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公开(公告)号:US10115559B2
公开(公告)日:2018-10-30
申请号:US15403685
申请日:2017-01-11
Applicant: Hermes Microvision Inc.
Inventor: Xuedong Liu , Weiming Ren , Shuai Li , Zhongwei Chen
IPC: H01J37/14 , H01J37/147 , H01J37/28 , H01J37/04 , H01J37/153
Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.
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公开(公告)号:US10008360B2
公开(公告)日:2018-06-26
申请号:US15007873
申请日:2016-01-27
Applicant: Hermes-Microvision, Inc.
Inventor: Shuai Li , Zhongwei Chen
IPC: H01J37/14 , H01J37/145 , H01J37/147 , H01J37/141
CPC classification number: H01J37/145 , H01J37/141 , H01J37/1472 , H01J37/1474 , H01J37/1477
Abstract: The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen, a deflection system including a plurality of deflection units situated along the optical axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the objective lens, and a detection unit to capture secondary electron (SE) and backscattered electrons (BSE).
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公开(公告)号:US09922799B2
公开(公告)日:2018-03-20
申请号:US15213781
申请日:2016-07-19
Applicant: Hermes Microvision, Inc.
Inventor: Shuai Li , Weiming Ren , Xuedong Liu , Juying Dou , Xuerang Hu , Zhongwei Chen
IPC: H01J37/28 , H01J37/10 , H01J37/20 , H01J37/244
CPC classification number: H01J37/28 , H01J37/10 , H01J37/20 , H01J37/244 , H01J2237/0453 , H01J2237/0492 , H01J2237/04924 , H01J2237/04926 , H01J2237/04928 , H01J2237/1205 , H01J2237/1501 , H01J2237/1502 , H01J2237/2446 , H01J2237/2448 , H01J2237/2806 , H01J2237/2817
Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.
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公开(公告)号:US20170125206A1
公开(公告)日:2017-05-04
申请号:US15403749
申请日:2017-01-11
Applicant: Hermes Microvision Inc.
Inventor: Weiming Ren , Shuai Li , Xuedong Liu , Zhongwei Chen
IPC: H01J37/147 , H01J37/28
CPC classification number: H01J37/28 , H01J37/12 , H01J37/1472 , H01J2237/04924 , H01J2237/083 , H01J2237/1205 , H01J2237/1516 , H01J2237/2817
Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
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公开(公告)号:US20170125203A1
公开(公告)日:2017-05-04
申请号:US15404618
申请日:2017-01-12
Applicant: Hermes Microvision Inc.
Inventor: Shuai Li
IPC: H01J37/143
CPC classification number: H01J37/143 , H01J3/20 , H01J37/063 , H01J37/065 , H01J37/09 , H01J37/14 , H01J37/28 , H01J2237/0453 , H01J2237/063 , H01J2237/06308 , H01J2237/06375 , H01J2237/0653 , H01J2237/083 , H01J2237/141 , H01J2237/1415 , H01J2237/2806 , H01J2237/2817
Abstract: This invention provides a charged particle source, which comprises an emitter and means fo generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.
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公开(公告)号:US09607805B2
公开(公告)日:2017-03-28
申请号:US15150858
申请日:2016-05-10
Applicant: Hermes Microvision Inc.
Inventor: Xuedong Liu , Weiming Ren , Shuai Li , Zhongwei Chen
CPC classification number: H01J37/147 , H01J37/04 , H01J37/153 , H01J37/28 , H01J2237/061 , H01J2237/083 , H01J2237/1532 , H01J2237/1534 , H01J2237/2817
Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.
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公开(公告)号:US09583306B2
公开(公告)日:2017-02-28
申请号:US14964274
申请日:2015-12-09
Applicant: Hermes Microvision Inc.
Inventor: Shuai Li
IPC: G21K5/04 , H01J37/10 , H01J37/147 , H01J37/28 , H01J37/145 , H01J37/21
CPC classification number: H01J37/1478 , H01J37/145 , H01J37/21 , H01J37/28 , H01J2237/063 , H01J2237/1035 , H01J2237/12 , H01J2237/14 , H01J2237/1508 , H01J2237/1534 , H01J2237/1536 , H01J2237/2801 , H01J2237/2811
Abstract: A scanning electron microscope (SEM) with a swing objective lens (SOL) reduces the off-aberrations to enhance the image resolution, and extends the e-beam scanning angle. The scanning electron microscope comprises a charged particle source, an accelerating electrode, and a swing objective lens system including a pre-deflection unit, a swing deflection unit and an objective lens, all of them are rotationally symmetric with respect to an optical axis. The upper inner-face of the swing deflection unit is tilted an angle θ to the outer of the SEM and its lower inner-face is parallel to the optical axis. A distribution for a first and second focusing field of the swing objective lens is provided to limit the off-aberrations and can be performed by a single swing deflection unit. Preferably, the two focusing fields are overlapped by each other at least 80 percent.
