Invention Grant
- Patent Title: Objective lens with deflector plates immersed in electrostatic lens field
- Patent Title (中): 偏光板沉浸在静电透镜领域的物镜
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Application No.: US11716768Application Date: 2007-03-12
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Publication No.: US08698093B1Publication Date: 2014-04-15
- Inventor: Alexander J. Gubbens , Ye Yang
- Applicant: Alexander J. Gubbens , Ye Yang
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Okamoto & Benedicto LLP
- Main IPC: G21K5/04
- IPC: G21K5/04

Abstract:
One embodiment relates to an objective lens utilizing magnetic and electrostatic fields which is configured to focus a primary electron beam onto a surface of a target substrate. The objective lens includes a magnetic pole piece and an electrostatic deflector configured within the pole piece. An electrostatic lens field is determined by the pole piece and the electrostatic deflector, and the electrostatic lens field is configured by adjusting offset voltages applied to plates of the electrostatic deflector. Other embodiments, aspects and features are also disclosed.
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