公开(公告)号：US11673169B2

公开(公告)日：2023-06-13

申请号：US17294013

申请日：2019-11-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey Nikipelov ,  Dmitry Kurilovich ,  Fabio Sbrizzai ,  Marcus Adrianus Van de Kerkhof ,  Ties Wouter Van der Woord ,  Willem Joan Van der Zande ,  Jeroen Van Duivenbode ,  David Ferdinand Vles

IPC: B08B6/00 ,  B08B7/02 ,  B08B7/04 ,  G03F1/62 ,  G03F1/82

CPC classification number: B08B6/00 ,  B08B7/02 ,  B08B7/04 ,  G03F1/62 ,  G03F1/82

Abstract: A membrane cleaning apparatus for removing particles from a membrane, the apparatus including a membrane support and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may include: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.

公开(公告)号：US20210333723A9

公开(公告)日：2021-10-28

申请号：US16965635

申请日：2019-01-22

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus Van de Kerkhof

IPC: G03F7/20 ,  G03F1/82

Abstract: The present application relates to a carbon dioxide snow cleaning apparatus comprising: a carbon dioxide source; a carbon dioxide snow nozzle in fluid communication with the carbon dioxide source; a charging element; and a collection surface. Also described is a method of cleaning a surface, the method comprising the steps of: (i) passing a stream of carbon dioxide out of a carbon dioxide snow nozzle to form a carbon dioxide snow stream; (ii) charging the carbon dioxide snow stream; (iii) directing the charged carbon dioxide snow stream onto the surface to be cleaned; (iv) collecting particles removed by the charged carbon dioxide snow stream from the surface to be cleaned on a collection surface. Also described is the use of such apparatus in a lithographic apparatus and the use of such an apparatus or method.

公开(公告)号：US11287753B2

公开(公告)日：2022-03-29

申请号：US16965635

申请日：2019-01-22

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus Van de Kerkhof

IPC: G03F7/20 ,  G03F1/82

Abstract: The present application relates to a carbon dioxide snow cleaning apparatus comprising: a carbon dioxide source; a carbon dioxide snow nozzle in fluid communication with the carbon dioxide source; a charging element; and a collection surface. Also described is a method of cleaning a surface, the method comprising the steps of: (i) passing a stream of carbon dioxide out of a carbon dioxide snow nozzle to form a carbon dioxide snow stream; (ii) charging the carbon dioxide snow stream; (iii) directing the charged carbon dioxide snow stream onto the surface to be cleaned; (iv) collecting particles removed by the charged carbon dioxide snow stream from the surface to be cleaned on a collection surface. Also described is the use of such apparatus in a lithographic apparatus and the use of such an apparatus or method.

公开(公告)号：US12158706B2

公开(公告)日：2024-12-03

申请号：US17624901

申请日：2020-06-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcus Adrianus Van de Kerkhof ,  Manish Ranjan

IPC: G03F7/00

Abstract: A lithographic apparatus including a substrate stage for supporting a structure in a compartment, the compartment having a compartment surface facing a top surface of the substrate in at least one operational configuration; and a soft coating on the compartment surface for capturing particles. A heat shield or component thereof for a lithographic apparatus, the heat shield or component thereof including a soft coating on at least one surface for capturing particles and a lithographic apparatus including such a heat shield.

公开(公告)号：US12072620B2

公开(公告)日：2024-08-27

申请号：US17278356

申请日：2019-10-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter-Jan Van Zwol ,  Sander Baltussen ,  Dennis De Graaf ,  Johannes Christiaan Leonardus Franken ,  Adrianus Johannes Maria Giesbers ,  Alexander Ludwig Klein ,  Johan Hendrik Klootwijk ,  Peter Simon Antonius Knapen ,  Evgenia Kurganova ,  Alexey Sergeevich Kuznetsov ,  Arnoud Willem Notenboom ,  Mahdiar Valefi ,  Marcus Adrianus Van de Kerkhof ,  Wilhelmus Theodorus Anthonius Johannes Van den Einden ,  Ties Wouter Van der Woord ,  Hendrikus Jan Wondergem ,  Aleksandar Nikolov Zdravkov

IPC: G03F1/64 ,  G03F7/00

CPC classification number: G03F1/64 ,  G03F7/7015

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.

公开(公告)号：US20240264540A1

公开(公告)日：2024-08-08

申请号：US18565964

申请日：2022-06-15

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus Van de Kerkhof ,  Adrianus Hendrik Koevoets

IPC: G03F7/00 ,  H01L21/67 ,  H01L21/683

CPC classification number: G03F7/70708 ,  G03F7/70033 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/70783 ,  G03F7/70841 ,  G03F7/7085 ,  G03F7/70875 ,  H01L21/67109 ,  H01L21/67248 ,  H01L21/6831 ,  H01L21/6838

Abstract: A substrate holder for holding a substrate comprising a frame and a surface clamping device arranged on an underside of the frame configured to electrostatically attract an upper surface of the substrate from above the substrate. The substrate holder can be used to contactlessly hold and deform the substrate and thereby control a shape of the substrate. The substrate holder is suitable for use in a semiconductor processing apparatus and can operate in a vacuum or near-vacuum environment, such as in an EUV lithographic apparatus.

公开(公告)号：US20210048757A1

公开(公告)日：2021-02-18

申请号：US16965635

申请日：2019-01-20

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus Van de Kerkhof

IPC: G03F7/20 ,  G03F1/82

Abstract: The present application relates to a carbon dioxide snow cleaning apparatus comprising: a carbon dioxide source; a carbon dioxide snow nozzle in fluid communication with the carbon dioxide source; a charging element; and a collection surface. Also described is a method of cleaning a surface, the method comprising the steps of: (i) passing a stream of carbon dioxide out of a carbon dioxide snow nozzle to form a carbon dioxide snow stream; (ii) charging the carbon dioxide snow stream; (iii) directing the charged carbon dioxide snow stream onto the surface to be cleaned; (iv) collecting particles removed by the charged carbon dioxide snow stream from the surface to be cleaned on a collection surface. Also described is the use of such apparatus in a lithographic apparatus and the use of such an apparatus or method.