公开(公告)号：US12117726B2

公开(公告)日：2024-10-15

申请号：US18220799

申请日：2023-07-11

Applicant: ASML NETHERLANDS B.V.

Inventor： David Ferdinand Vles ,  Chaitanya Krishna Ande ,  Antonius Franciscus Johannes De Groot ,  Adrianus Johannes Maria Giesbers ,  Johannes Joseph Janssen ,  Paul Janssen ,  Johan Hendrik Klootwijk ,  Peter Simon Antonius Knapen ,  Evgenia Kurganova ,  Marcel Peter Meijer ,  Wouter Rogier Meijerink ,  Maxim Aleksandrovich Nasalevich ,  Arnoud Willem Notenboom ,  Raymond Olsman ,  Hrishikesh Patel ,  Mária Péter ,  Gerrit van den Bosch ,  Wilhelmus Theodorus Anthonius Johannes van den Einden ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Willem-Pieter Voorthuijzen ,  Hendrikus Jan Wondergem ,  Aleksandar Nikolov Zdravkov

IPC: G03F1/64

CPC classification number: G03F1/64

Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.

公开(公告)号：US12117721B2

公开(公告)日：2024-10-15

申请号：US18087320

申请日：2022-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf Kemper ,  Sjoerd Nicolaas Lambertus Donders ,  Joost Jeroen Ottens ,  Edwin Cornelis Kadijk ,  Sergei Shulepov

IPC: G03F7/20 ,  G03B27/42 ,  G03F7/00

CPC classification number: G03B27/42 ,  G03F7/70341 ,  G03F7/70716

Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.

公开(公告)号：US20240339292A1

公开(公告)日：2024-10-10

申请号：US18748758

申请日：2024-06-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Yan REN ,  Marijke SCOTUZZI ,  Albertus Victor Gerardus MANGNUS ,  Erwin Paul SMAKMAN

IPC: H01J37/244 ,  H01J37/10 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/10 ,  H01J37/28

Abstract: There is provided a charged particle device for a charged particle inspection apparatus for projecting an array of sub-beams towards a sample, the charged particle device comprising: a charged particle optical element and a detector. The charged particle optical element has an up-beam surface having a plurality of openings to generate an array of sub-beams from a charged particle beam. In the charged particle optical element are defined: sub-beam apertures and monitoring apertures. The sub-beam aperture extend through the charged particle element for paths of the array of sub-beams towards a sample. The monitoring aperture extends through the charged particle element. The detector is in the monitoring aperture. At least part of the detector is down-beam of the up-beam surface. The detector measures a parameter of a portion of the charged particle beam incident on the detector.

公开(公告)号：US20240331971A1

公开(公告)日：2024-10-03

申请号：US18741204

申请日：2024-06-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Jurgen VAN SOEST ,  Vincent Sylvester KUIPER ,  Yinglong LI

IPC: H01J37/20 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2001

Abstract: A charged particle assessment apparatus comprising: a charged particle beam device; an actuated sample stage; a hot component and a thermal compensator. The actuated sample stage is configured to hold a sample. The hot component is configured to operate such that, during operation, heat is radiated toward a sample held on the sample holder. The hot component is smaller than the sample. The thermal compensator is configured to heat the sample so as to reduce thermal gradients therein.

公开(公告)号：US20240324089A1

公开(公告)日：2024-09-26

申请号：US18268122

申请日：2021-11-23

Applicant: ASML Netherlands B.V.

Inventor： Petrus Wilhelmus SMORENBURG ,  Jan Otger LUITEN ,  Herman Brian SCHAAP ,  Gerardus, Hubertus Jim FRANSSEN

IPC: H05G2/00

CPC classification number: H05G2/00

Abstract: A method for controlling a density distribution of electrons provided by an electron source for use in hard X-ray, soft X-ray and/or extreme ultraviolet generation, the method comprising generating a plurality of electrons from a pattern of ultracold excited atoms using an ionization laser inside a cavity, wherein the electrons have a density distribution determined by at least one of the patterns of excited atoms and the ionization laser, and accelerating the electrons out of the cavity using a non-static acceleration profile, wherein the acceleration profile controls the density distribution of the electrons as they exit the cavity.

