公开(公告)号：US20240362765A1

公开(公告)日：2024-10-31

申请号：US18438382

申请日：2024-02-09

申请人： KLA Corporation

发明人： Alan Davila ,  Marcus Liesching ,  Sandeep Bhagwat ,  Surya Vanamali ,  Suresh Selvaraj ,  Sravani Desu ,  Ganesh Meenakshisundaram ,  Karthik Purushothaman ,  Ardis Liang

IPC分类号： G06T7/00 ,  G06T7/11

CPC分类号： G06T7/0004 ,  G06T7/11 ,  G06T2207/20081 ,  G06T2207/30148

摘要： Methods and systems for generating information for use in setting up a process performed on a specimen are provided. One method includes clustering dies on a specimen based on colors assigned to the dies responsive to predicted defect densities in the dies determined from measurements performed on the specimen thereby generating initial die clusters. The method also includes analyzing the initial die clusters in location space to determine if any of the initial die clusters contain two or more die clusters. In addition, the method includes designating the initial die clusters that do not contain two or more die clusters and the two or more die clusters contained in any of the initial die clusters as the final die clusters. The method further includes storing information for the final die clusters for use in setting up a process performed on the specimen.

公开(公告)号：US12131959B2

公开(公告)日：2024-10-29

申请号：US17469280

申请日：2021-09-08

申请人： KLA Corporation

发明人： Liran Yerushalmi ,  Daria Negri ,  Ohad Bachar ,  Yossi Simon ,  Amnon Manassen ,  Nir Ben David ,  Yoram Uziel ,  Etay Lavert

IPC分类号： H01L21/66 ,  G05B19/418

CPC分类号： H01L22/12 ,  G05B19/41875 ,  G05B2219/45031

摘要： A system and method for generating a quality parameter value of a semiconductor device wafer (SDW), during fabrication thereof, the method including designating a plurality of measurement site sets (MSSs) on the SDW, each of the MSSs including a first measurement-orientation site (FMS) and a second measurement-orientation site (SMS), the FMS and the SMS being different measurement sites on the SDW, generating a first measurement-orientation quality parameter dataset (FMQPD) by measuring features formed within each the FMS of at least one of the MSSs in a first measurement orientation, generating a second measurement-orientation quality parameter dataset (SMQPD) by measuring features formed within each the SMS of the at least one of the MSSs in a second measurement orientation and generating at least one tool-induced-shift (TIS)-ameliorated quality parameter value (TAQPV), at least partially based on the FMQPD and the SMQPD.

公开(公告)号：US12130612B2

公开(公告)日：2024-10-29

申请号：US17867476

申请日：2022-07-18

申请人： KLA Corporation

发明人： Michael Brain

IPC分类号： G06F15/16 ,  G05B19/418 ,  H04L67/025 ,  H04L67/12

CPC分类号： G05B19/4185 ,  H04L67/025 ,  H04L67/12

摘要： A method is performed at a computer system of a manufacturing tool in a manufacturing facility. The method includes sending a series of frames showing data for the manufacturing tool to a client device for display. The client device is remote from the manufacturing facility. The method further includes receiving, from the client device, an indication of a user interaction with the client device and, in response to the indication, adjusting a bandwidth for one or more frames of the series of frames. Sending the series of frames includes, after receiving the indication, transmitting the one or more frames to the client device for display. The one or more frames are transmitted with the adjusted bandwidth.

公开(公告)号：US20240353352A1

公开(公告)日：2024-10-24

申请号：US18626240

申请日：2024-04-03

申请人： KLA Corporation

发明人： Qiang Zhao ,  Ming Di

IPC分类号： G01N21/95 ,  G01N21/88

CPC分类号： G01N21/9505 ,  G01N21/8806

摘要： Methods and systems for improved detection of defects of interest and measurement of structures buried within complex three dimensional semiconductor structures are described herein. Through-focus scanning optical microscopy (TSOM) using non-linear, second harmonic generation (SHG) light signals emitted from a sample provides interface-selective sensitivity for metrology and inspection of advanced semiconductor structures. A TSOM/SHG system includes a spectral filter to pass collected light at wavelengths corresponding to SHG emission. In some embodiments, a TSOM/SHG system includes an ultrafast, pulsed laser source emitting ultraviolet to near infrared wavelengths to efficiently induce SHG at surface interfaces. The halving of wavelength inherent to SHG enables a doubling of illumination wavelength without penalizing resolution. In a further aspect, a TSOM/SHG measurement system includes an exogenous illumination source, an external electric field source, or both, to induce a DC electric field at one or more interfaces of structures under illumination, thereby enhancing SHG emission.

公开(公告)号：US20240353318A1

公开(公告)日：2024-10-24

申请号：US18419244

申请日：2024-01-22

申请人： KLA Corporation

发明人： Yun Xie ,  Rui-Fang Shi ,  Xin Ye ,  Heng Zhang

IPC分类号： G01N21/21 ,  G01N21/956

CPC分类号： G01N21/21 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/061 ,  G01N2201/0683

摘要： Methods and systems for inspecting a photomask are provided. One system includes an illumination subsystem configured to direct light to the photomask. The system also includes a pupil filter positioned in a path of only the light from the photomask and configured for controlling a polarization of the light in the path by mixing four elements in a Jones matrix for the photomask in a coherent manner. In addition, the system includes a detector configured for detecting the light from the pupil filter and generating output responsive to the detected light. The system further includes a computer subsystem configured for detecting defects on the photomask based on the output.

