公开(公告)号：US11967535B2

公开(公告)日：2024-04-23

申请号：US17519512

申请日：2021-11-04

Applicant: KLA CORPORATION

Inventor： Amnon Manassen ,  Vladimir Levinski ,  Ido Dolev ,  Yoram Uziel

IPC: H01L21/66 ,  G03F7/00 ,  H01L23/544

CPC classification number: H01L22/12 ,  G03F7/70633 ,  G03F7/70683 ,  H01L22/30 ,  H01L23/544 ,  H01L2223/54426

Abstract: A product includes a semiconductor substrate, with at least first and second thin-film layers disposed on the substrate and patterned to define a matrix of dies, which are separated by scribe lines and contain active areas circumscribed by the scribe lines. A plurality of overlay targets are formed in the first and second thin-film layers within each of the active areas, each overlay target having dimensions no greater than 10 μm×10 μm in a plane parallel to the substrate. The plurality of overlay targets include a first linear grating formed in the first thin-film layer and having a first grating vector, and a second linear grating formed in the second thin-film layer, in proximity to the first linear grating, and having a second grating vector parallel to the first grating vector.

公开(公告)号：US20240337606A1

公开(公告)日：2024-10-10

申请号：US18624444

申请日：2024-04-02

Applicant: KLA Corporation

Inventor： Andrew V. Hill ,  Jonathan Madsen ,  Ido Dolev ,  Daria Negri ,  Yuval Lubashevsky

IPC: G01N21/95

CPC classification number: G01N21/9501

Abstract: A device may one or more optical elements configured to direct illumination to a sample and collect sample light from the sample in response to the illumination, where at least one of the one or more optical elements include one or more metasurfaces configured to manipulate at least one of the illumination or sample light using sub-wavelength features, where the sub-wavelength features are smaller than at least some wavelengths in at least one of the illumination or the sample light being manipulated, and where the one or more optical elements provide optical power for at least one of focusing the illumination on the sample or collecting the sample light from the sample.

公开(公告)号：US20230068016A1

公开(公告)日：2023-03-02

申请号：US17446161

申请日：2021-08-26

Applicant: KLA Corporation

Inventor： Alexander Novikov ,  Amnon Manassen ,  Ido Dolev ,  Yuri Paskover ,  Nir Ben David ,  Yoel Feler ,  Yoram Uziel

IPC: H01L21/66 ,  G01D18/00 ,  G01B21/04

Abstract: A system and method for generating an angular calibration factor (ACF) for a metrology tool useful in a fabrication process, the method including providing the metrology tool, the metrology tool including a stage and a housing, measuring a rotational orientation of the stage relative to the housing and generating the ACF for the stage based at least partially on the rotational orientation.

公开(公告)号：US20250076208A1

公开(公告)日：2025-03-06

申请号：US18822901

申请日：2024-09-03

Applicant: KLA Corporation

Inventor： Amnon Manassen ,  Kevin Peterlinz ,  Andrew V. Hill ,  Shankar Krishnan ,  Yonatan Vaknin ,  Ido Dolev ,  Suryanarayanan Ganesan ,  Chao Chang ,  Jongjin Kim ,  David Zimdars

IPC: G01N21/88 ,  G01N21/95 ,  G01N21/956

Abstract: A metrology system may include a dual frequency comb source providing a first comb beam with a first repetition rate and a second comb beam with a second repetition rate, a beamsplitter to generate one or more dual frequency comb illumination beams from the first comb beam and the second comb beam, and a beam combiner to form a dual frequency comb illumination beam from the first comb beam and the second comb beam. The system may further include an illumination sub-system to illuminate a sample with the dual frequency comb illumination beam through an objective lens, a collection sub-system to collect sample light from the sample with the objective lens, and a detector to capture a radio-frequency signal based on the sample light. The system may further extract spectral measurement data associated with the sample from the radio-frequency signal and generate metrology measurements based on the spectral measurement data.