公开(公告)号：US20240321547A1

公开(公告)日：2024-09-26

申请号：US18580269

申请日：2022-07-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: H01J37/22 ,  H01J37/10 ,  H01J37/147 ,  H01J37/244 ,  H01J37/317

CPC classification number: H01J37/226 ,  H01J37/10 ,  H01J37/1474 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/0453 ,  H01J2237/2443 ,  H01J2237/24592

Abstract: Charged-particle optical devices are disclosed. In one arrangement, a device includes a charged particle column and a light sensor. An objective lens array projects a plurality of beams towards a sample and has a plurality of electrodes arranged along a path of the plurality of beams. A plurality of scintillators receives signal particles emitted from the sample. Light is generated in response to the received signal particles. A light guiding arrangement guides light generated by the scintillators to the light sensor. The light guiding arrangement includes a mirror defining a plurality of apertures to allow passage of the plurality of beams through the mirror towards the sample.

公开(公告)号：US20240319123A1

公开(公告)日：2024-09-26

申请号：US18691828

申请日：2022-08-16

Applicant: ASML Netherlands B.V.

Inventor： Achim WOESSNER ,  Younghoon SONG ,  Pioter NIKOLSKI ,  Yun A SUNG ,  Antonio CORRADI ,  Hermanus Adrianus DILLEN

IPC: G01N23/2251

CPC classification number: G01N23/2251 ,  G01N2223/304 ,  G01N2223/306 ,  G01N2223/401 ,  G01N2223/418 ,  G01N2223/6116 ,  G01N2223/646

Abstract: Apparatuses, systems, and methods for providing beams for classifying and identifying failure mechanisms associated with a sample of charged particle beam systems. In some embodiments, a method may include analyzing a first plurality of voltage contrast images of a sample to identify a plurality of defects; and analyzing a pattern of a subset of the plurality of defects to determine a failure mechanism for the subset of the plurality of defects.

公开(公告)号：US12099307B2

公开(公告)日：2024-09-24

申请号：US17920763

申请日：2021-03-19

Applicant: ASML Netherlands B.V.

Inventor： Sjoerd Martijn Huiberts ,  René Josephus Johannes Van Der Meulen ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC: G03F7/00 ,  G02B7/182

CPC classification number: G03F7/70258 ,  G02B7/1828 ,  G03F7/70141

Abstract: Disclosed is an actuator unit for positioning an optical element, comprising a first reluctance actuator comprising a first stator part and a first mover part separated by a gap in a first direction. The first mover part is constructed and arranged to be connected to the optical element and for moving the optical element. The first stator part is constructed and arranged to exert a magnetic force on the first mover part along a first line of actuation. The first mover part is movable relative to the first stator part in the first direction. The first stator part and the first mover part are constructed and arranged such that the first line of actuation is, in operational use, moving along with the first mover part in a second direction perpendicular to the first direction, for at least a predetermined movement range of the first mover part in the second direction.

公开(公告)号：US12099306B2

公开(公告)日：2024-09-24

申请号：US17441168

申请日：2020-02-20

Applicant: ASML Netherlands B.V.

Inventor： Oscar Franciscus Jozephus Noordman ,  Antonius Theodorus Wilhelmus Kempen ,  Jan Bernard Plechelmus Van Schoot ,  Marinus Aart Van Den Brink

IPC: G03F7/00

CPC classification number: G03F7/70033 ,  G03F7/70425 ,  G03F7/70558

Abstract: A lithographic system comprises a radiation source and a lithographic apparatus. The radiation source provides radiation to the lithographic apparatus. The lithographic apparatus uses the radiation for imaging a pattern onto multiple target areas on a layer of photo-resist on a semiconductor substrate. The imaging requires a pre-determined dose of radiation. The system is controlled so as to set a level of a power of the radiation in dependence on a magnitude of the pre-determined dose.

公开(公告)号：US20240313684A1

公开(公告)日：2024-09-19

申请号：US18577062

申请日：2022-06-30

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER

IPC: H02P25/064 ,  G03F7/00 ,  H02P23/00

CPC classification number: H02P25/064 ,  G03F7/70516 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70775 ,  H02P23/0022

Abstract: The invention provides a method of determining a motor-dependent commutation model for an electromagnetic motor, whereby the electromagnetic motor comprises a first member comprising a coil array comprising at least M coils, and a second member comprising a magnet array configured to generate a spatially alternating magnetic field, whereby the first member and the second member are configured to displace relative to each other in N degrees of freedom, N