Invention Grant
- Patent Title: Particle beam system
- Patent Title (中): 粒子束系统
-
Application No.: US13176746Application Date: 2011-07-06
-
Publication No.: US08598525B2Publication Date: 2013-12-03
- Inventor: Dirk Zeidler , Thomas Kemen
- Applicant: Dirk Zeidler , Thomas Kemen
- Applicant Address: DE Jena
- Assignee: Carl Zeiss Microscopy GmbH
- Current Assignee: Carl Zeiss Microscopy GmbH
- Current Assignee Address: DE Jena
- Agent Bruce D Riter
- Priority: DE102010026169 20100706
- Main IPC: H01J37/28
- IPC: H01J37/28 ; H01J37/147

Abstract:
A particle beam system comprises a particle beam source for generating a particle beam, an objective lens for focusing the particle beam onto an object plane, wherein the objective lens comprises a focal length and an optical axis, and a scintillator arrangement, which comprises an electron receiving surface facing the object plane and which is arranged such that it is exposed to electrons, which emanate from the object plane. The scintillator arrangement further comprises a light exit face, wherein the scintillator arrangement is configured such that light rays which are generated by electrons, which are incident on the electron receiving surface leave the scintillator arrangement at the light exit face.
Public/Granted literature
- US20120199740A1 Particle Beam System Public/Granted day:2012-08-09
Information query