-
公开(公告)号：US20190187566A1
公开(公告)日：2019-06-20
申请号：US16099733
申请日：2017-04-20
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
CPC classification number: G03F7/7085 , G03F7/70633 , G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70808 , G03F9/70 , G03F9/7015 , G03F9/7019 , G03F9/7049 , G03F9/7084 , G03F9/7088
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
-
公开(公告)号：US20230121341A1
公开(公告)日：2023-04-20
申请号：US17793525
申请日：2021-01-14
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
Abstract: A positioning device, including: a first positioning module arranged to support and position a first substrate, a second positioning module arranged to support and position a second substrate, a first positioning field in which the first and second positioning modules can be alternatingly positioned to carry out a first processing sequence, a second positioning field in which the first and second positioning modules can be alternatingly positioned to carry out a second processing sequence, wherein when one of the first and second positioning modules is carrying out or finishing the first processing sequence, the other of the first and second positioning modules has finished the second processing sequence and is positioned closer to the one of the first and second positioning modules.
-
公开(公告)号：US20190187573A1
公开(公告)日：2019-06-20
申请号：US16326410
申请日：2017-07-28
Applicant: ASML Netherlands B.V.
Inventor： Hendrikus Herman Marie COX , Paul Corné Henri DE WIT , Arie Jeffrey DEN BOEF , Adrianus Hendrik KOEVOETS , Jim Vincent OVERKAMP , Frits VAN DER MEULEN , Jacobus Cornelis Gerardus VAN DER SANDEN
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70433 , G03F7/70625 , G03F7/70783
Abstract: A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to provide additional radiation beams which illuminate and heat part of the substrate during the exposure.
-
公开(公告)号：US20250028259A1
公开(公告)日：2025-01-23
申请号：US18908931
申请日：2024-10-08
Applicant: ASML Netherlands B.V.
Inventor： Junichi KANEHARA , Hans BUTLER , Paul Corné Henri DE WIT , Engelbertus Antonius Fransiscus VAN DER PASCH
Abstract: A method of operating a lithographic apparatus that comprises: a projection system configured to provide exposure radiation for patterning a substrate underneath the projection system; a first stage configured to support a first substrate; a second stage configured to support a second substrate; and a third stage accommodating a component that includes at least one of a sensor and a cleaning device; wherein the method comprises starting a pre-exposure scrum sweep operation after starting a substrate exchange operation; wherein during the pre-exposure scrum sweep operation, the third stage moves away from underneath the projection system while the second stage moves to underneath the projection system; wherein during the substrate exchange operation, the first substrate is unloaded from the first stage.
-
公开(公告)号：US20200159126A1
公开(公告)日：2020-05-21
申请号：US16774035
申请日：2020-01-28
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
-
Patent Agency Ranking
公开(公告)号：US20160377996A1
公开(公告)日：2016-12-29
申请号：US15039795
申请日：2014-11-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Peter Paul HEMPENIUS , Martijn HOUBEN , Nicolaas Rudolf KEMPER , Robertus Mathijs Gerardus RIJS , Paul Corné Henri DE WIT , Stijn Willem BOERE , Youssef Karel Maria DE VOS , Frits VAN DER MEULEN
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70775 , G03F7/709
Abstract: A lithographic apparatus includes: an object that is moveable in at least one direction; a control system to move the object in the at least one direction, wherein the control system is arranged to control movement of the object in the at least one direction in a frequency range of interest; and a conduit provided with a fluid, wherein the conduit is arranged on or in the object in a pattern, and wherein the pattern is such that an acceleration of the object in the at least one direction causes an acceleration pressure profile in the fluid along the conduit, the acceleration pressure profile not matching with a resonance pressure profile that corresponds to a standing wave mode in the fluid with a resonance frequency in the frequency range of interest.
Abstract translation: 光刻设备包括：可在至少一个方向上移动的物体; 控制系统，用于在所述至少一个方向上移动所述物体，其中所述控制系统被布置成控制所述物体在感兴趣的频率范围内的所述至少一个方向上的移动; 以及设置有流体的导管，其中所述导管以图案布置在所述物体上或所述物体中，并且其中所述图案使得所述物体在所述至少一个方向上的加速度沿着所述流体沿着所述流体的加速度压力分布 导管，加速度压力分布不符合共振压力分布，其对应于在感兴趣的频率范围内的共振频率的流体中的驻波模式。
-
公开(公告)号：US20240402620A1
公开(公告)日：2024-12-05
申请号：US18691002
申请日：2022-08-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Paul Corné Henri DE WIT , Ronald Franciscus Herman HUGERS , Johannes Jacobus Matheus BASELMANS
IPC: G03F7/00
Abstract: A source selection module for spectrally shaping a broadband illumination beam to obtain a spectrally shaped illumination beam. The source selection module includes a beam dispersing element for dispersing the broadband illumination beam; a grating light valve module for spatially modulating the broadband illumination beam subsequent to being dispersed; and a beam combining element to recombine the spatially modulated broadband illumination beam to obtain an output source beam.
-
公开(公告)号：US20230266678A1
公开(公告)日：2023-08-24
申请号：US18123620
申请日：2023-03-20
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G03F7/7085 , G03F7/70775 , G03F7/70808 , G03F7/70716 , G03F7/70725 , G03F9/70 , G03F9/7015 , G03F9/7019 , G03F9/7049 , G03F9/7084 , G03F9/7088 , G03F7/70633
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
-
公开(公告)号：US20210223703A1
公开(公告)日：2021-07-22
申请号：US17218420
申请日：2021-03-31
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
-
公开(公告)号：US20190377266A1
公开(公告)日：2019-12-12
申请号：US16547933
申请日：2019-08-22
Applicant: ASML NETHERLANDS B.V.
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
-
-
-
-
-
-
-
-
-
Search Results
10
records
(took 0.019 seconds)
