公开(公告)号：US08471476B2

公开(公告)日：2013-06-25

申请号：US12901198

申请日：2010-10-08

Applicant: Peter F. Kurunczi ,  Victor M. Benveniste ,  Oliver V. Naumovski

Inventor： Peter F. Kurunczi ,  Victor M. Benveniste ,  Oliver V. Naumovski

IPC: H05B31/26 ,  H01J37/317

CPC classification number: H01J37/3211 ,  H01J37/026 ,  H01J37/3171 ,  H01J37/32688 ,  H01J2237/03

Abstract: A device is disclosed for providing an inductively coupled radio frequency plasma flood gun. In one particular exemplary embodiment, the device is a plasma flood gun in an ion implantation system. The plasma flood gun may comprise a plasma chamber having one or more apertures; a gas source capable of supplying at least one gaseous substance to the plasma chamber; a single-turn coil disposed within the plasma chamber, and a power source coupled to the coil for inductively coupling radio frequency electrical power to excite the at least one gaseous substance in the plasma chamber to generate a plasma. The inner surface of the plasma chamber may be free of metal-containing material and the plasma may not be exposed to any metal-containing component within the plasma chamber. The plasma chamber may include a plurality of magnets for controlling the plasma. An exit aperture may be provided in the plasma chamber to enable negatively charged particles of the resulting plasma to engage an ion beam that is part of the associated ion implantation system. In one embodiment, magnets are disposed on opposite sides of the aperture and are used to manipulate the electrons of the plasma.

Abstract translation: 公开了一种用于提供电感耦合的射频等离子体喷枪的装置。 在一个特定的示例性实施例中，该装置是离子注入系统中的等离子体喷枪。 等离子体喷枪可以包括具有一个或多个孔的等离子体室; 能够向所述等离子体室供给至少一种气态物质的气体源; 设置在等离子体室内的单匝线圈和耦合到线圈的电源，用于感应耦合射频电力以激发等离子体室中的至少一种气态物质以产生等离子体。 等离子体室的内表面可以不含含金属的材料，并且等离子体可能不暴露于等离子体室内的任何含金属的组分。 等离子体室可以包括用于控制等离子体的多个磁体。 可以在等离子体室中设置出口孔，以使所得到的等离子体的带负电粒子能够接合作为相关离子注入系统的一部分的离子束。 在一个实施例中，磁体设置在孔的相对侧上，并用于操纵等离子体的电子。

公开(公告)号：US20130140987A1

公开(公告)日：2013-06-06

申请号：US13308614

申请日：2011-12-01

Applicant: Chih-Hong Hwang ,  Chun-Lin Chang ,  Nai-Han Cheng ,  Chi-Ming Yang ,  Chin-Hsiang Lin

Inventor： Chih-Hong Hwang ,  Chun-Lin Chang ,  Nai-Han Cheng ,  Chi-Ming Yang ,  Chin-Hsiang Lin

IPC: H01J37/06

CPC classification number: H01J37/026 ,  H01J3/02 ,  H01J3/022 ,  H01J3/26 ,  H01J37/06 ,  H01J37/3171 ,  H01J2237/0041 ,  H01J2237/31705

Abstract: The present disclosure provides for various advantageous methods and apparatus of controlling electron emission. One of the broader forms of the present disclosure involves an electron emission element, comprising an electron emitter including an electron emission region disposed between a gate electrode and a cathode electrode. An anode is disposed above the electron emission region, and a voltage set is disposed above the anode. A first voltage applied between the gate electrode and the cathode electrode controls a quantity of electrons generated from the electron emission region. A second voltage applied to the anode extracts generated electrons. A third voltage applied to the voltage set controls a direction of electrons extracted through the anode.

Abstract translation: 本公开提供了控制电子发射的各种有利的方法和装置。 本公开的更广泛形式之一涉及电子发射元件，其包括电子发射器，其包括设置在栅电极和阴极之间的电子发射区。 阳极设置在电子发射区域的上方，并且在阳极上设置电压组。 施加在栅电极和阴极之间的第一电压控制从电子发射区产生的电子量。 施加到阳极的第二电压提取产生的电子。 施加到电压组的第三电压控制通过阳极提取的电子的方向。

公开(公告)号：US20130113378A1

公开(公告)日：2013-05-09

申请号：US13672871

申请日：2012-11-09

Applicant: E/G ELECTROGRAPH INC.

