Objective lens with deflector plates immersed in electrostatic lens field
    61.
    发明授权
    Objective lens with deflector plates immersed in electrostatic lens field 有权
    偏光板沉浸在静电透镜领域的物镜

    公开(公告)号:US08698093B1

    公开(公告)日:2014-04-15

    申请号:US11716768

    申请日:2007-03-12

    CPC classification number: H01J37/145 H01J37/28 H01J2237/1035 H01J2237/1516

    Abstract: One embodiment relates to an objective lens utilizing magnetic and electrostatic fields which is configured to focus a primary electron beam onto a surface of a target substrate. The objective lens includes a magnetic pole piece and an electrostatic deflector configured within the pole piece. An electrostatic lens field is determined by the pole piece and the electrostatic deflector, and the electrostatic lens field is configured by adjusting offset voltages applied to plates of the electrostatic deflector. Other embodiments, aspects and features are also disclosed.

    Abstract translation: 一个实施例涉及利用磁场和静电场的物镜,其被配置为将一次电子束聚焦到目标衬底的表面上。 物镜包括配置在极片内的磁极片和静电偏转器。 静电透镜场由极片和静电偏转器确定,并且静电透镜场通过调整施加到静电偏转器的板的偏移电压来配置。 还公开了其它实施例,方面和特征。

    Particle beam system
    62.
    发明授权
    Particle beam system 有权
    粒子束系统

    公开(公告)号:US08598525B2

    公开(公告)日:2013-12-03

    申请号:US13176746

    申请日:2011-07-06

    Abstract: A particle beam system comprises a particle beam source for generating a particle beam, an objective lens for focusing the particle beam onto an object plane, wherein the objective lens comprises a focal length and an optical axis, and a scintillator arrangement, which comprises an electron receiving surface facing the object plane and which is arranged such that it is exposed to electrons, which emanate from the object plane. The scintillator arrangement further comprises a light exit face, wherein the scintillator arrangement is configured such that light rays which are generated by electrons, which are incident on the electron receiving surface leave the scintillator arrangement at the light exit face.

    Abstract translation: 粒子束系统包括用于产生粒子束的粒子束源,用于将粒子束聚焦到物平面上的物镜,其中物镜包括焦距和光轴,以及闪烁体装置,其包括电子 接收表面面对物平面,其被布置成使得其暴露于从物平面发出的电子。 闪烁体装置还包括光出射面,其中闪烁体装置被配置为使得入射在电子接收表面上的由电子产生的光线在光出射面离开闪烁体装置。

    PARTICLE-BEAM COLUMN CORRECTED FOR BOTH CHROMATIC AND SPHERICAL ABERRATION
    63.
    发明申请
    PARTICLE-BEAM COLUMN CORRECTED FOR BOTH CHROMATIC AND SPHERICAL ABERRATION 审中-公开
    用于两个色素和球状脱落的颗粒束柱校正

    公开(公告)号:US20130264477A1

    公开(公告)日:2013-10-10

    申请号:US13849496

    申请日:2013-03-23

    Abstract: An objective lens for use in probe-forming particle-optical columns such as focused ion beam equipment, scanning electron microscopes, and helium microscopes is described. It comprises two interleaved (quadrupole/octopole) lenses and two or three ancillary octopole lenses, and is capable of simultaneous compensation of spherical (Cs) and chromatic (Cc) aberrations of the objective lens alone or of the complete particle-optical column. Additional apparatus comprising a gridded aperture and position-sensitive detector is specified, together with a method to measure and minimize all of the five independent third-order aberration coefficients of the objective lens.

    Abstract translation: 描述了用于探针形成颗粒光学柱的物镜,例如聚焦离子束设备,扫描电子显微镜和氦显微镜。 它包括两个交错(四极/八极)透镜和两个或三个辅助八极透镜,并且能够同时补偿单独的物镜或完整的粒子 - 光学柱的球面(Cs)和彩色(Cc)像差。 规定包括网格孔径和位置敏感检测器的附加装置,以及用于测量和最小化物镜的所有五个独立三阶像差系数的方法。

    CHARGED PARTICLE BEAM DEVICE WITH DYNAMIC FOCUS AND METHOD OF OPERATING THEREOF
    64.
    发明申请
    CHARGED PARTICLE BEAM DEVICE WITH DYNAMIC FOCUS AND METHOD OF OPERATING THEREOF 审中-公开
    具有动态聚焦的充电颗粒光束装置及其操作方法

