Multilayer optical film having high heat resistance and method for manufacturing the same
    61.
    发明授权
    Multilayer optical film having high heat resistance and method for manufacturing the same 有权
    具有高耐热性的多层光学膜及其制造方法

    公开(公告)号:US09541689B2

    公开(公告)日:2017-01-10

    申请号:US14375588

    申请日:2012-12-27

    申请人: LG Hausys, Ltd.

    摘要: Disclosed is a multilayer optical film having a structure in which a first resin layer and a second resin layer are alternately laminated, wherein the first resin layer comprises a crystalline naphthalene dicarboxylic-acid polyester and the second resin layer comprises polyethylene terephthalate glycol (PETG). Also disclosed is a method for manufacturing a multilayer optical film comprising (a) melting extrusion a first resin comprising a crystalline naphthalene dicarboxylic-acid polyester and a second resin comprising PETG respectively and then alternately laminating the first resin and the second resin; and (b) elongating the laminated sheet in step (a) and then thermosetting them.

    摘要翻译: 公开了具有交替层叠第一树脂层和第二树脂层的结构的多层光学膜,其中第一树脂层包含结晶萘二羧酸聚酯,第二树脂层包含聚对苯二甲酸乙二醇酯(PETG)。 还公开了一种制造多层光学膜的方法,其包括(a)分别将包含结晶萘二羧酸聚酯的第一树脂和包含PETG的第二树脂熔融挤出,然后交替层压第一树脂和第二树脂; 和(b)在步骤(a)中拉伸层压片材,然后将它们热固化。

    INFRARED SHIELDING FILM
    66.
    发明申请
    INFRARED SHIELDING FILM 审中-公开
    红外屏蔽膜

    公开(公告)号:US20150177433A1

    公开(公告)日:2015-06-25

    申请号:US14413359

    申请日:2013-07-08

    IPC分类号: G02B5/28 G02B1/14

    摘要: [Problem] To provide a an infrared shielding film which realizes a balance between the hard coating properties of the cured resin layer and the suppression of peeling or cracking of the film, while having heat shielding characteristics of an infrared shielding film.[Solution] An infrared shielding film including a substrate; an infrared reflecting layer having at least one or more low refractive index layers and at least one or more high refractive index layers laminated therein; and a cured resin layer formed at the outermost surface, laminated together, the cured resin layer containing inorganic nanoparticles, in which the hardness obtainable by the pencil hardness test described in JIS K5600-5-4:1999 is from 2B to 3H; the number of scratches obtainable by a steel wool test (load 500 g/cm2, 10 reciprocations) is 15 or less; and the mandrel diameter at which the hard coated surface begins to crack in the bending test described in JIS K5600-5-1:1999 (cylindrical mandrel method) is 15 mm or less.

    摘要翻译: [问题]提供一种红外线屏蔽膜,其实现了固化树脂层的硬涂层性能与抑制膜的剥离或破裂之间的平衡,同时具有红外屏蔽膜的隔热特性。 [解决方案]一种包括基板的红外屏蔽膜; 具有至少一个或多个低折射率层和层压在其中的至少一个或多个高折射率层的红外反射层; 和在最外层形成的固化树脂层,层叠在一起,含有无机纳米粒子的固化树脂层,其中通过JIS K5600-5-4:1999中所述的铅笔硬度试验得到的硬度为2B〜3H; 通过钢丝绒试验(载荷500g / cm 2,10次往复运动)可获得的划痕数为15个以下; 在JIS K5600-5-1:1999(圆筒型心轴法)所示的弯曲试验中硬质表面开始裂纹的心轴直径为15mm以下。

    MULTILAYER OPTICAL FILM HAVING HIGH HEAT RESISTANCE AND METHOD FOR MANUFACTURING THE SAME
    69.
    发明申请
    MULTILAYER OPTICAL FILM HAVING HIGH HEAT RESISTANCE AND METHOD FOR MANUFACTURING THE SAME 有权
    具有高耐热性的多层光学薄膜及其制造方法

    公开(公告)号:US20150002935A1

    公开(公告)日:2015-01-01

    申请号:US14375588

    申请日:2012-12-27

    申请人: LG Hausys, Ltd.

    摘要: The present invention provides a multilayer optical film having a structure in which a first resin layer and a second resin layer are alternately laminated, wherein the first resin layer comprises a crystalline naphthalene dicarboxylic-acid polyester and the second resin layer comprises polyethylene terephthalate glycol (PETG).Also, the present invention provides a method for manufacturing a multilayer optical film comprising (a) melting extrusion a first resin comprising a crystalline naphthalene dicarboxylic-acid polyester and a second resin comprising PETG respectively and then alternately laminating the first resin and the second resin; and (b) elongating the laminated sheet in step (a) and then thermosetting them.

    摘要翻译: 本发明提供了具有交替层叠第一树脂层和第二树脂层的结构的多层光学膜,其中第一树脂层包含结晶萘二羧酸聚酯,第二树脂层包含聚对苯二甲酸乙二醇酯(PETG )。 另外,本发明提供一种多层光学膜的制造方法,其特征在于,具备:(a)分别熔融挤出包含结晶萘二羧酸聚酯的第一树脂和包含PETG的第二树脂,然后交替层叠第一树脂和第二树脂; 和(b)在步骤(a)中拉伸层压片材,然后将它们热固化。

    SPIN-ON CARBON COMPOSITIONS FOR LITHOGRAPHIC PROCESSING
    70.
    发明申请
    SPIN-ON CARBON COMPOSITIONS FOR LITHOGRAPHIC PROCESSING 有权
    用于石墨加工的旋转碳组合物

    公开(公告)号:US20140356593A1

    公开(公告)日:2014-12-04

    申请号:US14461109

    申请日:2014-08-15

    IPC分类号: B32B33/00 B32B9/04

    摘要: The invention described herein is directed towards spin-on carbon materials comprising polyamic acid compositions and a crosslinker in a solvent system. The materials are useful in trilayer photolithography processes. Films made with the inventive compositions are not soluble in solvents commonly used in lithographic materials, such as, but not limited to PGME, PGMEA, and cyclohexanone. However, the films can be dissolved in developers commonly used in photolithography. In one embodiment, the films can be heated at high temperatures to improve the thermal stability for high temperature processing. Regardless of the embodiment, the material can be applied to a flat/planar or patterned surface. Advantageously, the material exhibits a wiggling resistance during pattern transfer to silicon substrate using fluorocarbon etch.

    摘要翻译: 本文描述的本发明涉及在溶剂体系中包含聚酰胺酸组合物和交联剂的旋涂碳材料。 这些材料在三层光刻工艺中是有用的。 用本发明组合物制成的薄膜不溶于通常用于平版印刷材料的溶剂中,例如但不限于PGME,PGMEA和环己酮。 然而,这些膜可以溶解在通常用于光刻中的显影剂中。 在一个实施方案中,可以在高温下加热膜以改善用于高温处理的热稳定性。 不管实施例如何,材料可以应用于平面/平面或图案化表面。 有利地,该材料在使用碳氟化合物蚀刻的图案转移到硅衬底期间表现出摆动阻力。