公开(公告)号：US20200043701A1

公开(公告)日：2020-02-06

申请号：US16511094

申请日：2019-07-15

申请人： NuFlare Technology, Inc.

发明人： Hiroshi MATSUMOTO

IPC分类号： H01J37/317 ,  H01J37/20 ,  H01J37/04

摘要： According to one aspect of the present invention, a multiple charged particle beam writing apparatus includes a subtraction processing circuit configured to subtract a corresponding shared dose from a dose of each of peripheral beams of a defect beam where control of a dose of a beam is disabled and the dose to be irradiated is excessive among the multiple charged particle beams, such that the same dose as an excess dose by the defect beam is shared by the peripheral beams of the defect beam; and a writing mechanism including a stage mounting a target object and a deflector deflecting the multiple charged particle beams and configured to write a pattern on the target object, using the multiple charged particle beams of doses in which the same dose as the excess dose of the defect beam is shared and is subtracted from the doses of the peripheral beams.

公开(公告)号：US20180166254A1

公开(公告)日：2018-06-14

申请号：US15831729

申请日：2017-12-05

申请人： NuFlare Technology, Inc.

发明人： Hiroshi MATSUMOTO

IPC分类号： H01J37/302 ,  H01J37/317 ,  H01J37/304 ,  H01J37/30

CPC分类号： H01J37/3026 ,  G03F1/78 ,  G03F7/20 ,  H01J37/30 ,  H01J37/3007 ,  H01J37/302 ,  H01J37/304 ,  H01J37/305 ,  H01J37/317 ,  H01J37/3177

摘要： A multi charged particle beam exposure method includes calculating an effective irradiation time, for each of a plurality of control irradiation time periods for controlling an irradiation time of each beam in the multi-beams of a charged particle beam, using a blanking error time of each divided shot of a plurality of divided shots, previously acquired, due to an error of blanking control for each divided shot; generating correlation data representing a relation between the control irradiation time and the effective irradiation time; selecting, using the correlation data, for each irradiation position of a target object, the combination of the divided shots corresponding to the effective irradiation time to be closer to each desired irradiation time; and performing exposure, using the multi-beams, based on the combination of the divided shots selected for each irradiation position of the target object.

公开(公告)号：US20170352520A1

公开(公告)日：2017-12-07

申请号：US15605343

申请日：2017-05-25

申请人： NuFlare Technology, Inc.

发明人： Hiroshi MATSUMOTO

IPC分类号： H01J37/147 ,  H01J37/30 ,  H01J37/04 ,  H01J37/10

CPC分类号： H01J37/1471 ,  H01J37/045 ,  H01J37/10 ,  H01J37/3007 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0437 ,  H01J2237/30455 ,  H01J2237/31774

摘要： A multi charged particle beams exposure method includes assigning, with respect to plural times of shots of multi-beams using a charged particle beam, each shot to one of plural groups, depending on a total current value of beams becoming in an ON condition in a shot concerned in the multi-beams, changing the order of the plural times of shots so that shots assigned to the same group may be continuously emitted for each of the plural groups, correcting, for each group, a focus position of the multi-beams to a focus correction position for a group concerned corresponding to the total current value, and performing the plural times of shots of the multi-beams such that the shots assigned to the same group are continuously emitted in a state where the focus position of the multi-beams has been corrected to the focus correction position for the group concerned.

公开(公告)号：US20170316914A1

公开(公告)日：2017-11-02

申请号：US15581859

申请日：2017-04-28

申请人： NuFlare Technology, Inc.

发明人： Hiroshi MATSUMOTO ,  Shuji Yoshino

IPC分类号： H01J37/20 ,  H01J37/317

CPC分类号： H01J37/20 ,  H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/024 ,  H01J2237/0437

摘要： According to one aspect of the present invention, a stage mechanism includes a movable stage disposed in a vacuum atmosphere and mounting a heat source, a first heat pipe connected to the heat source, a movable mechanism configured to move according to the movement of the first heat pipe caused by the movement of the stage, by using a portion of the first heat pipe, and a cooling mechanism configured to cool the first heat pipe through the movable mechanism.

公开(公告)号：US20170229280A1

公开(公告)日：2017-08-10

申请号：US15423013

申请日：2017-02-02

申请人： NuFlare Technology, Inc.

