公开(公告)号：US11378394B1

公开(公告)日：2022-07-05

申请号：US17119536

申请日：2020-12-11

Applicant: KLA Corporation

Inventor： Yuri Paskover ,  Itay Gdor ,  Yuval Lubashevksy ,  Vladimir Levinski ,  Alexander Volfman ,  Yoram Uziel

IPC: G01B11/27

Abstract: A metrology target is disclosed, in accordance with one or more embodiments of the present disclosure. The metrology target includes a first set of pattern elements having a first pitch, where the first set of pattern elements includes segmented pattern elements. The metrology target includes a second set of pattern elements having a second pitch, where the second set of pattern elements includes segmented pattern elements. The metrology target includes a third set of pattern elements having a third pitch, where the third set of pattern elements includes segmented pattern elements.

公开(公告)号：US20240295827A1

公开(公告)日：2024-09-05

申请号：US17762030

申请日：2022-03-04

Applicant: KLA Corporation

Inventor： Yoel Feler ,  Mark Ghinovker ,  Nir BenDavid ,  Yoram Uziel

IPC: G03F7/00

CPC classification number: G03F7/70633 ,  G03F7/70516 ,  G03F7/70625

Abstract: A method for semiconductor metrology includes depositing first and second film layers on a substrate, patterning the layers to define a first target including a first feature in the first layer and a second feature in the second layer adjacent to the first feature, and a second target on the substrate including a first part, which is identical to the first target, and a second part adjacent to the first part such that the second overlay target has rotational symmetry of 180° around a normal to the substrate. The method further includes capturing and processing a first image of the second target to compute a calibration function based on the first and second parts of the target, and capturing and processing a second image of the first target while applying the calibration function to estimate an overlay error between the first and second film layers at the first location.

公开(公告)号：US20240290643A1

公开(公告)日：2024-08-29

申请号：US18176316

申请日：2023-02-28

Applicant: KLA Corporation

Inventor： Izhar Agam ,  Andrew Hill ,  Yoram Uziel ,  Amnon Manassen ,  Daria Negri

IPC: H01L21/67 ,  H01L21/683

CPC classification number: H01L21/67288 ,  H01L21/6838

Abstract: An oscillating secondary stage in a metrology system. The metrology system includes a primary stage configured for long movement to transport a wafer from a one location to another. A secondary stage coupled to the primary stage holds the wafer is configured to oscillate between the first direction and a second direction. The oscillation of the second stage allows for capturing an image frame of the wafer at a target location while the primary stage is moving.

公开(公告)号：US11967535B2

公开(公告)日：2024-04-23

申请号：US17519512

申请日：2021-11-04

Applicant: KLA CORPORATION

Inventor： Amnon Manassen ,  Vladimir Levinski ,  Ido Dolev ,  Yoram Uziel

IPC: H01L21/66 ,  G03F7/00 ,  H01L23/544

CPC classification number: H01L22/12 ,  G03F7/70633 ,  G03F7/70683 ,  H01L22/30 ,  H01L23/544 ,  H01L2223/54426

Abstract: A product includes a semiconductor substrate, with at least first and second thin-film layers disposed on the substrate and patterned to define a matrix of dies, which are separated by scribe lines and contain active areas circumscribed by the scribe lines. A plurality of overlay targets are formed in the first and second thin-film layers within each of the active areas, each overlay target having dimensions no greater than 10 μm×10 μm in a plane parallel to the substrate. The plurality of overlay targets include a first linear grating formed in the first thin-film layer and having a first grating vector, and a second linear grating formed in the second thin-film layer, in proximity to the first linear grating, and having a second grating vector parallel to the first grating vector.

公开(公告)号：US11933717B2

公开(公告)日：2024-03-19

申请号：US16586504

申请日：2019-09-27

Applicant: KLA Corporation

Inventor： Andrew V. Hill ,  Amnon Manassen ,  Yoram Uziel ,  Yossi Simon ,  Gilad Laredo

IPC: G01N21/17 ,  G01B11/25 ,  G06T7/00

CPC classification number: G01N21/17 ,  G01B11/25 ,  G06T7/0004 ,  G01N2021/1736 ,  G06T2207/30148

Abstract: A metrology system may include a metrology tool to selectively perform metrology measurements in a static mode in which one or more metrology targets on a sample are stationary during a measurement or a scanning mode in which one or more metrology targets are in motion during a measurement, and a controller communicatively coupled to the translation stage and at least one of the one or more detectors. The controller may receive locations of metrology targets on the sample to be inspected, designate the metrology targets for inspection with the static mode or the scanning mode, direct the metrology tool to perform metrology measurements on the metrology targets in the static mode or the scanning mode based on the designation, and generate metrology data for the sample based on the metrology measurements on the metrology targets.

