Invention Application
- Patent Title: SYSTEMS AND METHODS FOR FOCUSING CHARGED -PARTICLE BEAMS
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Application No.: US17418741Application Date: 2019-12-19
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Publication No.: US20220068590A1Publication Date: 2022-03-03
- Inventor: Ying LUO , Zhonghua DONG , Xuehui YIN , Long DI , Nianpei DENG , Wei FANG , Lingling PU , Ruochong FEI , Bohang ZHU , Yu LIU
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2019/086459 WO 20191219
- Main IPC: H01J37/147
- IPC: H01J37/147 ; H01J37/20 ; H01J37/21 ; H01J37/28

Abstract:
Systems and methods for irradiating a sample with a charged-particle beam are disclosed. The charged-particle beam system may comprise a stage configured to hold a sample and is movable in at least one of X-Y-Z axes. The charged-particle beam system may further comprise a position sensing system to determine a lateral and vertical displacement of the stage, and a beam deflection controller configured to apply a first signal to deflect a primary charged-particle beam incident on the sample to at least partly compensate for the lateral displacement, and to apply a second signal to adjust a focus of the deflected charged-particle beam incident on the sample to at least partly compensate for the vertical displacement of the stage. The first and second signals may comprise an electrical signal having a high bandwidth in a range of 10 kHz to 50 kHz, and 50 kHz to 200 kHz, respectively.
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