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    CATHODE OPERATING TEMPERATURE ADJUSTING METHOD, AND WRITING APPARATUS
    12.
    发明申请
    CATHODE OPERATING TEMPERATURE ADJUSTING METHOD, AND WRITING APPARATUS 有权
    阴极操作温度调节方法和书写装置

    公开(公告)号：US20140239200A1

    公开(公告)日：2014-08-28

    申请号：US14186366

    申请日：2014-02-21

    Applicant: NuFlare Technology, Inc

    Inventor： Nobuo MIYAMOTO

    IPC: H01J37/304 ,  H01J37/317

    CPC classification number: H01J37/304 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/06 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0653 ,  H01J2237/24585 ,  H01J2237/30461

    Abstract: A cathode operating temperature adjusting method includes acquiring an approximate equation approximating a correlation between an emission current value in an electron beam source using a cathode and an operating temperature of the cathode at which a bias voltage becomes saturated at the emission current, measuring a current density of an electron beam from the cathode when in the state where an n-th emission current value and an n-th cathode operating temperature are set in the electron beam source, determining whether the measured current density is within a first tolerance range, changing the n-th emission current value to an (n+1)th emission current value when the measured current density is not within the first tolerance range, calculating an operating temperature of the cathode corresponding to the (n+1)th emission current value by the approximate equation, and setting the calculated operating temperature, as an (n+1)th cathode operating temperature, in the electron beam source.

    Abstract translation: 阴极工作温度调节方法包括获取接近于使用阴极的电子束源中的发射电流值与在发射电流下偏置电压饱和的阴极的工作温度之间的相关性的近似方程，测量电流密度 当在电子束源中设置第n个发射电流值和第n个阴极操作温度的状态下，确定所测量的电流密度是否处于第一公差范围内，从而改变阴极的电子束 当测量的电流密度不在第一公差范围内时，将第n发射电流值设置为第（n + 1）个发射电流值，通过以下方式计算与第（n + 1）个发射电流值对应的阴极的工作温度： 近似等式，并将计算出的工作温度设定为电子束源中的第（n + 1）个阴极工作温度。

    Small electron gun
    13.
    发明授权
    Small electron gun 有权
    小电子枪

    公开(公告)号：US08232712B2

    公开(公告)日：2012-07-31

    申请号：US12461195

    申请日：2009-08-04

    Applicant: Soichi Katagiri ,  Takashi Ohshima

    Inventor： Soichi Katagiri ,  Takashi Ohshima

    IPC: G01N23/225

    CPC classification number: H01J37/18 ,  H01J7/16 ,  H01J7/18 ,  H01J37/07 ,  H01J2237/022 ,  H01J2237/062 ,  H01J2237/06316 ,  H01J2237/1825 ,  H01J2237/188

    Abstract: To provide a small electron gun capable of keeping a high vacuum pressure used for an electron microscope and an electron-beam drawing apparatus. An electron gun constituted by a nonevaporative getter pump, a heater, a filament, and an electron-source positioning mechanism is provided with an opening for rough exhausting and its automatically opening/closing valve, and means for ionizing and decomposing an inert gas or a compound gas for the nonevaporative getter pump. It is possible to keep a high vacuum pressure of 10−10 Torr without requiring an ion pump by using a small electron gun having a height and a width of approximately 15 cm while emitting electrons from the electron gun.

    Abstract translation: 提供能够保持用于电子显微镜和电子束拉伸装置的高真空压力的小型电子枪。 由非蒸发式吸气泵，加热器，灯丝和电子源定位机构构成的电子枪设置有用于粗排气的开口及其自动打开/关闭阀，以及用于电离和分解惰性气体或 用于非蒸发吸气泵的复合气体。 通过使用电子枪发射电子的高度和宽度约为15cm的小型电子枪，可以保持10-10托的高真空压力，而不需要离子泵。

    Small electron gun
    14.
    发明申请
    Small electron gun 有权
    小电子枪

    公开(公告)号：US20090289186A1

    公开(公告)日：2009-11-26

    申请号：US12461195

    申请日：2009-08-04

    Applicant: Soichi Katagiri ,  Takashi Ohshima

    Inventor： Soichi Katagiri ,  Takashi Ohshima

    IPC: G01N23/225

    CPC classification number: H01J37/18 ,  H01J7/16 ,  H01J7/18 ,  H01J37/07 ,  H01J2237/022 ,  H01J2237/062 ,  H01J2237/06316 ,  H01J2237/1825 ,  H01J2237/188

    Abstract: To provide a small electron gun capable of keeping a high vacuum pressure used for an electron microscope and an electron-beam drawing apparatus. An electron gun constituted by a nonevaporative getter pump, a heater, a filament, and an electron-source positioning mechanism is provided with an opening for rough exhausting and its automatically opening/closing valve, and means for ionizing and decomposing an inert gas or a compound gas for the nonevaporative getter pump. It is possible to keep a high vacuum pressure of 1010 Torr without requiring an ion pump by using a small electron gun having a height and a width of approximately 15 cm while emitting electrons from the electron gun.

