公开(公告)号：US20220392741A1

公开(公告)日：2022-12-08

申请号：US17770043

申请日：2020-10-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Maikel Robert GOOSEN ,  Erwin Paul SMAKMAN

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/244 ,  H01J37/22

Abstract: Systems and methods of profiling a charged-particle beam are disclosed. The method of profiling a charged-particle beam may comprise activating a charged-particle source to generate the charged-particle beam along a primary optical axis, modifying the charged-particle beam by adjusting an interaction between the charged-particle beam and a standing optical wave, detecting charged particles from the modified charged-particle beam after the interaction with the standing optical wave, and determining a profile of the charged-particle beam based on the detected charged particles. Alternatively, the method may include activating an optical source, modifying the optical beam by adjusting an interaction between the optical beam and a charged-particle beam, detecting an optical signal from the modified optical beam, and determining a characteristic of the charged-particle beam based on the detected optical signal.

公开(公告)号：US20240331968A1

公开(公告)日：2024-10-03

申请号：US18742934

申请日：2024-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Yan REN ,  Albertus Victor Gerardus MANGNUS ,  Marijke SCOTUZZI ,  Erwin Paul SMAKMAN

IPC: H01J37/147 ,  H01J37/09 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/1471 ,  H01J37/09 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/24578

Abstract: A charged-particle apparatus generates a plurality of sub-beams from a source beam of charged particles and direct the sub-beams downbeam toward a sample position. The charged-particle apparatus comprises a charged particle source, an aperture array, and a charged particle optical component. The charged-particle source comprises an emitter to emit a source beam of charged particles along a divergent path. The aperture array is positioned in the divergent path so the aperture array generates sub-beams from the source beam. The charged-particle-optical component acts on the source beam upbeam of the aperture array. The charged-particle-optical component comprises a multipole and/or a charged-particle lens. The multipole operates on the source beam to vary the position of the divergent path at the aperture array. The multipole may vary a cross-sectional shape of the divergent path at the aperture array. The charged-particle-optical lens compensates for variations in distance between the emitter and the aperture array.

公开(公告)号：US20240128043A1

公开(公告)日：2024-04-18

申请号：US18530109

申请日：2023-12-05

Applicant: ASML Netherlands B.V.

Inventor： Jurgen VAN SOEST ,  Roy Ramon VEENSTRA ,  Erwin Paul SMAKMAN ,  Tom VAN ZUTPHEN ,  Albertus Victor Gerardus MANGNUS

IPC: H01J37/12 ,  H01J37/147

CPC classification number: H01J37/12 ,  H01J37/147 ,  H01J2237/2448

Abstract: The disclosure relates to a charged particle beam apparatus configured to project charged particle beams towards a sample. The charged particle beam apparatus comprises: a plurality of charged particle-optical columns configured to project respective charged particle beams towards the sample, wherein each charged particle-optical column comprises: a charged particle source configured to emit the charged particle beam towards the sample, the charged particle sources being comprised in a source array; an objective lens comprising an electrostatic electrode configured to direct the charged particle beam towards the sample; and a detector associated with the objective lens array, configured to detect signal charged particles emitted from the sample. The objective lens is the most down-beam element of the charged particle-optical column configured to affect the charged particle beam directed towards the sample.

公开(公告)号：US20180373159A1

公开(公告)日：2018-12-27

申请号：US16064366

申请日：2016-12-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Erwin Paul SMAKMAN ,  Coen Adrianus VERSCHUREN

IPC: G03F7/20 ,  B22F3/105 ,  G21B3/00

Abstract: A method and apparatus to provide a plurality of radiation beams modulated according to at least two sub patterns of a pattern using radiation sources, the radiation sources producing radiation beams of at least two spot sizes such that each of the radiation beams having a same spot size of the at least two spot sizes is used to produce one of the at least two sub patterns, project the plurality of beams onto a substrate, and provide relative motion between the substrate and the plurality of radiation sources, in a scanning direction to expose the substrate. A method and apparatus to provide radiation modulated according to a desired pattern using a plurality of rows of two-dimensional arrays of radiation sources, project the modulated radiation onto a substrate using a projection system, and remove fluid from between the projection system and the substrate using one or more fluid removal units.

公开(公告)号：US20240339292A1

公开(公告)日：2024-10-10

申请号：US18748758

申请日：2024-06-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Yan REN ,  Marijke SCOTUZZI ,  Albertus Victor Gerardus MANGNUS ,  Erwin Paul SMAKMAN

IPC: H01J37/244 ,  H01J37/10 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/10 ,  H01J37/28

Abstract: There is provided a charged particle device for a charged particle inspection apparatus for projecting an array of sub-beams towards a sample, the charged particle device comprising: a charged particle optical element and a detector. The charged particle optical element has an up-beam surface having a plurality of openings to generate an array of sub-beams from a charged particle beam. In the charged particle optical element are defined: sub-beam apertures and monitoring apertures. The sub-beam aperture extend through the charged particle element for paths of the array of sub-beams towards a sample. The monitoring aperture extends through the charged particle element. The detector is in the monitoring aperture. At least part of the detector is down-beam of the up-beam surface. The detector measures a parameter of a portion of the charged particle beam incident on the detector.

