公开(公告)号：US20230324809A1

公开(公告)日：2023-10-12

申请号：US17715789

申请日：2022-04-07

Applicant: KLA Corporation

Inventor： Yoram Uziel ,  Ariel Hildesheim ,  Alexander Novikov ,  Amnon Manassen ,  Etay Lavert ,  Ohad Bachar ,  Yoav Grauer

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/70666 ,  G03F7/70775

Abstract: A metrology system includes an imaging system. The imaging system may include an objective lens. The metrology system may include one or more detectors. The metrology system may include an objective positioning stage structurally coupled to the objective lens and configured to adjust a focal plane of at least one of the one or more detectors via movement along an optical axis of the metrology system. The metrology system may include one or more proximity sensors configured to measure lateral positions of a stage element as the objective positioning stage moves along the optical axis. The metrology system may be configured to determine a metrology measurement associated with a target on a sample using the images and lateral positions of the stage element when implementing a metrology recipe.

公开(公告)号：US20230068016A1

公开(公告)日：2023-03-02

申请号：US17446161

申请日：2021-08-26

Applicant: KLA Corporation

Inventor： Alexander Novikov ,  Amnon Manassen ,  Ido Dolev ,  Yuri Paskover ,  Nir Ben David ,  Yoel Feler ,  Yoram Uziel

IPC: H01L21/66 ,  G01D18/00 ,  G01B21/04

Abstract: A system and method for generating an angular calibration factor (ACF) for a metrology tool useful in a fabrication process, the method including providing the metrology tool, the metrology tool including a stage and a housing, measuring a rotational orientation of the stage relative to the housing and generating the ACF for the stage based at least partially on the rotational orientation.