公开(公告)号：US20230264234A1

公开(公告)日：2023-08-24

申请号：US18141808

申请日：2023-05-01

Applicant: KLA Corporation

Inventor： Mor Azaria ,  Giampietro Bieli ,  Shai Mark ,  Adi Pahima ,  Yoram Uziel

IPC: B08B6/00 ,  H01L21/687 ,  B08B3/08

CPC classification number: B08B6/00 ,  H01L21/687 ,  B08B3/08

Abstract: A cleaning assembly is disclosed. The cleaning assembly includes a substrate. One or more patterns are formed on a bottom side of the substrate. One or more structures within the one or more patterns attract one or more particles from a chuck via at least one of electrostatic attraction or mechanical trapping when the substrate is positioned on the chuck.

公开(公告)号：US20210074567A1

公开(公告)日：2021-03-11

申请号：US17013213

申请日：2020-09-04

Applicant: KLA Corporation

Inventor： Avner Safrani ,  Shai Mark ,  Amir Aizen ,  Maor Arbit

IPC: H01L21/68 ,  H01L21/687 ,  H01L21/67

Abstract: A teaching substrate is loaded into a load port of an equipment front-end module (EFEM) of a fabrication or inspection tool. The EFEM includes a substrate-handling robot. The teaching substrate includes a plurality of sensors and one or more wireless transceivers. The tool includes a plurality of stations. With the teaching substrate in the EFEM, the substrate-handling robot moves along an initial route and sensor data are wirelessly received from the teaching substrate. Based at least in part on the sensor data, a modified route distinct from the initial route is determined. The substrate-handling robot moves along the modified route, handling the teaching substrate. Based at least in part on the sensor data, positions of the plurality of stations are determined.

公开(公告)号：US12009227B2

公开(公告)日：2024-06-11

申请号：US17735867

申请日：2022-05-03

Applicant: KLA Corporation

Inventor： Shai Mark ,  Adi Pahima

IPC: H01L21/67 ,  B08B6/00 ,  B08B13/00 ,  H01L21/02

CPC classification number: H01L21/67034 ,  B08B6/00 ,  B08B13/00 ,  H01L21/02046

Abstract: A substrate cleaning system include a chamber and a substrate stage positioned within the chamber. The substrate stage is configured to secure a substrate for cleaning with a cleaning head. The substrate cleaning system includes a robot configured to transfer the substrate between a storage receptable and the substrate stage. The cleaning head includes a disposable electrode ribbon loaded on a roller assembly. The disposable electrode ribbon includes a positive electrode and a negative electrode and is configured to electrostatically clean the substrate by electrostatically removing particles from the substrate. The roller assembly is configured to advance the disposable electrode ribbon following cleaning of the substrate.

公开(公告)号：US20240170318A1

公开(公告)日：2024-05-23

申请号：US18424421

申请日：2024-01-26

Applicant: KLA Corporation

Inventor： Avner Safrani ,  Shai Mark ,  Amir Aizen ,  Maor Arbit

IPC: H01L21/68 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01L21/681 ,  H01L21/67259 ,  H01L21/68707

Abstract: A substrate is to be loaded into an equipment front-end module of a fabrication or inspection tool. A first camera is situated on the substrate to image regions to a side of the substrate. A second camera is situated on the substrate to image regions below the substrate. One or more wireless transceivers on the substrate to transmit images captured by the first and second cameras.

公开(公告)号：US11774866B2

公开(公告)日：2023-10-03

申请号：US17446035

申请日：2021-08-26

Applicant: KLA Corporation

Inventor： Avner Safrani ,  Adi Pahima ,  Ron Rudoi ,  Shai Mark

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70825 ,  G03F7/70516 ,  G03F7/70591

Abstract: A reticle inspection system and a method of handling a reticle in a reticle inspection system are provided. The reticle inspection system includes an active reticle carrier and an inspection tool. The reticle is disposed on the active reticle carrier, and the inspection tool is configured to determine an orientation of the reticle when the active reticle carrier is disposed on a reticle stage. The active reticle carrier is movable between a loading station and the reticle stage and is configured to rotate the reticle to reorient the reticle based on the orientation of the reticle while the active carrier is disposed on the reticle stage.

