500), comprising a monolithic support structure (310, 410, 510), comprising a first side (311) configured to receive a mirror (350, 450, 550); and a second side (312) configured to receive a plurality of actuators (460, 560) such that the actuators are positioned to enable selective deformation of a reflective surface (351, 451, 551) of the mirror.
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公开(公告)号：US20240280517A1
公开(公告)日：2024-08-22
申请号：US18569504
申请日：2022-06-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Albertus Victor Gerardus MANGNUS
IPC: G01N23/2206 , G01N23/203 , G01N23/2251
CPC classification number: G01N23/2206 , G01N23/203 , G01N23/2251
Abstract: A detector for use in a charged particle device for an assessment apparatus to detect charged particles from a sample, wherein the detector includes: a backscatter detector component set to a backscatter bias electric potential and configured to detect higher energy charged particles; and a secondary detector component set to a secondary bias electric potential and configured to detect lower energy charged particles, wherein there is a potential difference between the backscatter bias electric potential and the secondary bias electric potential.
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80.发明授权公开(公告)号：US12066764B2
公开(公告)日：2024-08-20
申请号：US18143825
申请日：2023-05-05
Applicant: ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus Tinnemans , Patrick Warnaar , Vasco Tomas Tenner , Maurits Van Der Schaar
IPC: G03F7/00 , G01R31/265
CPC classification number: G03F7/706839 , G01R31/2656 , G03F7/70633
Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.
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