发明人： Yasuo KATO ,  Hideo INOUE ,  Hiroshi MATSUMOTO ,  Ryoh KAWANA

IPC分类号： H01J37/147 ,  H01J37/304 ,  H01J37/04 ,  H01J37/317 ,  H01J37/20

CPC分类号： H01J37/147 ,  H01J37/045 ,  H01J37/20 ,  H01J37/304 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/202 ,  H01J2237/30461 ,  H01J2237/31769 ,  H01J2237/31774

摘要： In one embodiment, a multi charged particle beam writing apparatus includes processing circuitry that is programmed to perform the function of a data region determination part determining a data region based on boundaries of pixels obtained by dividing a writing area of a substrate into mesh-shaped regions, an irradiation range of multiple charged particle beams, and boundaries of stripe segments obtained by dividing the writing area into segments having a predetermined width such that the segments are arranged in a predetermined direction, a deflection coordinate adjustment part adjusting deflection coordinates of the multiple charged particle beams such that the boundaries of the pixels are mapped to a boundary of the irradiation range, and a correction part calculating a corrected dose of each beam of the multiple charged particle beams by distributing, based on a positional relationship between the beam and pixels in the data region, a dose of the beam corresponding to a pixel in the data region calculated based on write data to one or more beams, and adding doses distributed to the beam, and a writing mechanism, including a charged particle beam source, a deflector, and a stage on which a target object is placed, and the writing mechanism deflecting the multiple charged particle beams based on the adjusted deflection coordinates and applying the beams each having the corrected dose to write a pattern.

公开(公告)号：US20160141142A1

公开(公告)日：2016-05-19

申请号：US14879447

申请日：2015-10-09

申请人： NuFlare Technology, Inc.

发明人： Hiroshi MATSUMOTO

IPC分类号： H01J37/04 ,  H01J37/20 ,  H01J37/317

CPC分类号： H01J37/045 ,  H01J37/3177 ,  H01J2237/0437

摘要： A blanking system for multi charged particle beams includes a blanking aperture array device to include a first substrate where a plurality of openings corresponding to passage positions of multi-beams are formed in a penetrating manner from the upper surface, and a plurality of electrode groups each having a pair of electrodes which are close to a corresponding one of the plurality of openings and are at opposite sides, on a same surface, of the corresponding one of the plurality of openings are arranged on the first substrate, a second substrate whose lower surface is electrically connected through a bump to the upper surface of the first substrate, and a mounting substrate whose upper surface is electrically connected through a bump to the lower surface of the second substrate.

摘要翻译： 一种用于多带电粒子束的消隐系统包括一个消隐孔阵列器件，其包括第一衬底，其中与多个光束的通道位置对应的多个开口以从上表面穿透的方式形成，并且多个电极组各自 具有靠近所述多个开口中的相应一个开口并且位于所述多个开口中的相应一个开口的相同表面上的相对侧上的一对电极布置在所述第一基板上，第二基板的下表面 通过凸块电连接到第一基板的上表面，以及安装基板，其上表面通过凸块电连接到第二基板的下表面。

公开(公告)号：US20150340196A1

公开(公告)日：2015-11-26

申请号：US14699216

申请日：2015-04-29

申请人： NuFlare Technology, Inc.

发明人： Hiroshi MATSUMOTO ,  Munehiro OGASAWARA ,  Ryoichi YOSHIKAWA

IPC分类号： H01J37/147 ,  H01J37/302 ,  H01J37/317 ,  H01J37/20

CPC分类号： H01J37/1471 ,  H01J37/045 ,  H01J37/147 ,  H01J37/20 ,  H01J37/302 ,  H01J37/3026 ,  H01J37/317 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/043 ,  H01J2237/0435 ,  H01J2237/202 ,  H01J2237/20278 ,  H01J2237/20285 ,  H01J2237/20292 ,  H01J2237/304 ,  H01J2237/30483 ,  H01J2237/3175

摘要： A multi charged particle beam writing method includes, shifting a writing position of each corresponding beam to a next writing position by performing another beam deflection of multi charged particle beams, in addition to the beam deflection for a tracking control, while continuing the beam deflection for the tracking control after the maximum writing time has passed; emitting the each corresponding beam in the “on” state to the next writing position having been shifted of the each corresponding beam, during a corresponding writing time while continuing the tracking control; and returning a tracking position such that a next tracking start position is a former tracking start position where the tracking control was started, by resetting the beam deflection for the tracking control after emitting the each corresponding beam to the next writing position having been shifted at least once of the each corresponding beam while continuing the tracking control.

摘要翻译： 多带电粒子束写入方法包括：除了用于跟踪控制的光束偏转之外，通过执行多带电粒子束的另一束偏转，将每个相应光束的写入位置移位到下一个写入位置，同时继续光束偏转 最大写入时间后的跟踪控制已过; 在相应的写入时间期间，将每个对应的波束处于“接通”状态，并将其发送到已经被移位的每个相应波束的下一个写入位置，同时继续跟踪控制; 并且返回跟踪位置，使得下一个跟踪开始位置是跟踪控制开始的前一个跟踪开始位置，通过在将每个对应的波束发射到至少已经移位的下一个写入位置之后将跟踪控制的光束偏转重置 在每个对应的光束中一次，同时继续跟踪控制。

公开(公告)号：US20150102231A1

公开(公告)日：2015-04-16

申请号：US14508191

申请日：2014-10-07

申请人： NuFlare Technology, Inc.