    公开(公告)号:US20130214155A1

    公开(公告)日:2013-08-22

    申请号:US13405759

    申请日:2012-02-27

    Abstract: A retarding field scanning electron microscope is described. The microscope includes a scanning deflection assembly configured for scanning an electron beam over a specimen, one or more controllers in communication with the scanning deflection assembly for controlling the electron beam scanning pattern, and a combined magnetic-electrostatic objective lens configured for focusing the electron beam including an electrostatic lens portion. The electrostatic lens portion includes a first electrode with a high potential bias, and a second electrode disposed between the first electrode and the specimen plane with a potential bias lower than the first electrode, wherein the second electrode is configured for providing a retarding field. The microscope further includes a voltage supply connected to the second electrode for biasing the second electrode and being in communication with the controllers, wherein the controllers synchronize a variation of the potential of the second electrode with the scanning pattern.

    Abstract translation: 描述了延迟场扫描电子显微镜。 显微镜包括扫描偏转组件,其被配置为扫描试样上的电子束,与用于控制电子束扫描图案的扫描偏转组件连通的一个或多个控制器,以及组合的静电物镜,其被配置用于聚焦电子束 包括静电透镜部分。 静电透镜部分包括具有高电位偏置的第一电极和设置在第一电极和检体平面之间的电位偏压低于第一电极的第二电极,其中第二电极被配置为提供延迟场。 显微镜还包括连接到第二电极的电压源,用于偏置第二电极并与控制器连通,其中控制器使第二电极的电位变化与扫描图案同步。

    Charged particle beam apparatus permitting high resolution and high-contrast observation
    65.
    发明授权
    Charged particle beam apparatus permitting high resolution and high-contrast observation 有权
    带电粒子束装置允许高分辨率和高对比度观察

    公开(公告)号:US08431915B2

    公开(公告)日:2013-04-30

    申请号:US13551452

    申请日:2012-07-17

    Abstract: A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.

    Abstract translation: 电磁叠加型物镜的下极片分为上磁路和下磁路。 几乎等于延迟电压的电压被施加到下磁路。 提供了能够获得具有比常规图像更高分辨率和更高对比度的图像的物镜。 电磁叠加型物镜包括包围线圈的磁路,围绕电子束的圆柱形或锥形增强器磁路,介于线圈和样品之间的控制磁路,加速电场控制单元,其加速 使用升压电源的电子束,使用级电源使电子束减速的减速电场控制单元,以及抑制使用控制磁路电源对样品进行放电的抑制单元。

    Charged particle apparatus
    66.
    发明授权
    Charged particle apparatus 有权
    带电粒子装置

    公开(公告)号:US08319192B2

    公开(公告)日:2012-11-27

    申请号:US12862590

    申请日:2010-08-24

    Applicant: Weiming Ren

    Inventor: Weiming Ren

    CPC classification number: H01J37/141 H01J37/145 H01J37/28

    Abstract: An electromagnetic compound objective lens is provided for charged particle device, especially as an objective lens of low-voltage scanning electron microscope (LVSEM), which comprises a magnetic immersion lens and an electrostatic immersion lens. The magnetic immersion lens orients its gap between an inner pole piece and an outer pole piece to specimen's surface, and uses a magnetic specimen stage. The electrostatic immersion lens comprises three or four electrodes which apply suitable retarding field to a primary beam of the charged particle device for reducing its landing energy on specimen surface and further eliminating imaging aberrations.

    Abstract translation: 本发明提供一种用于带电粒子装置的电磁复合物镜,特别是作为低电压扫描电子显微镜(LVSEM)的物镜,其包括磁浸透镜和静电浸没透镜。 磁性浸没透镜将内极片和外极片之间的间隙定位到标本表面,并使用磁性样品台。 静电浸没透镜包括三个或四个电极,其将适当的延迟场施加到带电粒子装置的主光束,以降低其在样本表面上的着陆能量,并进一步消除成像像差。

    CHARGED PARTICLE BEAM APPARATUS PERMITTING HIGH RESOLUTION AND HIGH-CONTRAST OBSERVATION
    67.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS PERMITTING HIGH RESOLUTION AND HIGH-CONTRAST OBSERVATION 有权
    充电颗粒光束设备允许高分辨率和高对比度观察

    公开(公告)号:US20120280126A1

    公开(公告)日:2012-11-08

    申请号:US13551452

    申请日:2012-07-17

    Abstract: A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.

