公开(公告)号：US20130216098A1

公开(公告)日：2013-08-22

申请号：US13824855

申请日：2011-08-30

申请人： Osamu Hasegawa ,  Hiroshi Morioka ,  Noppharit Tongprasit ,  Sangkyu Yi

发明人： Osamu Hasegawa ,  Hiroshi Morioka ,  Noppharit Tongprasit ,  Sangkyu Yi

IPC分类号： G06K9/00

CPC分类号： G06K9/00664 ,  G05D1/0253 ,  G05D1/0274 ,  G06T7/246 ,  G06T7/579 ,  G06T2207/10016 ,  G06T2207/20076 ,  G06T2207/30241 ,  G06T2207/30244 ,  Y10S901/01

摘要： Performing map construction under a crowded environment where there are a lot of people. It includes a successive image acquisition unit that obtains images that are taken while a robot is moving, a local feature quantity extraction unit that extracts a quantity at each feature point from the images, a feature quantity matching unit that performs matching among the quantities in the input images, where quantities are extracted by the extraction unit, an invariant feature quantity calculation unit that calculates an average of the matched quantities among a predetermined number of images by the matching unit as an invariant feature quantity, a distance information acquisition unit that calculates distance information corresponding to each invariant feature quantity based on a position of the robot at times when the images are obtained, and a map generation unit that generates a local metrical map as a hybrid map.

摘要翻译： 在有很多人的拥挤的环境下进行地图建设。 它包括连续图像获取单元，其获得在机器人移动期间拍摄的图像;局部特征量提取单元，从图像中提取每个特征点处的数量;特征量匹配单元， 输入图像，其中通过提取单元提取量;不变特征量计算单元，其通过匹配单元计算预定数量的图像中的匹配量的平均值作为不变特征量;距离信息获取单元，其计算距离 基于在获取图像时的机器人的位置对应于每个不变特征量的信息，以及生成本地计量图作为混合图的地图生成单元。

公开(公告)号：US20090032844A1

公开(公告)日：2009-02-05

申请号：US12181765

申请日：2008-07-29

申请人： Jusuke OGURA ,  Hikaru KOKURA ,  Hiroshi MORIOKA ,  Kazuo KAWAMURA

发明人： Jusuke OGURA ,  Hikaru KOKURA ,  Hiroshi MORIOKA ,  Kazuo KAWAMURA

IPC分类号： H01L29/778 ,  H01L21/336

CPC分类号： H01L21/823814 ,  H01L21/823807 ,  H01L21/823871 ,  H01L29/165 ,  H01L29/665 ,  H01L29/6659 ,  H01L29/66636 ,  H01L29/7833 ,  H01L29/7834 ,  H01L29/7848

摘要： A method of manufacturing a semiconductor device has forming a transistor including a source and a drain, forming a mixed crystal layer over the source and the drain, forming a silicide layer over the mixed crystal layer, forming a first insulating film and a second insulating film over the silicide layer, forming a contact hole, performing an oxygen plasma treatment, and forming a conductive plug in the contact hole.

摘要翻译： 一种制造半导体器件的方法，其特征在于，形成包括源极和漏极的晶体管，在源极和漏极上形成混晶层，在混合晶体层上形成硅化物层，形成第一绝缘膜和第二绝缘膜 在硅化物层上形成接触孔，进行氧等离子体处理，以及在接触孔中形成导电塞。

公开(公告)号：US20090001425A1

公开(公告)日：2009-01-01

申请号：US12163168

申请日：2008-06-27

申请人： Junichi Ariyoshi ,  Toru Anezaki ,  Hiroshi Morioka

发明人： Junichi Ariyoshi ,  Toru Anezaki ,  Hiroshi Morioka

IPC分类号： H01L27/118 ,  H01L21/3205

CPC分类号： H01L27/115 ,  H01L27/11521 ,  H01L27/11526 ,  H01L27/11531

摘要： A method of manufacturing a semiconductor device has forming a first conductive film over a semiconductor substrate, etching the first conductive film, forming a plurality of first conductive patterns arranged in a first direction, and forming a side surface on an outside of a conductive pattern positioned at an end among the plurality of first conductive patterns such that the side surface has a first inclination angle smaller than a second inclination angle of a side surface on an inside of the conductive pattern positioned at the end, forming a first insulation film over the plurality of first conductive patterns, and forming a second conductive pattern over the first insulation film.

