公开(公告)号：US20130113378A1

公开(公告)日：2013-05-09

申请号：US13672871

申请日：2012-11-09

Applicant: E/G ELECTROGRAPH INC.

Inventor： MICHAEL C. VELLA

IPC: H05H1/50

CPC classification number: H05H1/50 ,  H01J37/026 ,  H01J37/3171 ,  H01J2237/0041

Abstract: An ion beam processing system includes a plasma generator with a magnetic flood system. Magnets are provided for reducing the transverse magnetic field in the ion beam transport region of the plasma flood device so as to control charging damage or to neutralize beam space charge in ion beam processing and semiconductor ion implantation. The system is especially adapted for beam lines with ribbon beams.

Abstract translation: 离子束处理系统包括具有磁力洪水系统的等离子体发生器。 提供了用于减小等离子体放电装置的离子束输送区域中的横向磁场的磁体，以便控制充电损坏或者中和离子束处理和半导体离子注入中的束空间电荷。 该系统特别适用于带状光束的光束线。