公开(公告)号：US20230023939A1

公开(公告)日：2023-01-26

申请号：US17869550

申请日：2022-07-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Vincent Sylvester KUIPER ,  Marija TRAJANOSKA ,  Marco Jan-Jaco WIELAND

IPC: G03F7/20 ,  G06T7/00

Abstract: A data processing device for detecting defects in sample image data generated by a charged particle assessment system, the device comprising: a first processing module configured to receive a sample image datastream from the charged particle assessment system, the sample image datastream comprising an ordered series of data points representing an image of the sample, and to apply a first defect detection test to select a subset of the sample image datastream as first selected data, wherein the first defect detection test is a localised test which is performed in parallel with receipt of the sample image datastream; and a second processing module configured to receive the first selected data and to apply a second defect detection test to select a subset of the first selected data as second selected data.