公开(公告)号：US12085863B2

公开(公告)日：2024-09-10

申请号：US18138383

申请日：2023-04-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Jiyou Fu

IPC: G03F7/00 ,  G06T7/00

CPC classification number: G03F7/70625 ,  G06T7/001 ,  G06T2207/10061 ,  G06T2207/30148

Abstract: A method for determining stochastic edge placement error associated with a pattern. The method includes acquiring, via a metrology tool, a plurality of images of the pattern at a defined location on the substrate without performing a substrate alignment therebetween; and generating at least two data: (i) first data associated with the pattern using a first set of images of the plurality of images, and (ii) second data associated with the pattern using a second set of images of the plurality of images. The first set of images and the second set of images include at least one different image. The method further includes determining (e.g., via a decomposition algorithm), using the first data and the second data associated with the pattern at the defined location, the stochastic edge placement error associated with the pattern.

公开(公告)号：US11669019B2

公开(公告)日：2023-06-06

申请号：US17610481

申请日：2020-04-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Jiyou Fu

IPC: G03F7/20 ,  G06T7/00

CPC classification number: G03F7/70625 ,  G06T7/001 ,  G06T2207/10061 ,  G06T2207/30148

Abstract: A method for determining stochastic edge placement error associated with a pattern. The method includes acquiring, via a metrology tool, a plurality of images of the pattern at a defined location on the substrate without performing a substrate alignment therebetween; and generating at least two data: (i) first data associated with the pattern using a first set of images of the plurality of images, and (ii) second data associated with the pattern using a second set of images of the plurality of images. The first set of images and the second set of images include at least one different image. The method further includes determining (e.g., via a decomposition algorithm), using the first data and the second data associated with the pattern at the defined location, the stochastic edge placement error associated with the pattern.