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    Stage System and Metrology Tool
    2.
    发明申请
    Stage System and Metrology Tool 审中-公开

    公开(公告)号：US20180267410A1

    公开(公告)日：2018-09-20

    申请号：US15921124

    申请日：2018-03-14

    Applicant: ASML Netherlands B.V.

    Inventor： Peter Paul HEMPENIUS ,  Marcel Koenraad Marie BAGGEN ,  Thomas Jan DE HOOG ,  Sinar JULIANA ,  Henricus Martinus Johannes VAN DE GROES

    IPC: G03F7/20

    Abstract: Disclosed is a stage system and metrology apparatus comprising at least one such stage system. The stage system comprises a stage carrier for holding an object and a stage carrier positioning actuator for displacing the stage carrier. The stage system also comprises a balance mass to counteract a displacement of the stage carrier, and a balance mass positioning actuator for displacing the balance mass. A cable arrangement is connected to the stage carrier for the supply of at least power to said stage carrier. The stage system is operable to apply a compensatory feed-forward force to the balance mass which compensates for a cable arrangement force exerted by the cable arrangement.

    DUAL FOCUS SOLUTON FOR SEM METROLOGY TOOLS
    4.
    发明公开
    DUAL FOCUS SOLUTON FOR SEM METROLOGY TOOLS 审中-公开

    公开(公告)号：US20240071713A1

    公开(公告)日：2024-02-29

    申请号：US18270707

    申请日：2021-12-09

    Applicant: ASML Netherlands B.V.

    Inventor： Niels Johannes Maria BOSCH ,  Xu WANG ,  Peter Paul HEMPENIUS ,  Yongqiang WANG ,  Hans BUTLER ,  Youjin WANG ,  Jasper Hendrik GRASMAN ,  Jianzi SUI ,  Tianming CHEN ,  Aimin WU

    IPC: H01J37/20

    CPC classification number: H01J37/20 ,  H01J37/28 ,  H01J2237/20235

    Abstract: There is provided a charged particle apparatus comprising: a particle beam generator, optics, a first and a second positioning device, both configured for positioning the substrate relative to the particle beam generator along its optical axis, and a controller configured for switching between a first operational mode and a second operational mode. The apparatus is configured, when operating in the first operational mode, for irradiating the substrate by the particle beam at a first landing energy of the particle beam and, when operating in the second operational mode, for irradiating the substrate at a second, different landing energy. When operating in the first operational mode, the second positioning device is configured to position the substrate relative to the particle beam generator at a first focus position of the particle beam and in the second operational mode, to position the substrate at a second, different focus position.

    VIBRATION DAMPING AND RESONANCE REDUCTION FOR ION PUMP
    6.
    发明申请
    VIBRATION DAMPING AND RESONANCE REDUCTION FOR ION PUMP 有权

    公开(公告)号：US20230114067A1

    公开(公告)日：2023-04-13

    申请号：US17798061

    申请日：2021-02-04

    Applicant: ASML Netherlands B.V.

    Inventor： Long DI ,  Chenxi FU ,  Lucas KUINDERSMA ,  Kuo-Feng TSENG ,  Peter Paul HEMPENIUS ,  Yu LIU ,  Ying LUO

    IPC: H01J41/12 ,  H01J37/28

    Abstract: Apparatuses and systems for damping vibration of a vacuum vessel mounted with a pump include a pump body and a damping element coupled to the pump body, wherein the pump body and the damping element form a mass-based damper, and wherein the pump body forms a mass component of the mass-based damper; and the damping element forms a damping component of the mass-based damper. The apparatuses and systems also include a pump body configured to be secured to a column of a charged-particle inspection apparatus, a sensor coupled to the pump body, an actuator coupled to the pump body, and a circuitry communicatively coupled to the sensor and the actuator for receiving motion data indicative of a vibration of the column; determining a damping based on the motion data; and actuate the actuator to react to the vibration of the column in accordance with the damping.

    METHOD AND SYSTEM OF REDUCING CHAMBER VIBRATION
    8.
    发明申请
    METHOD AND SYSTEM OF REDUCING CHAMBER VIBRATION 有权

    公开(公告)号：US20250014857A1

    公开(公告)日：2025-01-09

    申请号：US18709795

    申请日：2022-10-19

    Applicant: ASML Netherlands B.V.

    Inventor： Shaoqian WANG ,  Peter Paul HEMPENIUS ,  Ying LUO ,  Omar ALJANAIDEH

    IPC: H01J37/20 ,  H01J37/18

    Abstract: Systems, apparatuses, and methods for reducing vibration of a chamber may include obtaining predefined motion data associated with a transferring device stiffly coupled to a chamber; determining movement of the transferring device based on the predefined motion data before the transferring device moves; determining, based on the movement, a first force to be applied to the chamber caused by the movement; and causing a support device of the chamber to apply a second force to the chamber to counteract the first force when the transferring device moves.

    SYSTEM FOR POSITIONING AN OBJECT IN LITHOGRAPHY
    10.
    发明申请
    SYSTEM FOR POSITIONING AN OBJECT IN LITHOGRAPHY 有权
    用于定位对象的系统

    公开(公告)号：US20160377996A1

    公开(公告)日：2016-12-29

    申请号：US15039795

    申请日：2014-11-14

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Peter Paul HEMPENIUS ,  Martijn HOUBEN ,  Nicolaas Rudolf KEMPER ,  Robertus Mathijs Gerardus RIJS ,  Paul Corné Henri DE WIT ,  Stijn Willem BOERE ,  Youssef Karel Maria DE VOS ,  Frits VAN DER MEULEN

    IPC: G03F7/20

    CPC classification number: G03F7/70875 ,  G03F7/70775 ,  G03F7/709

    Abstract: A lithographic apparatus includes: an object that is moveable in at least one direction; a control system to move the object in the at least one direction, wherein the control system is arranged to control movement of the object in the at least one direction in a frequency range of interest; and a conduit provided with a fluid, wherein the conduit is arranged on or in the object in a pattern, and wherein the pattern is such that an acceleration of the object in the at least one direction causes an acceleration pressure profile in the fluid along the conduit, the acceleration pressure profile not matching with a resonance pressure profile that corresponds to a standing wave mode in the fluid with a resonance frequency in the frequency range of interest.

    Abstract translation: 光刻设备包括：可在至少一个方向上移动的物体; 控制系统，用于在所述至少一个方向上移动所述物体，其中所述控制系统被布置成控制所述物体在感兴趣的频率范围内的所述至少一个方向上的移动; 以及设置有流体的导管，其中所述导管以图案布置在所述物体上或所述物体中，并且其中所述图案使得所述物体在所述至少一个方向上的加速度沿着所述流体沿着所述流体的加速度压力分布 导管，加速度压力分布不符合共振压力分布，其对应于在感兴趣的频率范围内的共振频率的流体中的驻波模式。

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