公开(公告)号：US09000394B2

公开(公告)日：2015-04-07

申请号：US13464261

申请日：2012-05-04

Applicant: Weiming Ren ,  Zhongwei Chen

Inventor： Weiming Ren ,  Zhongwei Chen

IPC: H01J37/14

CPC classification number: H01J37/14 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/20 ,  H01J37/141 ,  H01J37/145 ,  H01J37/3177 ,  H01J2237/1035 ,  H01J2237/1415 ,  H01J2237/31774

Abstract: The present invention provides two ways to form a special permeability-discontinuity unit inside every sub-lens of a multi-axis magnetic lens, which either has a simpler configuration or has more flexibility in manufacturing such as material selection and mechanical structure. Accordingly several types of multi-axis magnetic lens are proposed for various applications. One type is for general application such as a multi-axis magnetic condenser lens or a multi-axis magnetic transfer lens, another type is a multi-axis magnetic non-immersion objective which can require a lower magnetomotive force, and one more type is a multi-axis magnetic immersion objective lens which can generate smaller aberrations. Due to using permeability-discontinuity units, every multi-axis magnetic lens in this invention can also be electrically excited to function as a multi-axis electromagnetic compound lens so as to further reduce aberrations thereof and/or realize electron beam retarding for low-voltage irradiation on specimen.

Abstract translation: 本发明提供了在多轴磁性透镜的每个子透镜内部形成特殊的渗透率不连续单元的两种方式，其具有更简单的构造或者在诸如材料选择和机械结构的制造中具有更大的灵活性。 因此，针对各种应用提出了几种类型的多轴磁性透镜。 一种用于一般应用，例如多轴磁聚焦透镜或多轴磁转移透镜，另一种类型是可以要求较低磁动势的多轴磁性非浸没物镜，另一种类型是 可以产生较小像差的多轴磁浸物镜。 由于使用导磁率不连续单位，本发明中的每个多轴磁性透镜也可以被电激励以用作多轴电磁复合透镜，以便进一步降低其像差和/或实现低电压的电子束延迟 对样品照射

公开(公告)号：US08274046B1

公开(公告)日：2012-09-25

申请号：US13111851

申请日：2011-05-19

Applicant: Weiming Ren ,  Zhongwei Chen

Inventor： Weiming Ren ,  Zhongwei Chen

IPC: G21K1/08 ,  H01J37/21 ,  H01J37/20

CPC classification number: H01J37/28 ,  G21K1/093 ,  H01J37/05 ,  H01J2237/049 ,  H01J2237/057 ,  H01J2237/153

Abstract: This invention provides a monochromator for reducing energy spread of a primary charged particle beam in charged particle apparatus, which comprises a beam adjustment element, two Wien-filter type dispersion units and an energy-limit aperture. In the monochromator, a double symmetry in deflection dispersion and fundamental trajectory along a straight optical axis is formed, which not only fundamentally avoids incurring off-axis aberrations that actually cannot be compensated but also ensures the exit beam have a virtual crossover which is stigmatic, dispersion-free and inside the monochromator. Therefore, using the monochromator in SEM can reduce chromatic aberrations without additionally incurring adverse impacts, so as to improve the ultimate imaging resolution. The improvement of the ultimate imaging resolution will be more distinct for Low-Voltage SEM and the related apparatuses which are based on LVSEM principle, such as the defect inspection and defect review in semiconductor yield management. The present invention also provides two ways to build a monochromator into a SEM, one is to locate a monochromator between the electron source and the condenser, and another is to locate a monochromator between the beam-limit aperture and the objective. The former provides an additional energy-angle depending filtering, and obtains a smaller effective energy spread.

Abstract translation: 本发明提供一种用于减少带电粒子装置中的初级带电粒子束的能量扩散的单色仪，其包括光束调节元件，两个维恩滤波器型色散单元和能量限制孔径。 在单色仪中，形成沿着直线光轴的偏转色散和基本轨迹的双重对称性，其不仅从根本上避免了实际上不能被补偿的偏轴像差，而且还确保出射光束具有虚拟的虚拟交叉， 无色分离和单色仪内部。 因此，在SEM中使用单色仪可以减少色差，而不会产生不利影响，从而提高最终的成像分辨率。 对于低电压SEM和基于LVSEM原理的相关设备，如半导体产量管理中的缺陷检查和缺陷检查，最终成像分辨率的提高将会更加明显。 本发明还提供了在扫描电镜中构建单色仪的两种方法，一种是在电子源和电容器之间定位单色仪，另一种是在光束极限孔径和物镜之间定位单色仪。 前者提供额外的能量角取决于滤波，并获得较小的有效能量扩展。

公开(公告)号：US08552377B2

公开(公告)日：2013-10-08

申请号：US12968229

申请日：2010-12-14

Applicant: Yi-Xiang Wang ,  Joe Wang ,  Weiming Ren

Inventor： Yi-Xiang Wang ,  Joe Wang ,  Weiming Ren

IPC: H01J43/02 ,  H01J43/14

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/24435 ,  H01J2237/2444 ,  H01J2237/2449

Abstract: This invention provides a design to process a large range of detection beam current at low noise with a single detector. With such a design, the detection system can generate up to 1010 gain and maximum signal output at more than mini Ampere (mA) level. A condenser lens is configured to increase bandwidth of the detector that scan speed can be enhanced.

