公开(公告)号：US12066764B2

公开(公告)日：2024-08-20

申请号：US18143825

申请日：2023-05-05

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus Tinnemans ,  Patrick Warnaar ,  Vasco Tomas Tenner ,  Maurits Van Der Schaar

IPC: G03F7/00 ,  G01R31/265

CPC classification number: G03F7/706839 ,  G01R31/2656 ,  G03F7/70633

Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.

公开(公告)号：US20210325174A1

公开(公告)日：2021-10-21

申请号：US17314469

申请日：2021-05-07

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Vasco Tomas Tenner ,  Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer ,  Patrick Warnaar ,  Grzegorz Grzela ,  Martin Jacobus Johan Jak

IPC: G01B11/25 ,  G03F7/20 ,  G02B27/42 ,  G03H1/00 ,  G03H1/04

Abstract: Disclosed is a method and associated apparatus for measuring a characteristic of interest relating to a structure on a substrate. The method comprises calculating a value for the characteristic of interest directly from the effect of the characteristic of interest on at least the phase of illuminating radiation when scattered by the structure, subsequent to illuminating said structure with said illuminating radiation.

公开(公告)号：US20230273255A1

公开(公告)日：2023-08-31

申请号：US18143825

申请日：2023-05-05

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Patrick Warnaar ,  Vasco Tomas Tenner ,  Maurits Van Der Schaar

IPC: G01R31/265

CPC classification number: G01R31/2656

Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.

公开(公告)号：US11709436B2

公开(公告)日：2023-07-25

申请号：US17460947

申请日：2021-08-30

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus Tinnemans ,  Patrick Warnaar ,  Vasco Tomas Tenner ,  Maurits Van Der Schaar

IPC: G01R31/265

CPC classification number: G01R31/2656

Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.

公开(公告)号：US20190107781A1

公开(公告)日：2019-04-11

申请号：US16150879

申请日：2018-10-03

Applicant: Stichting VU ,  Stichting Nederlandse Wetenschappelijk Onderzoek Instituten ,  Universiteit van Amsterdam ,  ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Arie Jeffrey Den Boef ,  Armand Eugene Albert Koolen ,  Nitesh Pandey ,  Vasco Tomas Tenner ,  Willem Marie Julia Marcel Coene ,  Patrick Warnaar

IPC: G03F7/20 ,  G03F9/00 ,  G01N21/47 ,  G01N21/95

Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.

公开(公告)号：US11650047B2

公开(公告)日：2023-05-16

申请号：US17314469

申请日：2021-05-07

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus Tinnemans ,  Vasco Tomas Tenner ,  Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer ,  Patrick Warnaar ,  Grzegorz Grzela ,  Martin Jacobus Johan Jak

IPC: G01B11/25 ,  G03F7/20 ,  G02B27/42 ,  G03H1/00 ,  G03H1/04

CPC classification number: G01B11/2536 ,  G02B27/4233 ,  G02B27/4272 ,  G03F7/705 ,  G03F7/7065 ,  G03F7/7085 ,  G03F7/70508 ,  G03F7/70633 ,  G03H1/0005 ,  G03H1/0443 ,  G03H2001/0445

Abstract: Disclosed is a method and associated apparatus for measuring a characteristic of interest relating to a structure on a substrate. The method comprises calculating a value for the characteristic of interest directly from the effect of the characteristic of interest on at least the phase of illuminating radiation when scattered by the structure, subsequent to illuminating said structure with said illuminating radiation.

公开(公告)号：US20210349403A1

公开(公告)日：2021-11-11

申请号：US17383086

申请日：2021-07-22

Applicant: ASML Netherlands B.V.

Inventor： Johannes Fitzgerald De Boer ,  Vasco Tomas Tenner ,  Arie Jeffrey Den Boef ,  Christos Messinis

IPC: G03F7/20 ,  G01N21/88

Abstract: Methods and apparatus are disclosed for determining a characteristic of a structure. In one arrangement, the structure is illuminated with first illumination radiation to generate first scattered radiation. A first interference pattern is formed by interference between a portion of the first scattered radiation reaching a sensor and first reference radiation. The structure is also illuminated with second illumination radiation from a different direction. A second interference pattern is formed using second reference radiation. The first and second interference patterns are used to determine the characteristic of the structure. Azimuthal angles of the first and second reference radiations onto the sensor are different.

公开(公告)号：US11119415B2

公开(公告)日：2021-09-14

申请号：US16376639

申请日：2019-04-05

Applicant: ASML Netherlands B.V.

Inventor： Johannes Fitzgerald De Boer ,  Vasco Tomas Tenner ,  Arie Jeffrey Den Boef ,  Christos Messinis

IPC: G03F7/20 ,  G01N21/88

Abstract: Methods and apparatus are disclosed for determining a characteristic of a structure. In one arrangement, the structure is illuminated with first illumination radiation to generate first scattered radiation. A first interference pattern is formed by interference between a portion of the first scattered radiation reaching a sensor and first reference radiation. The structure is also illuminated with second illumination radiation from a different direction. A second interference pattern is formed using second reference radiation. The first and second interference patterns are used to determine the characteristic of the structure. Azimuthal angles of the first and second reference radiations onto the sensor are different.

公开(公告)号：US10816909B2

公开(公告)日：2020-10-27

申请号：US16150879

申请日：2018-10-03

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus Tinnemans ,  Arie Jeffrey Den Boef ,  Armand Eugene Albert Koolen ,  Nitesh Pandey ,  Vasco Tomas Tenner ,  Willem Marie Julia Marcel Coene ,  Patrick Warnaar

IPC: G03F7/20 ,  G03F9/00 ,  G01N21/47 ,  G01N21/95 ,  G01B11/06 ,  G01B11/02

Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.

公开(公告)号：US12007700B2

公开(公告)日：2024-06-11

申请号：US17856213

申请日：2022-07-01

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus Tinnemans ,  Arie Jeffrey Den Boef ,  Armand Eugene Albert Koolen ,  Nitesh Pandey ,  Vasco Tomas Tenner ,  Willem Marie Julia Marcel Coene ,  Patrick Warnaar

IPC: G03F7/20 ,  G01B11/02 ,  G01B11/06 ,  G01N21/47 ,  G01N21/95 ,  G03F7/00 ,  G03F9/00

CPC classification number: G03F7/7085 ,  G01B11/02 ,  G01B11/0625 ,  G01N21/4788 ,  G01N21/9501 ,  G03F7/70158 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7088 ,  G01B2210/56

Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.