Multifunctional ultrafast electron gun of transmission electron microscope
    24.
    发明授权
    Multifunctional ultrafast electron gun of transmission electron microscope 有权
    多功能超快电子枪透射电子显微镜

    公开(公告)号:US09558909B2

    公开(公告)日:2017-01-31

    申请号:US14395765

    申请日:2014-05-06

    Abstract: The present invention discloses a multifunctional ultrafast electron gun of a transmission electron microscopy. The ultrafast electron gun of a transmission electron microscope comprises: a laser source, an electron gun body and a laser introducing module. The electron gun body comprises: an electron gun sleeve comprising a first section sleeve and a second section sleeve; and, a cathode, an acceleration electrode and an anode arranged in up-down order, wherein the cathode and the acceleration electrode are located within the first section sleeve and the anode is located within the second section sleeve. The laser introducing module includes an introducing module sleeve sealedly connected between the first section sleeve and the second section sleeve and provided with a laser incoming window in a side thereof; and a laser reflective mirror located in the introducing module sleeve, which is configured to face right the laser incoming window and configured adjacent to a central axis of the introducing module sleeve, and the reflective face of which is configured to make an angle of 45° with the central axis of the introducing module sleeve. The multifunctional ultrafast electron gun of a transmission electron microscopy according to the present invention achieve the best coherence performance of the electrons obtained in the case of the photoelectron emission compared with those in the prior art.

    Abstract translation: 本发明公开了一种透射电子显微镜的多功能超快电子枪。 透射电子显微镜的超快电子枪包括:激光源,电子枪体和激光引入模块。 电子枪主体包括:电子枪套筒,包括第一部分套筒和第二部分套筒; 阴极,加速电极和阳极,其以上下顺序排列,其中阴极和加速电极位于第一部分套筒内,阳极位于第二部分套筒内。 激光引入模块包括密封地连接在第一部分套筒和第二部分套筒之间并在其侧面设置有激光进入窗口的引导模块套筒; 以及位于所述引导模块套筒中的激光反射镜,所述激光反射镜被配置为面对所述激光入射窗口的右侧并且被配置成与所述引入模块套筒的中心轴线相邻,并且其反射面被配置为形成45°的角度 与引入模块套筒的中心轴线。 与现有技术相比,根据本发明的透射电子显微镜的多功能超快电子枪实现了在光电子发射的情况下获得的电子的最佳相干性能。

    Method for making topological insulator structure
    26.
    发明授权
    Method for making topological insulator structure 有权
    拓扑绝缘体结构的制作方法

    公开(公告)号:US09394624B2

    公开(公告)日:2016-07-19

    申请号:US14055853

    申请日:2013-10-16

    CPC classification number: C30B25/186 C30B23/002 C30B23/025 H01L43/14

    Abstract: A method for forming a topological insulator structure is provided. A strontium titanate substrate having a surface (111) is used. The surface (111) of the strontium titanate substrate is cleaned by heat-treating the strontium titanate substrate in the molecular beam epitaxy chamber. The strontium titanate substrate is heated and Bi beam, Sb beam, Cr beam, and Te beam are formed in the molecular beam epitaxy chamber in a controlled ratio achieved by controlling flow rates of the Bi beam, Sb beam, Cr beam, and Te beam. The magnetically doped topological insulator quantum well film is formed on the surface (111) of the strontium titanate substrate. The amount of the hole type charge carriers introduced by the doping with Cr is substantially equal to the amount of the electron type charge carriers introduced by the doping with Bi.

