Invention Grant
- Patent Title: Annular apodizer for small target overlay measurement
-
Application No.: US17584335Application Date: 2022-01-25
-
Publication No.: US12105431B2Publication Date: 2024-10-01
- Inventor: Itay Gdor , Yuval Lubashevsky , Alon Alexander Volfman , Daria Negri , Yevgeniy Men , Elad Farchi
- Applicant: KLA Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA Corporation
- Current Assignee: KLA Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Hodgson Russ LLP
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G01N21/21 ; H01L21/66
Abstract:
Metrology is performed on a semiconductor wafer using a system with an apodizer. A spot is formed on the semiconductor wafer with a diameter from 2 nm to 5 nm. The associated beam of light has a wavelength from 400 nm to 800 nm. Small target measurement can be performed at a range of optical wavelengths.
Public/Granted literature
- US20230236113A1 ANNULAR APODIZER FOR SMALL TARGET OVERLAY MEASUREMENT Public/Granted day:2023-07-27
Information query