公开(公告)号：US11899375B2

公开(公告)日：2024-02-13

申请号：US17210793

申请日：2021-03-24

Applicant: KLA Corporation

Inventor： Jonathan Madsen ,  Andrei V. Shchegrov ,  Amnon Manassen ,  Andrew V. Hill ,  Yossi Simon ,  Gilad Laredo ,  Yoram Uziel

IPC: G03F7/20 ,  G03F9/00 ,  H01J37/304 ,  H01J37/317 ,  G03F7/00

CPC classification number: G03F7/70633 ,  G03F9/7084 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/31764

Abstract: A multi-column metrology tool may include two or more measurement columns distributed along a column direction, where the two or more measurement columns simultaneously probe two or more measurement regions on a sample including metrology targets. A measurement column may include an illumination sub-system to direct illumination to the sample, a collection sub-system including a collection lens to collect measurement signals from the sample and direct it to one or more detectors, and a column-positioning sub-system to adjust a position of the collection lens. A measurement region of a measurement column may be defined by a field of view of the collection lens and a range of the positioning system in the lateral plane. The tool may further include a sample-positioning sub-system to scan the sample along a scan path different than the column direction to position metrology targets within the measurement regions of the measurement columns for measurements.

公开(公告)号：US20240027919A1

公开(公告)日：2024-01-25

申请号：US18376703

申请日：2023-10-04

Applicant: KLA Corporation

Inventor： Jonathan Madsen ,  Andrei V. Shchegrov ,  Amnon Manassen ,  Andrew V. Hill ,  Yossi Simon ,  Gilad Laredo ,  Yoram Uziel

IPC: G03F7/00 ,  G03F9/00

CPC classification number: G03F7/70633 ,  G03F9/7084 ,  H01J37/3045

Abstract: A multi-column metrology tool may include two or more measurement columns distributed along a column direction, where the two or more measurement columns simultaneously probe two or more measurement regions on a sample including metrology targets. A measurement column may include an illumination sub-system to direct illumination to the sample, a collection sub-system including a collection lens to collect measurement signals from the sample and direct it to one or more detectors, and a column-positioning sub-system to adjust a position of the collection lens. A measurement region of a measurement column may be defined by a field of view of the collection lens and a range of the positioning system in the lateral plane. The tool may further include a sample-positioning sub-system to scan the sample along a scan path different than the column direction to position metrology targets within the measurement regions of the measurement columns for measurements.

公开(公告)号：US11638938B2

公开(公告)日：2023-05-02

申请号：US16682814

申请日：2019-11-13

Applicant: KLA Corporation

Inventor： Mor Azaria ,  Giampietro Bieli ,  Shai Mark ,  Adi Pahima ,  Yoram Uziel

IPC: B08B6/00 ,  H01L21/687 ,  B08B3/08

Abstract: A cleaning assembly is disclosed. The cleaning assembly includes a substrate. One or more patterns are formed on a bottom side of the substrate. One or more structures within the one or more patterns attract one or more particles from a chuck via at least one of electrostatic attraction or mechanical trapping when the substrate is positioned on the chuck.

公开(公告)号：US11637030B2

公开(公告)日：2023-04-25

申请号：US16900039

申请日：2020-06-12

Applicant: KLA Corporation

Inventor： Yoram Uziel ,  Ulrich Pohlmann ,  Frank Laske ,  Nadav Gutman ,  Ariel Hildesheim ,  Aviv Balan

IPC: H01L21/68 ,  H01L21/687 ,  H01L21/67

Abstract: A first x-y translation stage, a second x-y translation stage, and a chuck are disposed in a chamber. The chuck is situated above and coupled to the second x-y translation stage, which is situated above and coupled to the first x-y translation stage. The chuck is configured to support a substrate and to be translated by the first and second x-y stages in x- and y-directions, which are substantially parallel to a surface of the chuck on which the substrate is to be mounted. A first barrier and a second barrier are also disposed in the chamber. The first barrier is coupled to the first x-y translation stage to separate a first zone of the chamber from a second zone of the chamber. The second barrier is coupled to the second x-y translation stage to separate the first zone of the chamber from a third zone of the chamber.

公开(公告)号：US11607716B1

公开(公告)日：2023-03-21

申请号：US17021932

申请日：2020-09-15

Applicant: KLA Corporation

Inventor： Shai Mark ,  Mor Azaria ,  Yoram Uziel ,  Giampietro Bieli ,  Adi Pahima

IPC: B08B6/00 ,  H01L21/683 ,  H01L21/68 ,  B08B15/04 ,  H01L21/687

Abstract: A cleaning assembly may include a chuck. The cleaning assembly may include a plurality of lift pins positioned proximate to the chuck. The plurality of lift pins may be configured to engage a cleaning substrate and translate the cleaning substrate to allow the cleaning substrate to capture one or more particles from the surface of the chuck via at least one of electrostatic attraction or mechanical trapping when the cleaning substrate is positioned in the second position. The cleaning assembly may include a replaceable top skin coupled to the chuck and configured to capture the one or more particles.