公开(公告)号：US20130153782A1

公开(公告)日：2013-06-20

申请号：US13464261

申请日：2012-05-04

Applicant: Weiming Ren ,  Zhongwei Chen

Inventor： Weiming Ren ,  Zhongwei Chen

IPC: H01J3/20 ,  H01F7/02

CPC classification number: H01J37/14 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/20 ,  H01J37/141 ,  H01J37/145 ,  H01J37/3177 ,  H01J2237/1035 ,  H01J2237/1415 ,  H01J2237/31774

Abstract: The present invention provides two ways to form a special permeability-discontinuity unit inside every sub-lens of a multi-axis magnetic lens, which either has a simpler configuration or has more flexibility in manufacturing such as material selection and mechanical structure. Accordingly several types of multi-axis magnetic lens are proposed for various applications. One type is for general application such as a multi-axis magnetic condenser lens or a multi-axis magnetic transfer lens, another type is a multi-axis magnetic non-immersion objective which can require a lower magnetomotive force, and one more type is a multi-axis magnetic immersion objective lens which can generate smaller aberrations. Due to using permeability-discontinuity units, every multi-axis magnetic lens in this invention can also be electrically excited to function as a multi-axis electromagnetic compound lens so as to further reduce aberrations thereof and/or realize electron beam retarding for low-voltage irradiation on specimen.

Abstract translation: 本发明提供了在多轴磁性透镜的每个子透镜内部形成特殊的渗透率不连续单元的两种方式，其具有更简单的构造或者在诸如材料选择和机械结构的制造中具有更大的灵活性。 因此，针对各种应用提出了几种类型的多轴磁性透镜。 一种用于一般应用，例如多轴磁聚焦透镜或多轴磁性转印透镜，另一种类型是可能需要较低磁动势的多轴磁性非浸没物镜，另外一种类型是 可以产生较小像差的多轴磁浸物镜。 由于使用导磁率不连续单位，本发明中的每个多轴磁性透镜也可以被电激励以用作多轴电磁复合透镜，以便进一步降低其像差和/或实现低电压的电子束延迟 对样品照射

公开(公告)号：US07855364B2

公开(公告)日：2010-12-21

申请号：US11944503

申请日：2007-11-23

Applicant: Weiming Ren ,  Takeshi Murakami

Inventor： Weiming Ren ,  Takeshi Murakami

IPC: G01N23/00

CPC classification number: H01J37/153 ,  H01J37/04 ,  H01J2237/04924 ,  H01J2237/1538

Abstract: A projection electronic microscope is provided for improving geometric aberration and a space charge effect within a zooming range using a zoom type transfer lens system in a projection/image formation optical system. The projection electronic microscope comprises an irradiation system for emitting a primary electron beam irradiated to a sample, and a projection/image formation optical system for guiding a second electron beams emitted from the sample with the irradiation of the primary electron beam to a detection system. The projection/image formation optical system includes a zoom type transfer lens system having a first zoom lens and a second zoom lens. The first zoom lens includes a plurality of electrodes. A predetermined electrode of said plurality of electrodes is made thicker and is applied with a positive voltage to form a space having zero field strength and a high positive potential between said first zoom lens and said second zoom lens, and a cross-over by said first zoom lens is defined in said space within a zooming range.

Abstract translation: 提供投影电子显微镜，用于在投影/图像形成光学系统中使用变焦型转印透镜系统来改善变焦范围内的几何像差和空间电荷效应。 投影电子显微镜包括用于发射照射到样品的一次电子束的照射系统，以及用于通过一次电子束的照射将从样品发射的第二电子束引导到检测系统的投影/图像形成光学系统。 投影/成像光学系统包括具有第一变焦透镜和第二变焦透镜的变焦型转印透镜系统。 第一变焦透镜包括多个电极。 所述多个电极中的预定电极被制成较厚的并且施加正电压以在所述第一变焦透镜和所述第二变焦透镜之间形成具有零场强和高正电位的空间，并且由所述第一 在变焦范围内在所述空间中定义变焦镜头。

公开(公告)号：US07759653B2

公开(公告)日：2010-07-20

申请号：US12130879

申请日：2008-05-30

Applicant: Zhong-Wei Chen ,  Xuedong Liu ,  Xu Zhang ,  Weiming Ren ,  Juying Dou

