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公开(公告)号:US20230114067A1
公开(公告)日:2023-04-13
申请号:US17798061
申请日:2021-02-04
Applicant: ASML Netherlands B.V.
Inventor: Long DI , Chenxi FU , Lucas KUINDERSMA , Kuo-Feng TSENG , Peter Paul HEMPENIUS , Yu LIU , Ying LUO
Abstract: Apparatuses and systems for damping vibration of a vacuum vessel mounted with a pump include a pump body and a damping element coupled to the pump body, wherein the pump body and the damping element form a mass-based damper, and wherein the pump body forms a mass component of the mass-based damper; and the damping element forms a damping component of the mass-based damper. The apparatuses and systems also include a pump body configured to be secured to a column of a charged-particle inspection apparatus, a sensor coupled to the pump body, an actuator coupled to the pump body, and a circuitry communicatively coupled to the sensor and the actuator for receiving motion data indicative of a vibration of the column; determining a damping based on the motion data; and actuate the actuator to react to the vibration of the column in accordance with the damping.
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公开(公告)号:US20220068590A1
公开(公告)日:2022-03-03
申请号:US17418741
申请日:2019-12-19
Applicant: ASML Netherlands B.V.
Inventor: Ying LUO , Zhonghua DONG , Xuehui YIN , Long DI , Nianpei DENG , Wei FANG , Lingling PU , Ruochong FEI , Bohang ZHU , Yu LIU
IPC: H01J37/147 , H01J37/20 , H01J37/21 , H01J37/28
Abstract: Systems and methods for irradiating a sample with a charged-particle beam are disclosed. The charged-particle beam system may comprise a stage configured to hold a sample and is movable in at least one of X-Y-Z axes. The charged-particle beam system may further comprise a position sensing system to determine a lateral and vertical displacement of the stage, and a beam deflection controller configured to apply a first signal to deflect a primary charged-particle beam incident on the sample to at least partly compensate for the lateral displacement, and to apply a second signal to adjust a focus of the deflected charged-particle beam incident on the sample to at least partly compensate for the vertical displacement of the stage. The first and second signals may comprise an electrical signal having a high bandwidth in a range of 10 kHz to 50 kHz, and 50 kHz to 200 kHz, respectively.
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