公开(公告)号：US20230324318A1

公开(公告)日：2023-10-12

申请号：US18327847

申请日：2023-06-01

Applicant: ASML Netherlands B.V.

Inventor： Yan REN ,  Erwin SLOT ,  Albertus Victor, Gerardus MANGNUS ,  Marijke SCOTUZZI ,  Erwin Paul SMAKMAN

IPC: G01N23/2251 ,  H01J37/244 ,  H01J37/09 ,  H01J37/12 ,  H01J37/147

CPC classification number: G01N23/2251 ,  H01J37/244 ,  H01J37/09 ,  H01J37/12 ,  H01J37/1472 ,  G01N2223/303 ,  H01J2237/2448 ,  H01J2237/0453 ,  H01J37/20

Abstract: A charged-particle tool configured to generate a plurality of sub-beams from a beam of charged particles and direct the sub-beams downbeam toward a sample position, the tool charged-particle tool comprising at least three charged-particle-optical components; a detector module; and a controller. Thea detector module is configured to generate a detection signal in response to charged particles that propagate upbeam from the direction of the sample position. The controller is configured to operate the tool in a calibration mode. The charged-particle-optical components include: a charged-particle source configured to emit a beam of charged particles and a beam generator configured to generate the sub-beams. The detection signal contains information about alignment of at least two of the charged-particle-optical components. The charged-particle optical components comprise two or more charged-particle optical elements comprising an array of apertures for which the charged particles may be monitored.

公开(公告)号：US20190227442A1

公开(公告)日：2019-07-25

申请号：US16314740

申请日：2017-06-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Erwin Paul SMAKMAN ,  Coen Adrianus VERSCHUREN

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70625 ,  G03F7/70383 ,  G03F7/70391 ,  G03F7/70508 ,  G03F9/7026

Abstract: An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including an array of radiation source modules configured to project the modulated radiation onto a respective array of exposure regions on the substrate; and a distributed processing system configured to process projection related data to enable the projection of the desired pattern onto the substrate, the distributed processing system including at least one central processing unit and a plurality of module processing units each associated with a respective radiation source module.

公开(公告)号：US20190006147A1

公开(公告)日：2019-01-03

申请号：US16064193

申请日：2016-12-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Bernardo KASTRUP ,  Johannes Catharinus Hubertus MULKENS ,  Marinus Aart VAN DEN BRINK ,  Jozef Petrus Henricus BENSCHOP ,  Erwin Paul SMAKMAN ,  Tamara DRUZHININA ,  Coen Adrianus VERSCHUREN

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/15 ,  H01J37/244

Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns. The actuator system may include a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.

公开(公告)号：US20230154722A1

公开(公告)日：2023-05-18

申请号：US17361119

申请日：2019-12-17

Applicant: ASML Netherlands B.V.

Inventor： Arno Jan BLEEKER ,  Pieter Willem Herman DE JAGER ,  Maikel Robert GOOSEN ,  Erwin Paul SMAKMAN ,  Albertus Victor Gerardus MANGNUS ,  Yan REN ,  Adam LASSISE

IPC: H01J37/147 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/1474 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2817 ,  H01J2237/2448 ,  H01J2237/24475

Abstract: Apparatuses and methods for charged-particle detection may include a deflector system configured to direct charged-particle pulses, a detector having a detection element configured to detect the charged-particle pulses, and a controller having a circuitry configured to control the deflector system to direct a first and second charged-particle pulses to the detection element; obtain first and second timestamps associated with when the first charged-particle pulse is directed by the deflector system and detected by the detection element, respectively, and third and fourth timestamps associated with when the second charged-particle pulse is directed by the deflector system and detected by the detection element, respectively; and identify a first and second exiting beams based on the first and second timestamps, and the third and fourth timestamps, respectively.

公开(公告)号：US20210249224A1

公开(公告)日：2021-08-12

申请号：US17054559

申请日：2019-05-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Erwin Paul SMAKMAN ,  Albertus Victor Gerardus MANGNUS ,  Maikel Robert GOOSEN

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/20 ,  H01J37/04 ,  H01J37/244

Abstract: An electron beam apparatus including: an electron beam source configured to generate an electron beam; a beam conversion unit including an aperture array configured to generate a plurality of beamlets from the electron beam, and a deflector unit configured to deflect one or more groups of the plurality of beamlets; and a projection system configured to project the plurality of beamlets onto an object, wherein the deflector unit is configured to deflect the one or more groups of the plurality of beamlets to impinge on the object at different angles of incidence, each beamlet in a group having substantially the same angle of incidence on the object.