发明人： Hiroshi MATSUMOTO

IPC分类号： H01J37/147 ,  H01J37/30 ,  H01J37/317

CPC分类号： H01J37/147 ,  H01J37/045 ,  H01J37/3007 ,  H01J37/3177

摘要： A blanking device for multiple charged particle beams includes plural shift registers, arranged in two dimensions, to form plural groups each including shift registers, connected in series, of the plural shift registers, plural blankers to respectively provide a blanking deflection to a corresponding beam of multiple beams each controlled through a corresponding shift register in the plural shift registers, plural serial parallel conversion units, arranged along the four sides of a quadrangular region which surrounds the whole of the plural shift registers, to be respectively connected by parallel wiring to at least one of the plural groups, and plural pads, arranged along the four sides of the quadrangular region, to be respectively in combination with a corresponding serial parallel conversion unit of the plural serial parallel conversion units such that each of the plural pads is connected by single wiring to the corresponding serial parallel conversion unit.

摘要翻译： 一种用于多个带电粒子束的消隐装置包括多个移位寄存器，它们分成两部分，以形成多个组，每个组包括多个移位寄存器串联连接的移位寄存器，多个消隐器，分别向对应的波束提供消隐偏转 通过多个移位寄存器中的对应移位寄存器控制的多个波束，沿着围绕整个多个移位寄存器的四边形区域的四边布置的多个串行并行转换单元，分别通过并行布线连接到至少 多个组中的一个以及沿着四边形区域的四边排列的多个衬垫分别与多个串行并行转换单元的相应的串行并行转换单元组合，使得多个焊盘中的每一个通过单个连接 接线到相应的串行并行转换单元。

公开(公告)号：US20130253688A1

公开(公告)日：2013-09-26

申请号：US13798669

申请日：2013-03-13

申请人： NUFLARE TECHNOLOGY, INC.

发明人： Hiroshi MATSUMOTO

IPC分类号： H01L21/02

CPC分类号： H01L21/02675 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/2059 ,  H01J37/3177 ,  H01J2237/30433 ,  H01J2237/30455 ,  H01J2237/31794

摘要： A multi charged particle beam writing apparatus includes a unit to calculate a predetermined function expression by a correction coefficient that corrects an open area of each opening for forming a beam group, wherein the predetermined function expression minimizes a sum of squared values of all the beam groups, where each of the squared values is calculated by squaring a difference between a current value measured of the beam group and a sum of products for the beam group, where each of the products is obtained by multiplying a corrected open area by the predetermined function expression; a unit to calculate the correction coefficient that corrects the open area by using the predetermined function expression and the current value of the beam, for each beam; and a unit to calculate a current density of each of the multiple beams by the predetermined function expression.

摘要翻译： 多带电粒子束写入装置包括：通过校正用于形成光束组的每个开口的开放区域的校正系数来计算预定函数表达式的单元，其中，所述预定函数表达式将所有波束组的平方值的和最小化 其中每个平方值通过平方光束组的测量的当前值与波束组的乘积之和之间的差值来计算，其中每个乘积通过将校正的开放面积乘以预定函数表达式而获得 ; 对于每个光束，计算通过使用预定函数表达式和光束的当前值来校正开放区域的校正系数的单元; 以及通过预定函数表达式计算多个光束中的每一个的电流密度的单元。

公开(公告)号：US20220299861A1

公开(公告)日：2022-09-22

申请号：US17653665

申请日：2022-03-07

申请人： NuFlare Technology, Inc.

发明人： Tsubasa NANAO ,  Hiroshi MATSUMOTO

IPC分类号： G03F1/20 ,  H01J37/302 ,  G03F7/20 ,  H01J37/10 ,  H01J37/317

摘要： In one embodiment, a multi charged particle beam writing apparatus includes an objective lens adjusting focus positions of multiple beams, an astigmatism correction element correcting astigmatism of the multiple beams, an inspection aperture allowing one of the multiple beams to pass therethrough, a deflector deflecting the multiple beams and causing the multiple beams to scan over the inspection aperture, a current detector detecting beam currents of the individual multiple beams after passing through the inspection aperture, a beam image formation unit forming a beam image based on the detected beam currents, a feature amount calculation unit generating a first waveform and a second waveform by adding brightnesses of the beam image in a first direction and in a second direction, and calculating a first and a second feature amounts from the first and the second waveforms, and a parameter calculation unit calculating an exciting parameter that is to be set for the astigmatism correction element based on the first feature amount and the second feature amount.