发明公开
- 专利标题: SYSTEM AND METHOD TO REDUCE MEASUREMENT ERROR IN INTERFEROMETRY-BASED METROLOGY
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申请号: US18594707申请日: 2024-03-04
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公开(公告)号: US20240337478A1公开(公告)日: 2024-10-10
- 发明人: Yuchi Chen , Yicheng Lai
- 申请人: KLA Corporation
- 申请人地址: US CA Milpitas
- 专利权人: KLA Corporation
- 当前专利权人: KLA Corporation
- 当前专利权人地址: US CA Milpitas
- 主分类号: G01B9/02055
- IPC分类号: G01B9/02055 ; G01B9/02 ; G01B11/06
摘要:
A system includes a laser source and a dual interferometer sub-system. A channel of the dual interferometer sub-system includes a first splitter element coupled to a first output beam from a laser source configured to split the first output beam into a first transmitted beam and a first reflected beam, a first power sensor configured to measure a power of the first transmitted beam, a first detector configured to receive a first interference signal from the dual interferometer sub-system and record a first interferogram frame. The system includes a controller coupled to the first power sensor and the first detector of the first channel of the dual interferometer sub-system configured to receive the first interferogram frame, receive a first laser power measurement from the first power sensor; and normalize an intensity of the first interferogram frame based on the first laser power measurement to produce a first normalized interferogram frame.
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