Inventor： Zhong-Wei Chen ,  Xuedong Liu ,  Xu Zhang ,  Weiming Ren ,  Juying Dou

IPC: H01J37/00 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/141 ,  H01J2237/0475 ,  H01J2237/1035

Abstract: The present invention includes an electron beam device for examining defects on semiconductor devices. The device includes an electron source for generating a primary electron beam, wherein the total acceleration potential is divided and is provided across the ground potential. Also included is at least one condenser lens for pre-focusing the primary electron beam, an aperture for confining the primary electron beam to ameliorate electron-electron interaction, wherein the aperture is positioned right underneath the last condenser lens, and a SORIL objective lens system for forming immersion magnetic field and electrostatic field to focus the primary beam onto the specimen in the electron beam path. A pair of grounding rings for providing virtual ground voltage potential to those components within the electron beam apparatus installed below a source anode and above a last polepiece of the SORIL objective lens.

Abstract translation: 本发明包括用于检查半导体器件上的缺陷的电子束装置。 该装置包括用于产生一次电子束的电子源，其中总加速电位被分开并提供在地电位之间。 还包括至少一个用于预聚焦一次电子束的聚光透镜，用于限制一次电子束以改善电子 - 电子相互作用的孔，其中孔位于最后的聚光透镜的正下方，以及SORIL物镜系统 用于形成浸没磁场和静电场，以将主光束聚焦在电子束路径中的样本上。 一对接地环，用于为安装在源极阳极和SORIL物镜的最后一个极点之上的电子束装置内的那些部件提供虚拟接地电压电位。

公开(公告)号：US07423268B2

公开(公告)日：2008-09-09

申请号：US11177140

申请日：2005-07-08

Applicant: Weiming Ren

Inventor： Weiming Ren

IPC: G01N21/00 ,  G21K7/00

CPC classification number: H01J37/04 ,  H01J37/26 ,  H01J2237/04928 ,  H01J2237/262

Abstract: It is an object of the present invention to provide an projection imaging type electron microscope in which the imposition of restrictions on the design of the illumination electron optical system by the conditions of the projection electron optical system is alleviated, so that the degree of freedom in the design of the illumination electron optical system is increased. Generated electrons 6b (principal rays) emitted from the sample 5 parallel to the optical axis are focused by a cathode lens so that these electrons cross the optical axis 3 at one point. This point is the first crossover. The generated electrons 6b are oriented parallel to the optical axis by the cathode lens 4a, and are focused as an image at the position of the electromagnetic prism 2; these electrons pass through the stigmator 7, and are incident on the relay lens 8a. These electrons are again focused, and cross the optical axis 3 at one point. This position is the second crossover. An aperture diaphragm 11 is disposed in this second crossover position. As a result, the need to install an aperture diaphragm in the first crossover position is eliminated, so that design of the illumination electron optical system is facilitated.

Abstract translation: 本发明的目的是提供一种投影成像型电子显微镜，其中通过投影电子光学系统的条件对照明电子光学系统的设计施加限制，使得自由度 照明电子光学系统的设计增加。 从样品5发射的与光轴平行的发生的电子6b（主光线）被阴极透镜聚焦，使得这些电子在一个点处与光轴3交叉。 这一点是第一个交叉。 所产生的电子6b通过阴极透镜4a与光轴平行定向，并且作为图像聚焦在电磁棱镜2的位置处; 这些电子通过标示器7，并入射到中继透镜8a上。 这些电子再次被聚焦，并且在一个点处与光轴3交叉。 这个位置是第二个交叉。 孔径光阑11设置在该第二交叉位置。 结果，消除了在第一交叉位置安装孔径光阑的需要，从而便于照明电子光学系统的设计。

公开(公告)号：US20060011833A1

公开(公告)日：2006-01-19

申请号：US11177140

申请日：2005-07-08

Applicant: Weiming Ren

Inventor： Weiming Ren

IPC: G21K7/00

CPC classification number: H01J37/04 ,  H01J37/26 ,  H01J2237/04928 ,  H01J2237/262

Abstract: It is an object of the present invention to provide an projection imaging type electron microscope in which the imposition of restrictions on the design of the illumination electron optical system by the conditions of the projection electron optical system is alleviated, so that the degree of freedom in the design of the illumination electron optical system is increased. Generated electrons 6b (principal rays) emitted from the sample 5 parallel to the optical axis are focused by a cathode lens so that these electrons cross the optical axis 3 at one point. This point is the first crossover. The generated electrons 6b are oriented parallel to the optical axis by the cathode lens 4a, and are focused as an image at the position of the electromagnetic prism 2; these electrons pass through the stigmator 7, and are incident on the relay lens 8a. These electrons are again focused, and cross the optical axis 3 at one point. This position is the second crossover. An aperture diaphragm 11 is disposed in this second crossover position. As a result, the need to install an aperture diaphragm in the first crossover position is eliminated, so that design of the illumination electron optical system is facilitated.

