公开(公告)号：US12105431B2

公开(公告)日：2024-10-01

申请号：US17584335

申请日：2022-01-25

Applicant: KLA Corporation

Inventor： Itay Gdor ,  Yuval Lubashevsky ,  Alon Alexander Volfman ,  Daria Negri ,  Yevgeniy Men ,  Elad Farchi

IPC: G03F7/00 ,  G01N21/21 ,  H01L21/66

CPC classification number: G03F7/70633 ,  G01N21/211 ,  G03F7/706849 ,  H01L22/12

Abstract: Metrology is performed on a semiconductor wafer using a system with an apodizer. A spot is formed on the semiconductor wafer with a diameter from 2 nm to 5 nm. The associated beam of light has a wavelength from 400 nm to 800 nm. Small target measurement can be performed at a range of optical wavelengths.

公开(公告)号：US20230314344A1

公开(公告)日：2023-10-05

申请号：US17709200

申请日：2022-03-30

Applicant: KLA Corporation

Inventor： Yuri Paskover ,  Itay Gdor ,  Yuval Lubashevsky ,  Vladimir Levinski ,  Alexander Volfman ,  Yoram Uziel ,  Yevgeniy Men

IPC: G01N21/956 ,  G01N21/88 ,  G01N21/47 ,  G01B11/27

CPC classification number: G01N21/956 ,  G01N21/8806 ,  G01N21/4788 ,  G01B11/272 ,  G01B2210/56

Abstract: A system includes an illumination source configured to generate an illumination beam, and a collection sub-system that includes an objective lens, one or more detectors located at a collection pupil plane, a light modulator, and a controller. The light modulator is configured to direct one or more selected portions of measurement light to the one or more detectors. The controller includes one or more processors configured to execute program instructions causing the one or more processors to execute a metrology recipe by: receiving detection signals from the one or more detectors, wherein the detection signals are associated with the one or more selected portions of the measurement light directed to the one or more detectors; and generating an overlay measurement associated with at least two layers of a sample based on the detection signals.