Inventor： MICHAEL C. VELLA

IPC: H05H1/50

CPC classification number: H05H1/50 ,  H01J37/026 ,  H01J37/3171 ,  H01J2237/0041

Abstract: An ion beam processing system includes a plasma generator with a magnetic flood system. Magnets are provided for reducing the transverse magnetic field in the ion beam transport region of the plasma flood device so as to control charging damage or to neutralize beam space charge in ion beam processing and semiconductor ion implantation. The system is especially adapted for beam lines with ribbon beams.

Abstract translation: 离子束处理系统包括具有磁力洪水系统的等离子体发生器。 提供了用于减小等离子体放电装置的离子束输送区域中的横向磁场的磁体，以便控制充电损坏或者中和离子束处理和半导体离子注入中的束空间电荷。 该系统特别适用于带状光束的光束线。

公开(公告)号：US08399864B2

公开(公告)日：2013-03-19

申请号：US13222536

申请日：2011-08-31

Applicant: Raymond Hill ,  Lawrence Scipioni ,  Colin August Sanford ,  Mark DiManna ,  Michael Tanguay

Inventor： Raymond Hill ,  Lawrence Scipioni ,  Colin August Sanford ,  Mark DiManna ,  Michael Tanguay

IPC: H01J37/26 ,  H01J37/141

CPC classification number: H01J37/141 ,  H01J37/026 ,  H01J37/08 ,  H01J2237/0042 ,  H01J2237/0805 ,  H01J2237/1405 ,  H01J2237/28 ,  H01J2237/317 ,  H01J2237/31749

Abstract: A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.

公开(公告)号：US20130009057A1

公开(公告)日：2013-01-10

申请号：US13580288

申请日：2011-02-09

Applicant: Toshiyuki Yokosuka ,  Minoru Yamazaki ,  Hideyuki Kazumi ,  Kazutami Tago

Inventor： Toshiyuki Yokosuka ,  Minoru Yamazaki ,  Hideyuki Kazumi ,  Kazutami Tago

IPC: H01J37/29

CPC classification number: H01J37/28 ,  H01J37/026 ,  H01J37/266 ,  H01J37/268 ,  H01J2237/0048 ,  H01J2237/24564 ,  H01J2237/2594

Abstract: The present invention has for its object to provide a charged particle beam irradiation method and a charged particle beam apparatus which can suppress unevenness of electrification even when a plurality of different kinds of materials are contained in a pre-dosing area or degrees of density of patterns inside the pre-dosing area differs with positions.To accomplish the above object, a charged particle beam irradiation method and a charged particle beam apparatus are provided according to which the pre-dosing area is divided into a plurality of divisional areas and electrifications are deposited to the plural divisional areas by using a beam under different beam irradiation conditions. With the above construction, the electrifications can be deposited to the pre-dosing area on the basis of such an irradiation condition that the differences in electrification at individual positions inside the pre-dosing area can be suppressed and consequently, an influence an electric field has upon the charged particle beam and electrons given off from the sample can be suppressed.

Abstract translation: 本发明的目的是提供一种带电粒子束照射方法和带电粒子束装置，其即使在预给料区域中包含多种不同种类的材料或图案密度程度时也能抑制通电不均匀性 预给药区域内的位置与位置不同。 为了实现上述目的，提供一种带电粒子束照射方法和带电粒子束装置，根据该装置，预给料区域被分成多个分区，并且通过使用下面的束将电气沉积到多个分区域 不同的束照射条件。 通过上述结构，可以基于这样一种照射条件将电气沉积到预给料区域，即可以抑制预给料区域内各个位置的通电差异，从而影响电场 可以抑制带电粒子束和从样品发出的电子。

公开(公告)号：US08242469B2

公开(公告)日：2012-08-14

申请号：US12835138

申请日：2010-07-13

Applicant: Neil K. Colvin

Inventor： Neil K. Colvin

IPC: H01J37/317 ,  H01J37/02

CPC classification number: H01J37/3171 ,  H01J3/40 ,  H01J37/026 ,  H01J37/09 ,  H01J2237/0041 ,  H01J2237/022 ,  H01J2237/31705