Abstract translation: 本发明的目的是提供一种投影成像型电子显微镜，其中通过投影电子光学系统的条件对照明电子光学系统的设计施加限制，使得自由度 照明电子光学系统的设计增加。 从样品5发射的与光轴平行的发生的电子6b（主光线）被阴极透镜聚焦，使得这些电子在一个点处与光轴3交叉。 这一点是第一个交叉。 所产生的电子6b通过阴极透镜4a与光轴平行定向，并且作为图像聚焦在电磁棱镜2的位置处; 这些电子通过标示器7，并入射到中继透镜8a上。 这些电子再次被聚焦，并且在一个点处与光轴3交叉。 这个位置是第二个交叉。 孔径光阑11设置在该第二交叉位置。 结果，消除了在第一交叉位置安装孔径光阑的需要，从而便于照明电子光学系统的设计。

公开(公告)号：US08592761B2

公开(公告)日：2013-11-26

申请号：US13551947

申请日：2012-07-18

Applicant: Weiming Ren ,  Zhongwei Chen

Inventor： Weiming Ren ,  Zhongwei Chen

IPC: G21K1/08 ,  H01J37/26 ,  H01J37/20

CPC classification number: H01J37/05 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/057 ,  H01J2237/1508 ,  H01J2237/1532

Abstract: The monochromator for reducing energy spread of a primary charged particle beam in charged particle apparatus comprises a beam adjustment element, two Wien-filter type dispersion units and an energy-limit aperture. In the monochromator, a dual proportional-symmetry in deflection dispersion and fundamental trajectory along a straight optical axis is formed, which not only fundamentally avoids incurring off-axis aberrations that actually can not be compensated but also ensures the exit beam have a virtual crossover which is stigmatic, dispersion-free and inside the monochromator. The present invention also provides two ways to build a monochromator into a SEM, in which one is to locate a monochromator between the electron source and the condenser, and another is to locate a monochromator between the beam-limit aperture and the objective. The former provides an additional energy-angle depending filtering, and obtains a smaller effective energy spread.

Abstract translation: 用于减少带电粒子装置中的初级带电粒子束的能量扩散的单色仪包括光束调节元件，两个维恩滤波器型色散单元和能量限制孔径。 在单色仪中，形成了沿着直线光轴的偏转色散和基本轨迹中的双比例对称性，其不仅从根本上避免了实际上不能被补偿的偏轴像差，而且确保出射光束具有虚拟交叉， 是单色的，是无色的，不分​​散的。 本发明还提供了将单色仪构建到SEM中的两种方法，其中一种是在电子源和电容器之间定位单色器，另一种是在光束极限孔径和物镜之间定位单色仪。 前者提供额外的能量角取决于滤波，并获得较小的有效能量扩展。

公开(公告)号：US20130112889A1

公开(公告)日：2013-05-09

申请号：US13292455

申请日：2011-11-09

Applicant: Zhongwei Chen ,  Xuedong Liu ,  Weiming Ren

Inventor： Zhongwei Chen ,  Xuedong Liu ,  Weiming Ren

IPC: H01J3/26

CPC classification number: H01J37/05 ,  H01J49/288 ,  H01J2237/057

Abstract: This invention provides a multi-pole type Wien filter, which acts more purely approaching its fundamentally expected performance. A 12-electrode electric device acts as an electric deflector,or acts as an electric deflector and an electric stigmator together. A cylindrical 4-coil magnetic device with a magnetic core acts as a magnetic deflector. Both can produce a dipole field while only incurring a negligibly-small 3rd order field harmonic. The magnetic core enhances the strength and more preciously regulates the distribution of the magnetic field originally generated by the coils. Then two ways to construct a Wien filter are proposed. One way is based on both of the foregoing electric and magnetic devices, and the other way is based on the foregoing electric device and a conventional magnetic deflector. The astigmatism in each of such Wien filters can be compensated by the electric stigmator of the electric device.

Abstract translation: 本发明提供了一种多极型Wien滤波器，其更加纯粹地接近其根本预期的性能。 12电极电气装置用作电导向器，或者用作电导向器和电极连接器。 具有磁芯的圆柱形4线圈磁性装置用作磁导流器。 两者都可以产生偶极场，同时只产生一个可忽略的小三阶场谐波。 磁芯增强了强度，更加珍贵地调节了最初由线圈产生的磁场的分布。 然后提出构建维恩滤波器的两种方法。 一种方法是基于上述电气和磁性装置两者，另一种方法是基于前述的电气装置和常规的磁导向装置。 每个这样的维恩滤波器中的像散可以通过电气设备的电极来补偿。