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公开(公告)号：US11703767B2
公开(公告)日：2023-07-18
申请号：US17487784
申请日：2021-09-28
Applicant: KLA Corporation
Inventor： Inna Steely-Tarshish , Stefan Eyring , Mark Ghinovker , Yoel Feier , Eitan Hajaj , Ulrich Pohlmann , Nadav Gutman , Chris Steely , Raviv Yohanan , Ira Naot
CPC classification number: G03F7/70633 , G03F7/70683
Abstract: Electron beam overlay targets and method of performing overlay measurements on a target using a semiconductor metrology tool are provided. One target includes a plurality of electron beam overlay elements and a plurality of two-dimensional elements that provide at least one two-dimensional imaging. The plurality of two dimensional elements are an array of evenly-spaced polygonal gratings across at least three rows and at least three columns. Another target includes a plurality of electron beam overlay elements and a plurality of AIMid elements. Each of the electron beam overlay elements includes at least two gratings that are overlaid at a perpendicular orientation to each other. The plurality of AIMid elements includes at least two gratings that are overlaid at a perpendicular orientation to each other.
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公开(公告)号：US20220415725A1
公开(公告)日：2022-12-29
申请号：US17487842
申请日：2021-09-28
Applicant: KLA Corporation
Inventor： Inna Steely-Tarshish , Stefan Eyring , Mark Ghinovker , Yoel Feler , Eitan Hajaj , Ulrich Pohlmann , Nadav Gutman , Chris Steely , Raviv Yohanan , Ira Naot
IPC: H01L21/66 , H01L23/544
Abstract: The present disclosure provides a target and a method of performing overlay measurements on a target. The target includes an array of cells comprising a first cell, a second cell, a third cell, and a fourth cell. Each cell includes a periodic structure with a pitch. The periodic structure includes a first section and a second section, separated by a first gap. The target further includes an electron beam overlay target, such that electron beam overlay measurements, advanced imaging metrology, and/or scatterometry measurements can be performed on the target.
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公开(公告)号：US20220413395A1
公开(公告)日：2022-12-29
申请号：US17487784
申请日：2021-09-28
Applicant: KLA Corporation
Inventor： Inna Steely-Tarshish , Stefan Eyring , Mark Ghinovker , Yoel Feler , Eitan Hajaj , Ulrich Pohlmann , Nadav Gutman , Chris Steely , Raviv Yohanan , Ira Naot
IPC: G03F7/20
Abstract: Electron beam overlay targets and method of performing overlay measurements on a target using a semiconductor metrology tool are provided. One target includes a plurality of electron beam overlay elements and a plurality of two-dimensional elements that provide at least one two-dimensional imaging. The plurality of two dimensional elements are an array of evenly-spaced polygonal gratings across at least three rows and at least three columns. Another target includes a plurality of electron beam overlay elements and a plurality of AIMid elements. Each of the electron beam overlay elements includes at least two gratings that are overlaid at a perpendicular orientation to each other. The plurality of AIMid elements includes at least two gratings that are overlaid at a perpendicular orientation to each other.
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公开(公告)号：US12055859B2
公开(公告)日：2024-08-06
申请号：US18204662
申请日：2023-06-01
Applicant: KLA Corporation
Inventor： Inna Steely-Tarshish , Stefan Eyring , Mark Ghinovker , Yoel Feler , Eitan Hajaj , Ulrich Pohlmann , Nadav Gutman , Chris Steely , Raviv Yohanan , Ira Naot
IPC: G03F7/00
CPC classification number: G03F7/70633 , G03F7/70683
Abstract: Electron beam overlay targets and method of performing overlay measurements on a target using a semiconductor metrology tool are provided. One target includes a plurality of electron beam overlay elements and a plurality of two-dimensional elements that provide at least one two-dimensional imaging. The plurality of two dimensional elements are an array of evenly-spaced polygonal gratings across at least three rows and at least three columns. Another target includes a plurality of electron beam overlay elements and a plurality of AIMid elements. Each of the electron beam overlay elements includes at least two gratings that are overlaid at a perpendicular orientation to each other. The plurality of AIMid elements includes at least two gratings that are overlaid at a perpendicular orientation to each other.
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公开(公告)号：US11720031B2
公开(公告)日：2023-08-08
申请号：US17487725
申请日：2021-09-28
Applicant: KLA Corporation
Inventor： Inna Steely-Tarshish , Stefan Eyring , Mark Ghinovker , Yoel Feler , Eitan Hajaj , Ulrich Pohlmann , Nadav Gutman , Chris Steely , Raviv Yohanan , Ira Naot
CPC classification number: G03F7/70633 , G01N21/4785 , G01N21/4788 , G01N21/9501 , G03F7/70625
Abstract: Combined electron beam overlay and scatterometry overlay targets include first and second periodic structures with gratings. Gratings in the second periodic structure can be positioned under the gratings of the first periodic structure or can be positioned between the gratings of the first periodic structure. These overlay targets can be used in semiconductor manufacturing.
