- 专利标题: Design-assisted large field of view metrology
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申请号: US17524152申请日: 2021-11-11
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公开(公告)号: US12085385B2公开(公告)日: 2024-09-10
- 发明人: Stefan Eyring , Frank Laske
- 申请人: KLA Corporation
- 申请人地址: US CA Milpitas
- 专利权人: KLA Corporation
- 当前专利权人: KLA Corporation
- 当前专利权人地址: US CA Milpitas
- 代理机构: Suiter Swantz IP
- 主分类号: G01B15/04
- IPC分类号: G01B15/04 ; G01B11/00 ; G01B11/24
摘要:
A metrology system may receive design data including a layout of fabricated instances of a structure on a sample. The system may further receive detection signals from the metrology tool associated within a field of view including multiple of the fabricated instances of the structure. The system may further generate design-assisted composite data for the structure by combining detection signals from one or more common features of the structure associated with the fabricated instances of the structure within the field of view using the design data. The system may further generate one or more metrology measurements of the structure based on the design-assisted composite data.
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