公开(公告)号：US20250095133A1

公开(公告)日：2025-03-20

申请号：US18962091

申请日：2024-11-27

Applicant: ASML Netherlands B.V.

Inventor： Vincent Sylvester KUIPER ,  Marco Jan-Jaco WIELAND

IPC: G06T7/00 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

Abstract: The embodiments of the present disclosure provide a method of processing data derived from a sample, comprising processing an initial data set of elements derived from a detection by a detector for calibration, the data set comprising elements representing nuisance signals and detection signals. The processing of the initial data set comprising: fitting a distribution model to the initial data set to create a nuisance distribution model; setting a signal strength value, and selecting elements in the initial data set having a magnitude greater than the signal strength value as a set of defect candidates; fitting a distribution model to the set of defect candidates to create a defect distribution model of detection signals; and determining a signal strength threshold dependent on at least the defect distribution model. The determining comprising correcting the defect distribution model.

公开(公告)号：US20250118528A1

公开(公告)日：2025-04-10

申请号：US18982902

申请日：2024-12-16

Applicant: ASML Netherlands B.V.

Inventor： Marco Jan-Jaco WIELAND ,  Vincent Sylvester KUIPER ,  Anagnostis TSIATMAS

IPC: H01J37/22 ,  H01J37/26 ,  H01J37/28

Abstract: An assessment method comprising: using an assessment apparatus to generate assessment signals representing a property of a surface of a sample; processing the assessment signals to identify candidate defects and outputting a candidate defect signal; monitoring the status of the assessment apparatus for error conditions and generating a status signal indicating any error conditions during functioning of the assessment apparatus; and analysing the candidate defect signal to determine if the candidate defects are real defects; wherein analysis of a candidate defect is not completed if the status signal indicates that the assessment signal(s) and/or the candidate defect signal corresponding to the candidate defect would have been affected by an error condition.

公开(公告)号：US20230023939A1

公开(公告)日：2023-01-26

申请号：US17869550

申请日：2022-07-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Vincent Sylvester KUIPER ,  Marija TRAJANOSKA ,  Marco Jan-Jaco WIELAND

IPC: G03F7/20 ,  G06T7/00

Abstract: A data processing device for detecting defects in sample image data generated by a charged particle assessment system, the device comprising: a first processing module configured to receive a sample image datastream from the charged particle assessment system, the sample image datastream comprising an ordered series of data points representing an image of the sample, and to apply a first defect detection test to select a subset of the sample image datastream as first selected data, wherein the first defect detection test is a localised test which is performed in parallel with receipt of the sample image datastream; and a second processing module configured to receive the first selected data and to apply a second defect detection test to select a subset of the first selected data as second selected data.

公开(公告)号：US20240331971A1

公开(公告)日：2024-10-03

申请号：US18741204

申请日：2024-06-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Jurgen VAN SOEST ,  Vincent Sylvester KUIPER ,  Yinglong LI

IPC: H01J37/20 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2001

Abstract: A charged particle assessment apparatus comprising: a charged particle beam device; an actuated sample stage; a hot component and a thermal compensator. The actuated sample stage is configured to hold a sample. The hot component is configured to operate such that, during operation, heat is radiated toward a sample held on the sample holder. The hot component is smaller than the sample. The thermal compensator is configured to heat the sample so as to reduce thermal gradients therein.

公开(公告)号：US20230207259A1

公开(公告)日：2023-06-29

申请号：US18088499

申请日：2022-12-23

Applicant: ASML Netherlands B.V.

Inventor： Erwin SLOT ,  Niels VERGEER ,  Vincent Sylvester KUIPER

IPC: H01J37/304 ,  H01J37/28

CPC classification number: H01J37/3045 ,  H01J37/28 ,  H01J2237/1501

Abstract: The present invention concerns a method of determining alignment of electron optical components in a charged particle apparatus. The charged particle apparatus comprising: an aperture array and a detector configured to detect charged particles corresponding to beamlets that pass through the corresponding apertures in the aperture array. The method comprises: scanning each beamlet in a plane of the aperture array over a portion of the aperture array in which a corresponding aperture of the aperture array is defined so that charged particles of each beamlet may pass through the corresponding aperture; detecting during the scan any charged particles corresponding to each beamlet that passes through the corresponding aperture; generating a detection pixel for each beamlet based on the detection of charged particles corresponding to each beamlet at intervals of the scan; and collecting information comprised in the detection pixel such as the intensity of charged particles.

公开(公告)号：US20240339290A1

公开(公告)日：2024-10-10

申请号：US18748694

申请日：2024-06-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Jurgen VAN SOEST ,  Marco Jan-Jaco WIELAND ,  Vincent Sylvester KUIPER

IPC: H01J37/20 ,  H01J37/304 ,  H01J37/317

CPC classification number: H01J37/20 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/20228

Abstract: Methods of processing a sample and charged particle assessment systems are disclosed. In one arrangement, a sample is processed using a multi-beam of sub-beams of charged particles. At least a portion of a sub-beam processable area is processed with each sub-beam. The sub-beam processable area comprising an array of sections having rows of sections and columns of sections. Each row of sections defines an elongate region that is substantially equal to or smaller than a pitch at the sample surface of the sub-beams in the multi-beam. A plurality of the sections are processed.

公开(公告)号：US20240087842A1

公开(公告)日：2024-03-14

申请号：US18516020

申请日：2023-11-21

Applicant: ASML Netherlands B.V.

Inventor： Marco Jan-Jaco WIELAND ,  Vincent Sylvester KUIPER

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: A data processing device for detecting defects in sample images generated by a charged particle assessment system, the device comprising: an input module, a filter module, a reference image module and a comparator. The input module is configured to receive a sample image from the charged particle assessment system. The filter module is configured to apply a filter to the sample image to generate a filtered sample image. The reference image module is configured to provide a reference image based on one or more source images. The comparator is configured to compare the filtered sample image to the reference image so as to detect defects in the sample image.