Secondary-ion mass spectrometry apparatus using field limiting method
    31.
    发明授权
    Secondary-ion mass spectrometry apparatus using field limiting method 失效
    二次离子质谱仪采用场限制法

    公开(公告)号:US5278407A

    公开(公告)日:1994-01-11

    申请号:US873173

    申请日:1992-04-24

    Abstract: A secondary-ion mass spectrometry apparatus using a field limiting method includes an optical system for primary ions, a sample chamber, and an optical system for secondary ions, and a total ion monitor (TIM) interposed between an electric sector and a magnetic sector of the optical system for secondary ions. A field-limited image (or TIM image) from the TIM can be observed or monitored continually by a CRT, thereby making it possible to grasp quantitatively the charging state of a sample surface. The apparatus may further include an adjuster for adjusting quantatively the charging state of the sample surface.

    Abstract translation: 使用场限制方法的二次离子质谱仪装置包括用于一次离子的光学系统,样品室和用于二次离子的光学系统,以及介于电子部分和磁性部分之间的总离子监测器(TIM) 二次离子光学系统。 可以通过CRT连续地观察或监视来自TIM的场限制图像(或TIM图像),从而可以定量地掌握样品表面的充电状态。 该装置还可以包括用于定量地调整样品表面的充电状态的调节器。

    Sample-moving automatic analyzing apparatus
    32.
    发明授权
    Sample-moving automatic analyzing apparatus 失效
    样品移动自动分析仪

    公开(公告)号:US5192866A

    公开(公告)日:1993-03-09

    申请号:US730422

    申请日:1991-07-16

    Applicant: Hideto Komi

    Inventor: Hideto Komi

    CPC classification number: H01J37/228 H01J37/256

    Abstract: A sample is analyzed by irradiating it with a charged-particle beam and detecting characteristic X-rays. The surface of the sample is magnified and displayed on a CRT, and analytical areas, analytical positions and a travel path for the charged-particle beam are designated on the image displayed by the CRT. The travel path of the charged-particle beam is designated by an operator via an input unit while the operator observes the image on the CRT. It is also possible to compute and designate the travel path by an arithmetic unit based on positional coordinate data indicative of the analytical areas, analytical positions and non-irradiated areas without requiring an operation by the operator.

    Abstract translation: 通过用带电粒子束照射样品并检测特征X射线来分析样品。 将样品的表面放大并显示在CRT上,并且在CRT显示的图像上指定分析区域,分析位置和带电粒子束的行进路径。 带电粒子束的行进路径由操作员经由输入单元指定,而操作者观察CRT上的图像。 也可以通过算术单元基于表示分析区域,分析位置和非照射区域的位置坐标数据来计算和指定行驶路径,而不需要操作者的操作。

    Secondary ion mass spectrometry apparatus
    35.
    发明授权
    Secondary ion mass spectrometry apparatus 失效
    二次离子质谱仪

    公开(公告)号:US5041725A

    公开(公告)日:1991-08-20

    申请号:US553698

    申请日:1990-07-18

    Applicant: Eiichi Izumi

    Inventor: Eiichi Izumi

    CPC classification number: H01J37/256 G01N23/2258

    Abstract: A secondary ion mass spectrometry apparatus for analyzing an element contained in the sample by radiating a primary ion beam extracted from an ion source to an analytical sample through a focusing system. The secondary ion mass spectrometry apparatus comprises an input unit for inputting data containing analytical elements names and areas, a storage unit for storing operational expressions to be operated on the input data from the input unit and a table to be reference on the input data and the results operated by the operational expressions and from which the necessary data is read, and a control unit for setting focusing conditions of said focusing system using the input data inputted from said input unit and the operational expressions and tables stored in the storage unit.

    Abstract translation: 一种二次离子质谱装置,用于通过将从离子源提取的一次离子束通过聚焦系统辐射到分析样品来分析样品中包含的元素。 二次离子质谱仪包括:输入单元,用于输入包含分析单元名称和区域的数据;存储单元,用于存储对来自输入单元的输入数据进行操作的操作表达式以及要输入的参考表, 由操作表达式操作的结果,并且从其读取必要的数据;以及控制单元,用于使用从所述输入单元输入的输入数据和存储在存储单元中的操作表达式和表来设置所述聚焦系统的聚焦条件。

    Charged particle beam apparatus
    36.
    发明授权
    Charged particle beam apparatus 失效
    带电粒子束装置

    公开(公告)号:US5012109A

    公开(公告)日:1991-04-30

    申请号:US378286

    申请日:1989-07-11

    CPC classification number: H01J37/265 H01J37/256

    Abstract: A charged particle beam apparatus comprising a charged particle beam source(s) for generating an ion beam and an electron beam, a focusing lens system for finely focusing each of the generated ion beam and electron beam, a charged particle beam deflecting system for deflecting each of the focused ion beam and electron beam, and a specimen subjected to irradiation thereof with each of the focused ion beam and electron beam is provided with means for detecting the deviation of the irradiation positions of the ion beam and the electron beam on the specimen from each other and means for making the irradiation positions of the ion beam and the electron beam on the specimen coincident with each other on the basis of the result of detection of the deviation of the irradiation positions from each other.