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Patent Agency Ranking
公开(公告)号：US11637030B2
公开(公告)日：2023-04-25
申请号：US16900039
申请日：2020-06-12
Applicant: KLA Corporation
Inventor： Yoram Uziel , Ulrich Pohlmann , Frank Laske , Nadav Gutman , Ariel Hildesheim , Aviv Balan
IPC: H01L21/68 , H01L21/687 , H01L21/67
Abstract: A first x-y translation stage, a second x-y translation stage, and a chuck are disposed in a chamber. The chuck is situated above and coupled to the second x-y translation stage, which is situated above and coupled to the first x-y translation stage. The chuck is configured to support a substrate and to be translated by the first and second x-y stages in x- and y-directions, which are substantially parallel to a surface of the chuck on which the substrate is to be mounted. A first barrier and a second barrier are also disposed in the chamber. The first barrier is coupled to the first x-y translation stage to separate a first zone of the chamber from a second zone of the chamber. The second barrier is coupled to the second x-y translation stage to separate the first zone of the chamber from a third zone of the chamber.
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公开(公告)号：US20210405540A1
公开(公告)日：2021-12-30
申请号：US16916272
申请日：2020-06-30
Applicant: KLA Corporation
Inventor： Henning Stoschus , Stefan Eyring , Ulrich Pohlmann , Inna Steely-Tarshish , Nadav Gutman
Abstract: A metrology system may include a characterization tool configured to generate metrology data for a sample based on the interaction of an illumination beam with the sample, and may also include one or more adjustable measurement parameters to control the generation of metrology data. The metrology system may include one or more processors that may receive design data associated with a plurality of regions of interest for measurement, select individualized measurement parameters of the characterization tool for the plurality of regions of interest, and direct the characterization tool to characterize the plurality of regions of interest based on the individualized measurement parameters.
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公开(公告)号：US11209737B1
公开(公告)日：2021-12-28
申请号：US16916272
申请日：2020-06-30
Applicant: KLA Corporation
Inventor： Henning Stoschus , Stefan Eyring , Ulrich Pohlmann , Inna Steely-Tarshish , Nadav Gutman
Abstract: A metrology system may include a characterization tool configured to generate metrology data for a sample based on the interaction of an illumination beam with the sample, and may also include one or more adjustable measurement parameters to control the generation of metrology data. The metrology system may include one or more processors that may receive design data associated with a plurality of regions of interest for measurement, select individualized measurement parameters of the characterization tool for the plurality of regions of interest, and direct the characterization tool to characterize the plurality of regions of interest based on the individualized measurement parameters.
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公开(公告)号：US11862524B2
公开(公告)日：2024-01-02
申请号：US17487842
申请日：2021-09-28
Applicant: KLA Corporation
Inventor： Inna Steely-Tarshish , Stefan Eyring , Mark Ghinovker , Yoel Feler , Eitan Hajaj , Ulrich Pohlmann , Nadav Gutman , Chris Steely , Raviv Yohanan , Ira Naot
IPC: H01L21/66 , H01L23/544
CPC classification number: H01L22/30 , H01L23/544 , H01L22/12
Abstract: The present disclosure provides a target and a method of performing overlay measurements on a target. The target includes an array of cells comprising a first cell, a second cell, a third cell, and a fourth cell. Each cell includes a periodic structure with a pitch. The periodic structure includes a first section and a second section, separated by a first gap. The target further includes an electron beam overlay target, such that electron beam overlay measurements, advanced imaging metrology, and/or scatterometry measurements can be performed on the target.
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公开(公告)号：US20230324810A1
公开(公告)日：2023-10-12
申请号：US18204662
申请日：2023-06-01
Applicant: KLA Corporation
Inventor： Inna Steely-Tarshish , Stefan Eyring , Mark Ghinovker , Yoel Feler , Eitan Hajaj , Ulrich Pohlmann , Nadav Gutman , Chris Steely , Raviv Yohanan , Ira Naot
IPC: G03F7/20
CPC classification number: G03F7/70633 , G03F7/70683
Abstract: Electron beam overlay targets and method of performing overlay measurements on a target using a semiconductor metrology tool are provided. One target includes a plurality of electron beam overlay elements and a plurality of two-dimensional elements that provide at least one two-dimensional imaging. The plurality of two dimensional elements are an array of evenly-spaced polygonal gratings across at least three rows and at least three columns. Another target includes a plurality of electron beam overlay elements and a plurality of AIMid elements. Each of the electron beam overlay elements includes at least two gratings that are overlaid at a perpendicular orientation to each other. The plurality of AIMid elements includes at least two gratings that are overlaid at a perpendicular orientation to each other.
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