公开(公告)号：US11378394B1

公开(公告)日：2022-07-05

申请号：US17119536

申请日：2020-12-11

Applicant: KLA Corporation

Inventor： Yuri Paskover ,  Itay Gdor ,  Yuval Lubashevksy ,  Vladimir Levinski ,  Alexander Volfman ,  Yoram Uziel

IPC: G01B11/27

Abstract: A metrology target is disclosed, in accordance with one or more embodiments of the present disclosure. The metrology target includes a first set of pattern elements having a first pitch, where the first set of pattern elements includes segmented pattern elements. The metrology target includes a second set of pattern elements having a second pitch, where the second set of pattern elements includes segmented pattern elements. The metrology target includes a third set of pattern elements having a third pitch, where the third set of pattern elements includes segmented pattern elements.

公开(公告)号：US20230314344A1

公开(公告)日：2023-10-05

申请号：US17709200

申请日：2022-03-30

Applicant: KLA Corporation

Inventor： Yuri Paskover ,  Itay Gdor ,  Yuval Lubashevsky ,  Vladimir Levinski ,  Alexander Volfman ,  Yoram Uziel ,  Yevgeniy Men

IPC: G01N21/956 ,  G01N21/88 ,  G01N21/47 ,  G01B11/27

CPC classification number: G01N21/956 ,  G01N21/8806 ,  G01N21/4788 ,  G01B11/272 ,  G01B2210/56

Abstract: A system includes an illumination source configured to generate an illumination beam, and a collection sub-system that includes an objective lens, one or more detectors located at a collection pupil plane, a light modulator, and a controller. The light modulator is configured to direct one or more selected portions of measurement light to the one or more detectors. The controller includes one or more processors configured to execute program instructions causing the one or more processors to execute a metrology recipe by: receiving detection signals from the one or more detectors, wherein the detection signals are associated with the one or more selected portions of the measurement light directed to the one or more detectors; and generating an overlay measurement associated with at least two layers of a sample based on the detection signals.

公开(公告)号：US20220187062A1

公开(公告)日：2022-06-16

申请号：US17119536

申请日：2020-12-11

Applicant: KLA Corporation

Inventor： Yuri Paskover ,  Itay Gdor ,  Yuval Lubashevksy ,  Vladimir Levinski ,  Alexander Volfman ,  Yoram Uziel

IPC: G01B11/27

Abstract: A metrology target is disclosed, in accordance with one or more embodiments of the present disclosure. The metrology target includes a first set of pattern elements having a first pitch, where the first set of pattern elements includes segmented pattern elements. The metrology target includes a second set of pattern elements having a second pitch, where the second set of pattern elements includes segmented pattern elements. The metrology target includes a third set of pattern elements having a third pitch, where the third set of pattern elements includes segmented pattern elements.