摘要翻译： 一种制造半导体器件的方法，在半导体衬底上形成第一导电膜，蚀刻第一导电膜，形成沿第一方向布置的多个第一导电图案，并且在位于 在所述多个第一导电图案中的一端，使得所述侧表面具有小于位于所述端部的所述导电图案的内侧上的侧表面的第二倾斜角的第一倾斜角度，在所述多个第一导电图案中形成第一绝缘膜 的第一导电图案，并且在第一绝缘膜上形成第二导电图案。

公开(公告)号：US06703850B2

公开(公告)日：2004-03-09

申请号：US10430188

申请日：2003-05-07

申请人： Mari Nozoe ,  Hiroyuki Shinada ,  Kenji Watanabe ,  Keiichi Saiki ,  Aritoshi Sugimoto ,  Hiroshi Morioka ,  Maki Tanaka ,  Hiroshi Miyai

发明人： Mari Nozoe ,  Hiroyuki Shinada ,  Kenji Watanabe ,  Keiichi Saiki ,  Aritoshi Sugimoto ,  Hiroshi Morioka ,  Maki Tanaka ,  Hiroshi Miyai

IPC分类号： G01R31305

CPC分类号： H01J37/28 ,  G01R31/307 ,  G09G3/006 ,  H01J37/265 ,  H01J2237/221 ,  H01J2237/2817 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： In order to obtain optimum irradiation conditions of an electron beam according to the material and structure of a circuit pattern to be inspected and the kind of a failure to be detected and inspect under the optimum conditions without delay of the inspection time, an inspection device for irradiating the electron beam 19 to the sample board 9 which is a sample, detecting generated secondary electrons by the detector 7, storing obtained signals sequentially in the storage, comparing the same pattern stored in the storage by the comparison calculation unit, and extracting a failure by comparing the predetermined threshold value with the comparison signal by the failure decision unit is provided, wherein the optimum value of the irradiation energy is stored in the data base inside the device beforehand according to the structure of a sample and a recommended value of the irradiation energy suited to inspection can be searched for by inputting or selecting the irradiation energy by a user or inputting information regarding the structure of an article to be inspected.

摘要翻译： 为了根据要检查的电路图案的材料和结构获得电子束的最佳照射条件以及在最佳条件下无故障检测的种类和检查时间的延迟，检查装置 将电子束19照射到作为样本的样品板9，由检测器7检测产生的二次电子，将获得的信号顺序地存储在存储器中，比较由比较计算单元存储在存储器中的相同模式，并提取故障 提供了通过故障判定单元将预定阈值与比较信号进行比较，其中根据样本的结构和照射的推荐值，将照射能量的最佳值预先存储在设备内部的数据库中 可以通过使用照射能量的输入或选择来搜索适合于检查的能量 或输入关于被检查物品的结构的信息。

公开(公告)号：US06504609B2

公开(公告)日：2003-01-07

申请号：US10115079

申请日：2002-04-04

申请人： Yasuhiko Nara ,  Kazuhisa Machida ,  Mari Nozoe ,  Hiroshi Morioka ,  Yasutsugu Usami ,  Takashi Hiroi

发明人： Yasuhiko Nara ,  Kazuhisa Machida ,  Mari Nozoe ,  Hiroshi Morioka ,  Yasutsugu Usami ,  Takashi Hiroi

IPC分类号： G01B1100

CPC分类号： G03F7/70616 ,  G03F1/84 ,  G03F7/7065 ,  G06T7/001 ,  G06T2207/30141 ,  H01J37/226 ,  H01J2237/082 ,  H01J2237/2817 ,  H01L22/12

摘要： Inspection method, apparatus, and system for a circuit pattern in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.

摘要翻译： 设置电路图案的检查方法，装置和系统，其中当通过使用通过照射白光，激光束或带电粒子束形成的图像检查精细电路图案所需的各种条件被设置时，其 可以提高运行效率。 显示检查对象基板的检查对象区域，并且指定区域的指定地图画面和光学显微镜或电子束显微镜的图像并行显示，从而能够将缺陷分布和缺陷图像 同时看到。 检查条件的项目名称和显示，输入或指示检查条件内容的画面被整合，这些内容与图像平面重叠，层叠显示，并且所有项目名称均以 选项卡格式在内容的图片平面的上部。 当点击所需的项目名称时，切换画面并显示与点击的项目名称对应的内容。

公开(公告)号：US06476913B1

公开(公告)日：2002-11-05

申请号：US09450856

申请日：1999-11-29

申请人： Kazuhisa Machida ,  Mari Nozoe ,  Hiroshi Morioka ,  Yasutsugu Usami ,  Takashi Hiroi ,  Maki Ito

发明人： Kazuhisa Machida ,  Mari Nozoe ,  Hiroshi Morioka ,  Yasutsugu Usami ,  Takashi Hiroi ,  Maki Ito

IPC分类号： G01B1100

CPC分类号： G03F7/70616 ,  G03F1/84 ,  G03F7/7065 ,  G06T7/001 ,  G06T2207/30141 ,  H01J37/226 ,  H01J2237/082 ,  H01J2237/2817 ,  H01L22/12

摘要： Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.