公开(公告)号：US20250138435A1

公开(公告)日：2025-05-01

申请号：US18383612

申请日：2023-10-25

Applicant: KLA Corporation

Inventor： Jonathan Madsen ,  Ido Dolev ,  Daria Negri ,  Andrew V. Hill ,  Izhar Agam ,  Amnon Manassen ,  Oren Lahav ,  Ohad Bachar ,  Yossi Simon ,  Yoram Uziel

IPC: G03F7/00

Abstract: A measurement system may include two or more sets of optical sub-systems to simultaneously generate measurement data on two or more samples, a coarse translation stage providing motion along a plane, two or more fine translation stages disposed on the coarse translation stage arranged in a common pattern as the two or more sets of optical sub-systems, where each of the fine translation stages provides motion along the plane and is arranged to position one of the two or more samples under one of the two or more sets of optical sub-systems. The system may further include a controller to independently direct each of the fine translation stages and the associated one of the optical sub-systems to generate measurement data for the respective samples, and generate one or more measurements for the samples based on the associated measurement data.

公开(公告)号：US11713959B2

公开(公告)日：2023-08-01

申请号：US17204595

申请日：2021-03-17

Applicant: KLA Corporation

Inventor： Andrei V. Shchegrov ,  Ido Dolev ,  Yoram Uziel ,  Amnon Manassen

IPC: G01B9/02001 ,  G01B11/27

CPC classification number: G01B9/0201 ,  G01B11/272

Abstract: An interferometric overlay tool may include an interferometer and a controller. The interferometer may include one or more beamsplitters to split illumination including one or more wavelengths into a probe beam along a probe path and a reference beam along a reference path, one or more illumination optics to illuminate a grating-over-grating structure with the probe beam, one or more collection optics to collect a measurement beam from the grating-over-grating structure, one or more beam combiners to combine the measurement beam and the reference beam as an interference beam, and a variable phase delay configured to vary an optical path difference (OPD) in the interferometer. The controller may receive one or more interference signals representative of interferometric phase data associated with a plurality of OPD values and the one or more wavelengths from a detector and determine an overlay error of the grating-over-grating structure based on the interferometric phase data.

公开(公告)号：US20220328365A1

公开(公告)日：2022-10-13

申请号：US17519512

申请日：2021-11-04

Applicant: KLA CORPORATION

Inventor： Amnon Manassen ,  Vladimir Levinski ,  Ido Dolev ,  Yoram Uziel

IPC: H01L21/66 ,  H01L23/544

Abstract: A product includes a semiconductor substrate, with at least first and second thin-film layers disposed on the substrate and patterned to define a matrix of dies, which are separated by scribe lines and contain active areas circumscribed by the scribe lines. A plurality of overlay targets are formed in the first and second thin-film layers within each of the active areas, each overlay target having dimensions no greater than 10 μm×10 μm in a plane parallel to the substrate. The plurality of overlay targets include a first linear grating formed in the first thin-film layer and having a first grating vector, and a second linear grating formed in the second thin-film layer, in proximity to the first linear grating, and having a second grating vector parallel to the first grating vector.

公开(公告)号：US20220299308A1

公开(公告)日：2022-09-22

申请号：US17204595

申请日：2021-03-17

Applicant: KLA Corporation

Inventor： Andrei V. Shchegrov ,  Ido Dolev ,  Yoram Uziel ,  Amnon Manassen

IPC: G01B9/02 ,  G01B11/27

Abstract: An interferometric overlay tool may include an interferometer and a controller. The interferometer may include one or more beamsplitters to split illumination including one or more wavelengths into a probe beam along a probe path and a reference beam along a reference path, one or more illumination optics to illuminate a grating-over-grating structure with the probe beam, one or more collection optics to collect a measurement beam from the grating-over-grating structure, one or more beam combiners to combine the measurement beam and the reference beam as an interference beam, and a variable phase delay configured to vary an optical path difference (OPD) in the interferometer. The controller may receive one or more interference signals representative of interferometric phase data associated with a plurality of OPD values and the one or more wavelengths from a detector and determine an overlay error of the grating-over-grating structure based on the interferometric phase data.