Abstract translation: 具有摆动物镜(SOL)的扫描电子显微镜(SEM)减小了偏差以提高图像分辨率,并且扩展了电子束扫描角度。 扫描电子显微镜包括带电粒子源,加速电极和包括预偏转单元,摆动偏转单元和物镜的摆动物镜系统,它们都相对于光轴旋转对称。 摆动偏转单元的上部内表面与SEM的外侧倾斜角度θ,其下部内表面平行于光轴。 提供了用于摆动物镜的第一和第二聚焦场的分布以限制偏差并且可以由单个摆动偏转单元执行。 优选地,两个聚焦场彼此重叠至少80%。
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公开(公告)号:US20170025241A1
公开(公告)日:2017-01-26
申请号:US15213781
申请日:2016-07-19
Applicant: Hermes Microvision, Inc.
Inventor: Shuai Li , Weiming Ren , Xuedong Liu , Juying Dou , Xuerang Hu , Zhongwei Chen
IPC: H01J37/14 , H01J37/20 , H01J37/244 , H01J37/28
CPC classification number: H01J37/28 , H01J37/10 , H01J37/20 , H01J37/244 , H01J2237/0453 , H01J2237/0492 , H01J2237/04924 , H01J2237/04926 , H01J2237/04928 , H01J2237/1205 , H01J2237/1501 , H01J2237/1502 , H01J2237/2446 , H01J2237/2448 , H01J2237/2806 , H01J2237/2817
Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.
Abstract translation: 提出了一种用于以高分辨率和高吞吐量和灵活变化的观察条件观察样品的多光束装置。 该装置使用可移动准直透镜来灵活地改变多个探针点的电流而不影响其间隔,新的源转换单元形成单个电子源的多个图像并补偿多个探针点的离轴像差 以及用于减小由于一次电子束引起的强烈的库仑效应的前束形成装置。
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公开(公告)号:US20160172150A1
公开(公告)日:2016-06-16
申请号:US14964274
申请日:2015-12-09
Applicant: Hermes Microvision Inc.
Inventor: Shuai Li
IPC: H01J37/147 , H01J37/145 , H01J37/21 , H01J37/28
CPC classification number: H01J37/1478 , H01J37/145 , H01J37/21 , H01J37/28 , H01J2237/063 , H01J2237/1035 , H01J2237/12 , H01J2237/14 , H01J2237/1508 , H01J2237/1534 , H01J2237/1536 , H01J2237/2801 , H01J2237/2811
Abstract: A scanning electron microscope (SEM) with a swing objective lens (SOL) reduces the off-aberrations to enhance the image resolution, and extends the e-beam scanning angle. The scanning electron microscope comprises a charged particle source, an accelerating electrode, and a swing objective lens system including a pre-deflection unit, a swing deflection unit and an objective lens, all of them are rotationally symmetric with respect to an optical axis. The upper inner-face of the swing deflection unit is tilted an angle θ to the outer of the SEM and its lower inner-face is parallel to the optical axis. A distribution for a first and second focusing field of the swing objective lens is provided to limit the off-aberrations and can be performed by a single swing deflection unit. Preferably, the two focusing fields are overlapped by each other at least 80 percent.
Abstract translation: 具有摆动物镜(SOL)的扫描电子显微镜(SEM)减小了偏差以提高图像分辨率,并且扩展了电子束扫描角度。 扫描电子显微镜包括带电粒子源,加速电极和包括预偏转单元,摆动偏转单元和物镜的摆动物镜系统,它们都相对于光轴旋转对称。 摆动偏转单元的上内表面倾斜一角度; 到SEM的外侧,并且其下内表面平行于光轴。 提供了用于摆动物镜的第一和第二聚焦场的分布以限制偏差并且可以由单个摆动偏转单元执行。 优选地,两个聚焦场彼此重叠至少80%。
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