Abstract: An apparatus is provided for reducing particle contamination in an ion implantation system. The apparatus has an enclosure having an entrance, an exit, and at least one louvered side having a plurality of louvers defined therein. A beamline of the ion implantation system passes through the entrance and exit, wherein the plurality of louvers of the at least one louvered side are configured to mechanically filter an edge of an ion beam traveling along the beamline. The enclosure can have two louvered sides and a louvered top, wherein respective widths of the entrance and exit of the enclosure, when measured perpendicular to the beamline, are generally defined by a position of the two louvered sides with respect to one another. One or more of the louvered sides can be adjustably mounted, wherein the width of one or more of the entrance and exit of the enclosure is controllable.

Abstract translation: 提供了用于减少离子注入系统中的颗粒污染的装置。 该装置具有外壳，其具有入口，出口和至少一个百叶窗，其中限定有多个百叶窗。 离子注入系统的束线通过入口和出口，其中至少一个百叶窗侧的多个百叶窗被配置为机械地过滤沿着束线行进的离子束的边缘。 外壳可以具有两个百叶窗和百叶窗顶部，其中当垂直于束线测量时，外壳的入口和出口的相应宽度通常由两个百叶窗相对于彼此的位置来限定。 一个或多个百叶窗侧面可以可调节地安装，其中外壳的入口和出口中的一个或多个的宽度是可控的。

公开(公告)号：US08218284B2

公开(公告)日：2012-07-10

申请号：US12179560

申请日：2008-07-24

Applicant: Zhong-Wei Chen ,  Yi Xiang Wang ,  Juying Dou

Inventor： Zhong-Wei Chen ,  Yi Xiang Wang ,  Juying Dou

IPC: H01L21/683 ,  B23B31/28

CPC classification number: H01J37/026 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/20 ,  H01J37/3174 ,  H01J2237/0044 ,  H01J2237/2817 ,  Y10T279/17923 ,  Y10T279/23

Abstract: An apparatus for increasing electric conductivity to a wafer substrate when exposures to electron beam irradiation is disclosed. More specifically, a more free mechanical contact between a wafer and electric contact pins (within an electrostatic chuck) is provided to significantly reduce the scratch and damage on the wafer backside.

Abstract translation: 公开了当暴露于电子束照射时增加晶片衬底的导电性的装置。 更具体地，提供晶片和电接触销（在静电卡盘内）之间更自由的机械接触，以显着减少晶片背面的划痕和损伤。

公开(公告)号：US20120085917A1

公开(公告)日：2012-04-12

申请号：US12901198

申请日：2010-10-08

Applicant: Peter F. Kurunczi ,  Victor M. Benveniste ,  Oliver V. Naumovski

Inventor： Peter F. Kurunczi ,  Victor M. Benveniste ,  Oliver V. Naumovski

IPC: H01J1/50 ,  H01J3/14

CPC classification number: H01J37/3211 ,  H01J37/026 ,  H01J37/3171 ,  H01J37/32688 ,  H01J2237/03

Abstract: A device is disclosed for providing an inductively coupled radio frequency plasma flood gun. In one particular exemplary embodiment, the device is a plasma flood gun in an ion implantation system. The plasma flood gun may comprise a plasma chamber having one or more apertures; a gas source capable of supplying at least one gaseous substance to the plasma chamber; a single-turn coil disposed within the plasma chamber, and a power source coupled to the coil for inductively coupling radio frequency electrical power to excite the at least one gaseous substance in the plasma chamber to generate a plasma. The inner surface of the plasma chamber may be free of metal-containing material and the plasma may not be exposed to any metal-containing component within the plasma chamber. The plasma chamber may include a plurality of magnets for controlling the plasma. An exit aperture may be provided in the plasma chamber to enable negatively charged particles of the resulting plasma to engage an ion beam that is part of the associated ion implantation system. In one embodiment, magnets are disposed on opposite sides of the aperture and are used to manipulate the electrons of the plasma.