    Abstract translation: 一种带电粒子束装置,包括用于产生离子束和电子束的带电粒子束源,用于精细聚焦每个所产生的离子束和电子束的聚焦透镜系统,用于偏转每一个的带电粒子束偏转系统 聚焦离子束和电子束的照射样本和其中每个聚焦离子束和电子束照射的样本设置有用于检测离子束和电子束在样本上的照射位置的偏差的装置, 彼此之间的离子束和电子束的照射位置彼此一致的装置,基于检测到照射位置彼此偏离的结果。

    Charged particle beam apparatus
    38.
    发明授权
    Charged particle beam apparatus 失效
    带电粒子束装置

    公开(公告)号:US4841143A

    公开(公告)日:1989-06-20

    申请号:US160408

    申请日:1988-02-25

    CPC classification number: H01J37/256 H01J37/244 H01J2237/2449 H01J2237/2527

    Abstract: A charged particle beam apparatus is disclosed, which comprises a charged particle source; focusing means for focusing a charged particle beam emitted by the charged particle source on a sample and irradiating it therewith; deflecting means for deflecting the charged particle beam so as to scan the sample therewith; secondary ion separating means disposed approximately symmetrically with respect to the axis of the charged particle beam at the proximity of said sample and separating positive and negative secondary ions generated by the irradiation of the sample into positive and negative ions; and mass analyzers for analyzing the mass of the separated positive and negative secondary ions, respectively.

    Abstract translation: 公开了一种带电粒子束装置,其包括带电粒子源; 用于将由带电粒子源发射的带电粒子束聚焦在样品上并将其照射的聚焦装置; 用于使带电粒子束偏转以便用其扫描样品的偏转装置; 二次离子分离装置相对于所述样品附近的带电粒子束的轴线近似对称设置,并且将由样品照射产生的正和负二次离子分离成正离子和负离子; 以及用于分析分离的正负二次离子的质量的质量分析器。

    Secondary ion mass spectrometer
    39.
    发明授权
    Secondary ion mass spectrometer 失效
    二次离子质谱仪

    公开(公告)号:US4740697A

    公开(公告)日:1988-04-26

    申请号:US788757

    申请日:1985-10-18

    Applicant: Toshiko Suzuki

    Inventor: Toshiko Suzuki

    CPC classification number: H01J49/022 H01J37/256 H01J49/142

    Abstract: In a secondary ion mass spectrograph, the electrical power supply voltages controlling and pertaining to the polarity of the target secondary ions are all switched between opposite polarities simultaneously while the deflection of the primary ion beam is automatically corrected for any error that may result from the polarity switch-over. This allows quick alternation of the polarity of target ions without loss of accuracy of the primary beam scan. The correction to the primary beam deflected may be predetermined under specific observing conditions or may be derived from theoretical considerations.

    Abstract translation: 在二次离子质谱仪中,控制和关于目标二次离子的极性的电源电压全部在相反极性之间切换,同时主离子束的偏转被自动校正,这可能是由极性引起的任何误差 切换 这允许目标离子的极性的快速交替而不损失主波束扫描的精度。 对于偏转的主光束的校正可以在特定的观察条件下预先确定,或者可以从理论考虑得到。

    Primary ion beam raster gating technique for secondary ion mass
spectrometer system
    40.
    发明授权
    Primary ion beam raster gating technique for secondary ion mass spectrometer system 失效
    二次离子质谱仪系统的一次离子束光栅门控技术

    公开(公告)号:US4661702A

    公开(公告)日:1987-04-28

    申请号:US664196

    申请日:1984-10-24

    Inventor: David G. Welkie

    CPC classification number: H01J37/256 H01J37/045

    Abstract: A primary ion beam raster gating technique for secondary ion mass spectrometer system is disclosed. The system includes a primary ion gun which raster scans an area of the surface being tested which sputter etches a crater. After the crater is formed, a beam blanking circuit causes the beam to scan a smaller area at the bottom of the first crater thereby sputter etching a second smaller crater. During this phase, the ion beam does not hit the side wall of the first crater so that errors are not introduced into secondary ion measurement from the bottom of the second crater due to material from the side wall of the first crater being sputtered into the second crater.

    Abstract translation: 公开了用于二次离子质谱仪系统的一次离子束光栅门控技术。 该系统包括一个主离子枪,其光栅扫描被测试表面的一个区域,其溅射蚀刻火山口。 在形成火山口之后,光束消隐电路使得光束扫描第一火山口底部的较小区域,从而溅射蚀刻第二较小的火山口。 在该阶段期间,离子束不会撞击第一火山口的侧壁,从而由于来自第一火山口的侧壁的材料被溅射到第二火山口中,所以不会从第二火山口的底部引入二次离子测量中的误差 火山口

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