公开(公告)号：US20230119169A1

公开(公告)日：2023-04-20

申请号：US18087395

申请日：2022-12-22

Applicant: KLA Corporation

Inventor： Mor Azarya ,  Michael D. Brain ,  Ami Appelbaum ,  Shai Mark ,  Arie Hoffman

IPC: H01L21/66 ,  H01L21/67 ,  G05B19/418

Abstract: A system for monitoring one or more conditions of an automation system of a semiconductor factory includes one or more instrumented substrates, one or more sealable containers and one or more system servers. The one or more instrumented substrates include one or more sensors. The one or more sensors measure one or more conditions of the one or more instrumented substrates as the one or more sealable containers transport the one or more instrumented substrates through the semiconductor factory. The one or more sealable containers also receive sensor data from the one or more sensors included on the one or more instrumented substrates. The one or more system servers are configured to receive the sensor data from the one or more sealable containers. The one or more servers are configured to identify one or more deviations in the measured one or more conditions.

公开(公告)号：US20220359234A1

公开(公告)日：2022-11-10

申请号：US17735867

申请日：2022-05-03

Applicant: KLA Corporation

Inventor： Shai Mark ,  Adi Pahima

IPC: H01L21/67 ,  B08B6/00 ,  B08B13/00 ,  H01L21/02

Abstract: A substrate cleaning system include a chamber and a substrate stage positioned within the chamber. The substrate stage is configured to secure a substrate for cleaning with a cleaning head. The substrate cleaning system includes a robot configured to transfer the substrate between a storage receptable and the substrate stage. The cleaning head includes a disposable electrode ribbon loaded on a roller assembly. The disposable electrode ribbon includes a positive electrode and a negative electrode and is configured to electrostatically clean the substrate by electrostatically removing particles from the substrate. The roller assembly is configured to advance the disposable electrode ribbon following cleaning of the substrate.

公开(公告)号：US11908722B2

公开(公告)日：2024-02-20

申请号：US17013213

申请日：2020-09-04

Applicant: KLA Corporation

Inventor： Avner Safrani ,  Shai Mark ,  Amir Aizen ,  Maor Arbit

IPC: H01L21/68 ,  H01L21/687 ,  H01L21/67

CPC classification number: H01L21/681 ,  H01L21/67259 ,  H01L21/68707

Abstract: A teaching substrate is loaded into a load port of an equipment front-end module (EFEM) of a fabrication or inspection tool. The EFEM includes a substrate-handling robot. The teaching substrate includes a plurality of sensors and one or more wireless transceivers. The tool includes a plurality of stations. With the teaching substrate in the EFEM, the substrate-handling robot moves along an initial route and sensor data are wirelessly received from the teaching substrate. Based at least in part on the sensor data, a modified route distinct from the initial route is determined. The substrate-handling robot moves along the modified route, handling the teaching substrate. Based at least in part on the sensor data, positions of the plurality of stations are determined.

公开(公告)号：US11638938B2

公开(公告)日：2023-05-02

申请号：US16682814

申请日：2019-11-13

Applicant: KLA Corporation

Inventor： Mor Azaria ,  Giampietro Bieli ,  Shai Mark ,  Adi Pahima ,  Yoram Uziel

IPC: B08B6/00 ,  H01L21/687 ,  B08B3/08

Abstract: A cleaning assembly is disclosed. The cleaning assembly includes a substrate. One or more patterns are formed on a bottom side of the substrate. One or more structures within the one or more patterns attract one or more particles from a chuck via at least one of electrostatic attraction or mechanical trapping when the substrate is positioned on the chuck.

公开(公告)号：US11607716B1

公开(公告)日：2023-03-21

申请号：US17021932

申请日：2020-09-15

Applicant: KLA Corporation

Inventor： Shai Mark ,  Mor Azaria ,  Yoram Uziel ,  Giampietro Bieli ,  Adi Pahima

IPC: B08B6/00 ,  H01L21/683 ,  H01L21/68 ,  B08B15/04 ,  H01L21/687

Abstract: A cleaning assembly may include a chuck. The cleaning assembly may include a plurality of lift pins positioned proximate to the chuck. The plurality of lift pins may be configured to engage a cleaning substrate and translate the cleaning substrate to allow the cleaning substrate to capture one or more particles from the surface of the chuck via at least one of electrostatic attraction or mechanical trapping when the cleaning substrate is positioned in the second position. The cleaning assembly may include a replaceable top skin coupled to the chuck and configured to capture the one or more particles.