    Abstract translation: 电磁叠加型物镜的下极片分为上磁路和下磁路。 几乎等于延迟电压的电压被施加到下磁路。 提供了能够获得具有比常规图像更高分辨率和更高对比度的图像的物镜。 电磁叠加型物镜包括包围线圈的磁路,围绕电子束的圆柱形或锥形增强器磁路,介于线圈和样品之间的控制磁路,加速电场控制单元,其加速 使用升压电源的电子束,使用级电源减速电子束的减速电场控制部,以及抑制使用控制磁路电源对样品进行放电的抑制部。

    Electron Microscope
    68.
    发明申请
    Electron Microscope 有权
    电子显微镜

    公开(公告)号:US20120217393A1

    公开(公告)日:2012-08-30

    申请号:US13505951

    申请日:2010-11-01

    Abstract: A scanning electron microscope suppresses a beam drift by reducing charging on a sample surface while suppressing resolution degradation upon observation of an insulator sample. An electron microscope includes an electron source and an objective lens that focuses an electron beam emitted from the electron source, which provides an image using a secondary signal generated from the sample irradiated with the electron beam. A magnetic body with a continuous structure and an inside diameter larger than an inside diameter of an upper pole piece that forms the objective lens is provided between the objective lens and the sample.

    Abstract translation: 扫描电子显微镜通过减少对样品表面的充电而抑制光束偏移,同时在观察绝缘体样品时抑制分辨率劣化。 电子显微镜包括电子源和物镜,其聚焦从电子源发射的电子束,其使用从照射电子束的样品产生的二次信号来提供图像。 在物镜和样品之间设置具有连续结构且内径大于形成物镜的上极片的内径的磁体。

    System and method for a charged particle beam
    69.
    发明授权
    System and method for a charged particle beam 有权
    带电粒子束的系统和方法

    公开(公告)号:US08164060B2

    公开(公告)日:2012-04-24

    申请号:US12832127

    申请日:2010-07-08

    Abstract: System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at least one condenser lens for pre-focusing the primary charge particle beam. Furthermore, the apparatus includes a compound objective lens for forming the magnetic field and the electrostatic field to focus the primary charged particle beam onto a specimen in the charged particle beam path. The specimen includes a specimen surface. The compound objective lens includes a conical magnetic lens, an immersion magnetic lens, and an electrostatic lens, the conical magnetic lens including an upper pole piece, a shared pole piece being electrically insulated from the upper pole piece, and an excitation coil.

    Abstract translation: 带电粒子束的系统和方法。 根据实施例,本发明提供一种带电粒子束装置。 该装置包括用于产生初级带电粒子束的带电粒子源。 该装置还包括用于预聚焦初级充电粒子束的至少一个聚光透镜。 此外,该装置包括用于形成磁场的复合物镜和静电场,以将初级带电粒子束聚焦到带电粒子束路径中的样本上。 样品包括样品表面。 复合物镜包括锥形磁性透镜,浸没式磁透镜和静电透镜,该圆锥形磁性透镜包括上极片,与上极片电绝缘的共用极片和励磁线圈。

    Charged Particle Apparatus
    70.
    发明申请
    Charged Particle Apparatus 有权
    带电粒子装置

    公开(公告)号:US20120049064A1

    公开(公告)日:2012-03-01

    申请号:US12862590

    申请日:2010-08-24

    Applicant: WEIMING REN

    Inventor: WEIMING REN

    CPC classification number: H01J37/141 H01J37/145 H01J37/28

    Abstract: An electromagnetic compound objective lens is provided for charged particle device, especially as an objective lens of low-voltage scanning electron microscope (LVSEM), which comprises a magnetic immersion lens and an electrostatic immersion lens. The magnetic immersion lens orients its gap between an inner pole piece and an outer pole piece to specimen's surface, and uses a magnetic specimen stage. The electrostatic immersion lens comprises three or four electrodes which apply suitable retarding field to a primary beam of the charged particle device for reducing its landing energy on specimen surface and further eliminating imaging aberrations.

    Abstract translation: 本发明提供一种用于带电粒子装置的电磁复合物镜,特别是作为低电压扫描电子显微镜(LVSEM)的物镜,其包括磁浸透镜和静电浸没透镜。 磁性浸没透镜将内极片和外极片之间的间隙定位到标本表面,并使用磁性样品台。 静电浸没透镜包括三个或四个电极,其将适当的延迟场施加到带电粒子装置的主光束,以降低其在样本表面上的着陆能量,并进一步消除成像像差。

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