    Abstract translation: 提供一种用于形成拓扑绝缘体结构的方法。 使用具有表面(111)的钛酸锶基材。 钛酸锶基体的表面(111)通过对分子束外延室中的钛酸锶基材进行热处理来清洗。 加热钛酸锶基片,并通过控制Bi光束,Sb光束,Cr光束和Te光束的流速以控制的比例在分子束外延室中形成Bi光束,Sb光束,Cr光束和Te光束。 。 磁性掺杂拓扑绝缘体量子阱膜形成在钛酸锶基体的表面(111)上。 通过掺杂Cr引入的空穴型电荷载流子的量基本上等于通过掺杂Bi引入的电子型电荷载流子的量。

    Method for generating quantized anomalous hall effect
    27.
    发明授权
    Method for generating quantized anomalous hall effect 有权
    量化异常霍尔效应的方法

    公开(公告)号:US09349946B2

    公开(公告)日:2016-05-24

    申请号:US14055846

    申请日:2013-10-16

    CPC classification number: H01L43/14 H01L43/065

    Abstract: A method for generating quantum anomalous Hall effect is provided. A topological insulator quantum well film in 3QL to 5QL is formed on an insulating substrate. The topological insulator quantum well film is doped with a first element and a second element to form the magnetically doped topological insulator quantum well film. The doping of the first element and the second element respectively introduce hole type charge carriers and electron type charge carriers in the magnetically doped topological insulator quantum well film, to decrease the carrier density of the magnetically doped topological insulator quantum well film to be smaller than or equal to 1×1013 cm−2. One of the first element and the second element magnetically dopes the topological insulator quantum well film. An electric field is applied to the magnetically doped topological insulator quantum well film to decrease the carrier density.

    Abstract translation: 提供了一种产生量子异常霍尔效应的方法。 在绝缘基板上形成3QL至5QL中的拓扑绝缘体量子阱膜。 拓扑绝缘体量子阱膜掺杂有第一元素和第二元素以形成磁掺杂拓扑绝缘子量子阱膜。 第一元件和第二元件的掺杂在磁性掺杂拓扑绝缘子量子阱膜中分别引入孔型电荷载流子和电子型电荷载流子,以将磁性掺杂拓扑绝缘体量子阱膜的载流子密度降低到或小于 等于1×1013 cm-2。 第一元素和第二元素之一磁性掺杂拓扑绝缘体量子阱膜。 将电场施加到磁性掺杂拓扑绝缘体量子阱膜以降低载流子密度。

    METHOD FOR GENERATING QUANTIZED ANOMALOUS HALL EFFECT
    28.
    发明申请
    METHOD FOR GENERATING QUANTIZED ANOMALOUS HALL EFFECT 有权
    用于产生定量异常霍尔效应的方法

    公开(公告)号:US20140179026A1

    公开(公告)日:2014-06-26

    申请号:US14055846

    申请日:2013-10-16

    CPC classification number: H01L43/14 H01L43/065

    Abstract: A method for generating quantum anomalous Hall effect is provided. A topological insulator quantum well film in 3QL to 5QL is formed on an insulating substrate. The topological insulator quantum well film is doped with a first element and a second element to form the magnetically doped topological insulator quantum well film. The doping of the first element and the second element respectively introduce hole type charge carriers and electron type charge carriers in the magnetically doped topological insulator quantum well film, to decrease the carrier density of the magnetically doped topological insulator quantum well film to be smaller than or equal to 1×1013cm−2. One of the first element and the second element magnetically dopes the topological insulator quantum well film. An electric field is applied to the magnetically doped topological insulator quantum well film to decrease the carrier density.

    Abstract translation: 提供了一种产生量子异常霍尔效应的方法。 在绝缘基板上形成3QL至5QL中的拓扑绝缘体量子阱膜。 拓扑绝缘体量子阱膜掺杂有第一元素和第二元素以形成磁掺杂拓扑绝缘子量子阱膜。 第一元件和第二元件的掺杂在磁性掺杂拓扑绝缘子量子阱膜中分别引入孔型电荷载流子和电子型电荷载流子,以将磁性掺杂拓扑绝缘子量子阱膜的载流子密度降低到或小于 等于1×1013cm-2。 第一元素和第二元素之一磁性掺杂拓扑绝缘体量子阱膜。 将电场施加到磁性掺杂拓扑绝缘体量子阱膜以降低载流子密度。

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