Abstract translation: 公开了一种用于提供电感耦合的射频等离子体喷枪的装置。 在一个特定的示例性实施例中，该装置是离子注入系统中的等离子体喷枪。 等离子体喷枪可以包括具有一个或多个孔的等离子体室; 能够向所述等离子体室供给至少一种气态物质的气体源; 设置在等离子体室内的单匝线圈和耦合到线圈的电源，用于感应耦合射频电力以激发等离子体室中的至少一种气态物质以产生等离子体。 等离子体室的内表面可以不含含金属的材料，并且等离子体可能不暴露于等离子体室内的任何含金属的组分。 等离子体室可以包括用于控制等离子体的多个磁体。 可以在等离子体室中设置出口孔，以使所得到的等离子体的带负电粒子能够接合作为相关离子注入系统的一部分的离子束。 在一个实施例中，磁体设置在孔的相对侧上，并用于操纵等离子体的电子。

公开(公告)号：US08153966B2

公开(公告)日：2012-04-10

申请号：US12992788

申请日：2009-05-15

Applicant: Noriaki Arai ,  Hideyuki Kazumi

Inventor： Noriaki Arai ,  Hideyuki Kazumi

IPC: H01J37/244

CPC classification number: H01J37/026 ,  H01J3/027 ,  H01J37/04 ,  H01J37/28 ,  H01J2237/0041 ,  H01J2237/0048 ,  H01J2237/30 ,  H01J2237/31749

Abstract: A high-resolution sample image is acquired by eliminating both of charge over an entire sample (global charge) and charge in a local region irradiated with a primary charged particle beam (local charge). An electrode unit (50) according to the present invention is used in a charged particle beam device. The electrode unit (50) includes a plate electrode disposed facing an insulator sample between an objective lens and the sample, and further includes: a first charge-neutralization charged particle beam source which emits a first charged particle beam to eliminate local charge on the sample; and a second charge-neutralization charged particle beam source (25) which emits a second charged particle beam to eliminate global charge on the sample. A first hole (53) through which a primary charged particle beam passes, and a second hole through which the second charged particle beam is emitted are provided in the plate electrode, and the first and second charge-neutralization charged particle beam sources are disposed at such positions as not to interfere with each other. The charged particle beam emitted from the first charge-neutralization charged particle beam source is introduced in the vicinity of the first hole (53).

Abstract translation: 通过在整个样品（全局电荷）上消除电荷并在用初级带电粒子束（局部电荷）照射的局部区域中的电荷获得高分辨率采样图像。 根据本发明的电极单元（50）用于带电粒子束装置。 电极单元（50）包括面对物镜和样品之间的绝缘体样品的平板电极，还包括：第一电荷中和带电粒子束源，其发射第一带电粒子束以消除样品上的局部电荷 ; 以及发射第二带电粒子束以消除样品上的全局电荷的第二电荷中和带电粒子束源（25）。 初级带电粒子束通过的第一孔53和第二带电粒子束发射的第二孔设置在板电极中，第一和第二电荷中和带电粒子束源设置在 这样的位置不会相互干扰。 从第一电荷中和带电粒子束源发射的带电粒子束被引入第一孔（53）附近。

公开(公告)号：US08013311B2

公开(公告)日：2011-09-06

申请号：US12576914

申请日：2009-10-09

Applicant: Raymond Hill ,  Lawrence Scipioni ,  Colin August Sanford ,  Mark DiManna ,  Michael Tanguay

Inventor： Raymond Hill ,  Lawrence Scipioni ,  Colin August Sanford ,  Mark DiManna ,  Michael Tanguay

IPC: H01J37/30 ,  H01J37/26 ,  H01J37/10

CPC classification number: H01J37/141 ,  H01J37/026 ,  H01J37/08 ,  H01J2237/0042 ,  H01J2237/0805 ,  H01J2237/1405 ,  H01J2237/28 ,  H01J2237/317 ,  H01J2237/31749

Abstract: A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.

Abstract translation: 双光束系统包括离子束系统和具有磁性物镜的扫描电子显微镜。 离子束系统适于在存在来自SEM物镜的磁场的情况下最佳地操作，使得物镜在离子束操作期间不被关闭。 可选的二次粒子检测器和可选的电荷中和泛喷枪适于在存在磁场的情况下操作。 磁性物镜被设计成具有恒定的热信号，不管产生的磁场的强度如何，使得当磁场改变时，系统不需要时间稳定。