公开(公告)号：US20230045072A1

公开(公告)日：2023-02-09

申请号：US17972292

申请日：2022-10-24

Applicant: KLA CORPORATION

Inventor： Henning Stoschus ,  Stefan Eyring ,  Christopher Sears

IPC: H01J37/304 ,  G01N23/2251 ,  H01J37/22 ,  H01L21/66 ,  G06N20/00

Abstract: Embodiments may include methods, systems, and apparatuses for correcting a response function of an electron beam tool. The correcting may include modulating an electron beam parameter having a frequency; emitting an electron beam based on the electron beam parameter towards a specimen, thereby scattering electrons, wherein the electron beam is described by a source wave function having a source phase and a landing angle; detecting a portion of the scattered electrons at an electron detector, thereby yielding electron data including an electron wave function having an electron phase and an electron landing angle; determining, using a processor, a phase delay between the source phase and the electron phase, thereby yielding a latency; and correcting, using the processor, the response function of the electron beam tool using the latency and a difference between the source wave function and the electron wave function.

公开(公告)号：US11508551B2

公开(公告)日：2022-11-22

申请号：US16691847

申请日：2019-11-22

Applicant: KLA CORPORATION

Inventor： Henning Stoschus ,  Stefan Eyring ,  Christopher Sears

IPC: H01J37/28 ,  H01J37/304 ,  G01N23/2251 ,  H01J37/22 ,  H01L21/66 ,  G06N20/00

Abstract: A detection and correction method for an electron beam system are provided. The method includes emitting an electron beam towards a specimen; modulating a beam current of the electron beam to obtain a beam signal. The method further includes detecting, using an electron detector, secondary and/or backscattered electrons emitted by the specimen to obtain electron data, wherein the electron data defines a detection signal. The method further includes determining, using a processor, a phase shift between the beam signal and the detection signal. The method further includes filtering, using the processor, the detection signal based on the phase shift.

公开(公告)号：US11894214B2

公开(公告)日：2024-02-06

申请号：US17972292

申请日：2022-10-24

Applicant: KLA CORPORATION

Inventor： Henning Stoschus ,  Stefan Eyring ,  Christopher Sears

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/304 ,  G01N23/2251 ,  H01L21/66 ,  G06N20/00

CPC classification number: H01J37/304 ,  G01N23/2251 ,  G06N20/00 ,  H01J37/222 ,  H01L22/12 ,  H01J2237/221 ,  H01J2237/24475

Abstract: Embodiments may include methods, systems, and apparatuses for correcting a response function of an electron beam tool. The correcting may include modulating an electron beam parameter having a frequency; emitting an electron beam based on the electron beam parameter towards a specimen, thereby scattering electrons, wherein the electron beam is described by a source wave function having a source phase and a landing angle; detecting a portion of the scattered electrons at an electron detector, thereby yielding electron data including an electron wave function having an electron phase and an electron landing angle; determining, using a processor, a phase delay between the source phase and the electron phase, thereby yielding a latency; and correcting, using the processor, the response function of the electron beam tool using the latency and a difference between the source wave function and the electron wave function.

公开(公告)号：US20240429017A1

公开(公告)日：2024-12-26

申请号：US18641360

申请日：2024-04-20

Applicant: KLA Corporation

Inventor： Henning Stoschus ,  Jan Lehnert

IPC: H01J37/147 ,  H01J37/28

Abstract: A multichannel electrode tube includes at least four deflection plates. Each of the deflection plates is disposed opposite another of the deflection plates across the path of an electron beam that passes through the multichannel electrode tube. A voltage difference between of a pair of the deflection plates that are arranged opposite each other across the path of the electron beam is determined. A position of the electron beam in the multichannel electrode tube is then determined based on the voltage difference.

公开(公告)号：US20210405540A1

公开(公告)日：2021-12-30

申请号：US16916272

申请日：2020-06-30

Applicant: KLA Corporation

Inventor： Henning Stoschus ,  Stefan Eyring ,  Ulrich Pohlmann ,  Inna Steely-Tarshish ,  Nadav Gutman

IPC: G03F7/20 ,  G06T7/00 ,  G06K9/32

Abstract: A metrology system may include a characterization tool configured to generate metrology data for a sample based on the interaction of an illumination beam with the sample, and may also include one or more adjustable measurement parameters to control the generation of metrology data. The metrology system may include one or more processors that may receive design data associated with a plurality of regions of interest for measurement, select individualized measurement parameters of the characterization tool for the plurality of regions of interest, and direct the characterization tool to characterize the plurality of regions of interest based on the individualized measurement parameters.

公开(公告)号：US11209737B1

公开(公告)日：2021-12-28

申请号：US16916272

申请日：2020-06-30

Applicant: KLA Corporation

Inventor： Henning Stoschus ,  Stefan Eyring ,  Ulrich Pohlmann ,  Inna Steely-Tarshish ,  Nadav Gutman

IPC: G03F7/20 ,  G06K9/32 ,  G06T7/00

Abstract: A metrology system may include a characterization tool configured to generate metrology data for a sample based on the interaction of an illumination beam with the sample, and may also include one or more adjustable measurement parameters to control the generation of metrology data. The metrology system may include one or more processors that may receive design data associated with a plurality of regions of interest for measurement, select individualized measurement parameters of the characterization tool for the plurality of regions of interest, and direct the characterization tool to characterize the plurality of regions of interest based on the individualized measurement parameters.