公开(公告)号：US06449948B2

公开(公告)日：2002-09-17

申请号：US09861515

申请日：2001-05-22

申请人： Yoshinobu Soga ,  Ryoji Habuchi ,  Hiroshi Morioka ,  Shinji Kasuga ,  Hideki Yasue

发明人： Yoshinobu Soga ,  Ryoji Habuchi ,  Hiroshi Morioka ,  Shinji Kasuga ,  Hideki Yasue

IPC分类号： F16D3102

CPC分类号： F16H57/0408 ,  F16H57/0402 ,  F16H57/0489 ,  F16H61/0021

摘要： A hydraulic circuit cleaning apparatus has a hydraulic circuit that includes an oil pump, an oil passage to which the oil pressure ejected from the oil pump is supplied, and a pressure regulator device connected to the oil passage for regulating the oil pressure in the oil passage. The apparatus cleans the hydraulic circuit by using a cleaning liquid. A discharge oil passage is connected to a discharge port of the pressure regulator device, so that the cleaning liquid is discharged out of the hydraulic circuit via the discharge oil passage.

摘要翻译： 液压回路清洁装置具有液压回路，该液压回路包括油泵，供给从油泵喷出的油压的油路，以及与油路连接的压力调节装置，用于调节油路中的油压 。 该装置通过使用清洗液清洗液压回路。 排出油路连接到压力调节装置的排出口，使得清洗液经由排出油路排出液压回路。

公开(公告)号：US06405115B2

公开(公告)日：2002-06-11

申请号：US09854471

申请日：2001-05-15

申请人： Hiroji Taniguchi ,  Katsumi Kono ,  Kenji Matsuo ,  Hideki Yasue ,  Tadashi Tamura ,  Daisuke Inoue ,  Yoshiaki Yamamoto ,  Hiroshi Morioka ,  Hiroki Kondo ,  Ryoji Habuchi ,  Yuji Hattori

发明人： Hiroji Taniguchi ,  Katsumi Kono ,  Kenji Matsuo ,  Hideki Yasue ,  Tadashi Tamura ,  Daisuke Inoue ,  Yoshiaki Yamamoto ,  Hiroshi Morioka ,  Hiroki Kondo ,  Ryoji Habuchi ,  Yuji Hattori

IPC分类号： B60K4106

CPC分类号： F16H61/66259 ,  Y10T477/60 ,  Y10T477/6351

摘要： A shift control system for a continuously variable transmission, in which a road load on a vehicle is detected, the lower limit speed is set according to the detected road load, in which a target input speed, as set according to the running state of a vehicle, is restricted with the set lower limit speed, and in which the gear ratio of the continuously variable transmission is controlled so that the actual input speed may be equal to the target input speed restricted. The target input speed is restricted after the actual input speed is more than the lower limit value, when the road load is light, and said target input speed is restricted irrespective of the actual input speed when the road load is heavy.

摘要翻译： 一种用于无级变速器的变速控制系统，其中检测到车辆上的道路负荷，根据检测到的道路负荷来设定下限速度，其中根据目标输入速度 车辆被限制在设定的下限速度，并且其中控制无级变速器的变速比使得实际输入速度可以等于目标输入速度受限。 当道路负荷较轻时，在实际输入速度大于下限值之后，目标输入速度受到限制，并且当道路负载较重时，实际输入速度与目标输入速度无关。

公开(公告)号：US5463459A

公开(公告)日：1995-10-31

申请号：US46720

申请日：1993-04-16

申请人： Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

发明人： Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

IPC分类号： G01N21/00 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01R31/308 ,  H01J37/00 ,  H01L21/00 ,  H01L21/66 ,  H01L21/68 ,  G01N21/89 ,  G02B27/46 ,  G06F15/46

CPC分类号： H01L21/681 ,  B82Y15/00 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623 ,  G01R31/308 ,  H01J37/00 ,  H01L21/67253 ,  H01L21/67288 ,  G01N2021/8822 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L22/12

摘要： A defect detecting apparatus including an illumination system for radiating a light of a plane wave linearly to a substrate having repetitive patterns of different pitches; a focusing optical system for focusing a light image reflected from the substrate thus illuminated by the illumination system; a spatial filter disposed intermediate the focusing optical system so as to shield a diffraction light from repetitive patterns of a small pitch on the substrate; a detector for detecting the light image formed by the focusing optical system; an erasing means for comparing and erasing signals which are generated on the basis of repetitive patterns of a large pitch and obtained through the spatial filter, out of signals detected by the detector; and a defect detecting means for detecting defects on the substrate in accordance with a signal detected by the detector, as well as a method applied to the said apparatus.