公开(公告)号：US20240337606A1

公开(公告)日：2024-10-10

申请号：US18624444

申请日：2024-04-02

申请人： KLA Corporation

发明人： Andrew V. Hill ,  Jonathan Madsen ,  Ido Dolev ,  Daria Negri ,  Yuval Lubashevsky

IPC分类号： G01N21/95

CPC分类号： G01N21/9501

摘要： A device may one or more optical elements configured to direct illumination to a sample and collect sample light from the sample in response to the illumination, where at least one of the one or more optical elements include one or more metasurfaces configured to manipulate at least one of the illumination or sample light using sub-wavelength features, where the sub-wavelength features are smaller than at least some wavelengths in at least one of the illumination or the sample light being manipulated, and where the one or more optical elements provide optical power for at least one of focusing the illumination on the sample or collecting the sample light from the sample.

公开(公告)号：US20240337478A1

公开(公告)日：2024-10-10

申请号：US18594707

申请日：2024-03-04

申请人： KLA Corporation

发明人： Yuchi Chen ,  Yicheng Lai

IPC分类号： G01B9/02055 ,  G01B9/02 ,  G01B11/06

CPC分类号： G01B9/0207 ,  G01B9/02041 ,  G01B11/06

摘要： A system includes a laser source and a dual interferometer sub-system. A channel of the dual interferometer sub-system includes a first splitter element coupled to a first output beam from a laser source configured to split the first output beam into a first transmitted beam and a first reflected beam, a first power sensor configured to measure a power of the first transmitted beam, a first detector configured to receive a first interference signal from the dual interferometer sub-system and record a first interferogram frame. The system includes a controller coupled to the first power sensor and the first detector of the first channel of the dual interferometer sub-system configured to receive the first interferogram frame, receive a first laser power measurement from the first power sensor; and normalize an intensity of the first interferogram frame based on the first laser power measurement to produce a first normalized interferogram frame.

公开(公告)号：US12092814B2

公开(公告)日：2024-09-17

申请号：US17574157

申请日：2022-01-12

申请人： KLA Corporation

发明人： Haifeng Huang ,  Rui-Fang Shi ,  Joseph Walsh ,  Mitchell Lindsay ,  Eric Vella

IPC分类号： G02B27/00 ,  G02B27/58

CPC分类号： G02B27/0068 ,  G02B27/58

摘要： An optical system with aberration correction is disclosed. The optical system may include an illumination source. The optical system may include a detector. The optical system may include one or more collection optics configured to image a sample onto the detector based on illumination from the illumination source. The optical system may include two or more aberration correction plates located in one or more pupil planes of the one or more collection optics. The two or more aberration correction plates may provide at least partial correction of two or more linearly-independent aberration terms. Any particular one of the two or more aberration correction plates may have a spatially-varying thickness profile providing a selected amount of correction for a single particular aberration term of the two or more linearly-independent aberration terms.

公开(公告)号：US20240302301A1

公开(公告)日：2024-09-12

申请号：US18416113

申请日：2024-01-18

申请人： KLA Corporation

发明人： Sandeep Inampudi ,  Hyowon Park ,  Daniel Haxton ,  Boxue Chen ,  Sungchul Yoo ,  Robert D. Press

IPC分类号： G01N23/205 ,  G01N23/2055 ,  H01L21/66

CPC分类号： G01N23/205 ,  G01N23/2055 ,  G01N2223/6116 ,  H01L22/12

摘要： Methods and systems for performing measurements of stacked semiconductor structures, e.g., stacked memory and logic structures, based on X-Ray transmission scatterometry measurement data are described herein. In some examples, the scattering response of logic structures is modelled directly in signal space by a mathematical expression including a relatively small number of weighted basis functions. The scattering response of the logic structures and the scattering response of the memory structures determined by an electromagnetic response model are combined, e.g., by summation or convolution. The combined modelled signals are compared to the measured signals at the detector to generate an error signal. The error signal is employed to drive a regression analysis employed to optimize parameter values characterizing the memory structures, values of the weighting coefficients of the signal space model, or both. In other examples, the scattering response of the logic structures is known, and a model is not needed.

公开(公告)号：US12085385B2

公开(公告)日：2024-09-10

申请号：US17524152

申请日：2021-11-11

申请人： KLA Corporation

发明人： Stefan Eyring ,  Frank Laske

IPC分类号： G01B15/04 ,  G01B11/00 ,  G01B11/24

CPC分类号： G01B15/04 ,  G01B11/002 ,  G01B11/24

摘要： A metrology system may receive design data including a layout of fabricated instances of a structure on a sample. The system may further receive detection signals from the metrology tool associated within a field of view including multiple of the fabricated instances of the structure. The system may further generate design-assisted composite data for the structure by combining detection signals from one or more common features of the structure associated with the fabricated instances of the structure within the field of view using the design data. The system may further generate one or more metrology measurements of the structure based on the design-assisted composite data.