摘要翻译： 一种缺陷检测装置，包括用于将平面波的光线线性地发射到具有不同间距的重复图案的基板的照明系统; 聚焦光学系统，用于聚焦由照明系统照射的从基板反射的光图像; 设置在聚焦光学系统之间的空间滤光器，以便屏蔽来自基板上的小间距的重复图案的衍射光; 用于检测由聚焦光学系统形成的光图像的检测器; 擦除装置，用于根据由检测器检测到的信号，比较和擦除基于大间距的重复图案并通过空间滤波器获得的信号; 以及缺陷检测装置，用于根据由检测器检测的信号检测基板上的缺陷，以及应用于所述装置的方法。

公开(公告)号：US5233191A

公开(公告)日：1993-08-03

申请号：US679317

申请日：1991-04-02

申请人： Minori Noguchi ,  Yukio Kembo ,  Hiroshi Morioka ,  Hiroshi Yamaguchi ,  Makiko Kohno ,  Yoshimasa Ohshima

发明人： Minori Noguchi ,  Yukio Kembo ,  Hiroshi Morioka ,  Hiroshi Yamaguchi ,  Makiko Kohno ,  Yoshimasa Ohshima

IPC分类号： G01N21/94 ,  G01N21/956 ,  G01Q10/00 ,  G01Q30/02 ,  G01Q30/04 ,  G01Q30/14 ,  G01Q60/10 ,  G01R31/311 ,  H01J37/256 ,  H01L21/00 ,  H01L21/66

CPC分类号： H01L21/67253 ,  G01R31/311 ,  H01J37/256 ,  H01L21/67276 ,  H01L21/67288 ,  H01L22/20 ,  B82Y35/00 ,  G01N2021/8822 ,  G01N21/94 ,  G01N21/95623

摘要： Method and apparatus of detecting, analyzing and evaluating the content of foreign matters such as dusts and impurities contained in various materials, units, processes and environment standing for constituting components of a mass production line during mass production start-up and during mass production, in order to manage a semiconductor production process. A mass production off-line system including an apparatus for detecting, analyzing and evaluating the content of foreign matters during the mass production start-up is separated from the production line and installed independently thereof. Monitors for detection of foreign matters are provided at necessary locations in the production line and monitor data is evaluated through various units to manage the content of foreign matters in the production line, permitting efficient and economical mass production start-up and mass production. The kind of element of a foreign matter on sampling wafer detected in the mass production line is analyzed by means of STM/STS and the results are compared with a data base to effect identification. A foreign matter or a contaminant is detected by detecting a scatttered beam, of a light spot which scans the surface of a substrate. The detection of the scattered beam is carried out under the condition that Rayleigh scattering of the light spot on the light spot irradiation and reflection paths and Rayleigh scattering of the scattered beam on the scattered beam detection path are suppressed to a minimum. For the suppression of Rayleigh scattering, a low-pressure or low-temperature atmosphere may be used.

摘要翻译： 检测，分析和评估大规模生产启动期间和批量生产期间大规模生产线组成部件的各种材料，单位，工艺和环境中所含的灰尘和杂质等杂质的含量， 为了管理半导体生产过程。 包括用于在批量生产启动期间检测，分析和评估异物含量的装置的批量生产离线系统与生产线分离并独立安装。 在生产线必需的位置提供检测异物的监测器，通过各种单位对监测数据进行评估，对生产线内的异物含量进行管理，实现高效，经济的批量生产启动和批量生产。 通过STM / STS分析在大规模生产线上检测到的采样晶圆上的异物元素的种类，并将结果与​​数据库进行比较以进行识别。 通过检测扫描基板表面的光斑的光斑光束来检测异物或污染物。 在光点照射和反射路径上的光斑的瑞利散射和散射光束检测路径上的散射光束的瑞利散射被抑制到最小的条件下进行散射光束的检测。 为了抑制瑞利散射，可以使用低压或低温气氛。