    Abstract translation: 提供能够保持用于电子显微镜和电子束拉伸装置的高真空压力的小型电子枪。 由非蒸发式吸气泵，加热器，灯丝和电子源定位机构构成的电子枪设置有用于粗排气的开口及其自动打开/关闭阀，以及用于电离和分解惰性气体或 用于非蒸发吸气泵的复合气体。 在电子枪发射电子的同时，通过使用高度和宽度约为15cm的小型电子枪，可以保持1010Torr的高真空压力，而不需要离子泵。

    Small electron gun
    15.
    发明授权
    Small electron gun 有权
    小电子枪

    公开(公告)号：US07238939B2

    公开(公告)日：2007-07-03

    申请号：US10873358

    申请日：2004-06-23

    Applicant: Soichi Katagiri ,  Takashi Ohshima

    Inventor： Soichi Katagiri ,  Takashi Ohshima

    IPC: H01J37/18

    CPC classification number: H01J37/18 ,  H01J7/16 ,  H01J7/18 ,  H01J37/07 ,  H01J2237/022 ,  H01J2237/062 ,  H01J2237/06316 ,  H01J2237/1825 ,  H01J2237/188

    Abstract: To provide a small electron gun capable of keeping a high vacuum pressure used for an electron microscope and an electron-beam drawing apparatus. An electron gun constituted by a nonevaporative getter pump, a heater, a filament, and an electron-source positioning mechanism is provided with an opening for rough exhausting and its automatically opening/closing valve, and means for ionizing and decomposing an inert gas or a compound gas for the nonevaporative getter pump. It is possible to keep a high vacuum pressure of 10−10 Torr without requiring an ion pump by using a small electron gun having a height and a width of approximately 15 cm while emitting electrons from the electron gun.

    Abstract translation: 提供能够保持用于电子显微镜和电子束拉伸装置的高真空压力的小型电子枪。 由非蒸发吸气泵，加热器，灯丝和电子源定位机构构成的电子枪设置有用于粗排气的开口及其自动打开/关闭阀，以及用于电离和分解惰性气体或 用于非蒸发吸气泵的复合气体。 通过使用高度和宽度约为15cm的小型电子枪，在从电子枪发射电子的同时，可以保持高10 -10乇的高真空压力，而不需要离子泵。

    Magnetic lens
    17.
    发明授权
    Magnetic lens 有权
    磁性镜片

    公开(公告)号：US06852982B1

    公开(公告)日：2005-02-08

    申请号：US10621103

    申请日：2003-07-14

    Applicant: Martinus Petrus Maria Bierhoff ,  Cornelis Sander Kees Kooijman ,  Colin August Sanford

    Inventor： Martinus Petrus Maria Bierhoff ,  Cornelis Sander Kees Kooijman ,  Colin August Sanford

    IPC: G21K1/093 ,  G21K5/04 ,  H01J37/141 ,  H01J37/21 ,  H01J37/28 ,  H01J37/14

    CPC classification number: H01J37/07 ,  H01J37/141 ,  H01J37/28

    Abstract: In one embodiment of the present invention, a magnetic lens is provided that can generate a substantially constant amount of average heat power over a pre-selected range of resultant magnetic field strengths. The lens is configured to do this with multiple, asymmetric (different turns) coil sections that can produce a desired range of field strengths, and at the same time, maintain a sufficiently constant temperature signature when the average total power is maintained constant thereby eliminating unreasonable delays in lens operation when the resultant field strength is changed. The asymmetric lens structure allows for the smaller coil to be made with less relative inductance thereby making it more responsive and amenable for an AC drive signal and thus dynamic focusing applications if desired. Thus, a magnetic lens is now provided that can produce a range of magnetic beam-focusing field strengths, implement dynamic focusing, and not impose unreasonable delay for thermal stabilization between changes in magnetic field strength.

    Abstract translation: 在本发明的一个实施例中，提供了一种磁性透镜，其能够在所得磁场强度的预选范围内产生基本上恒定的平均热功率。 透镜被配置为用多个不对称（不同匝数）的线圈部分来实现，该线圈部分可以产生期望的场强范围，并且同时在平均总功率保持恒定时保持足够恒定的温度特征，从而消除不合理 当得到的场强改变时，透镜操作的延迟。 非对称透镜结构允许以较小的相对电感制造较小的线圈，从而使其对于AC驱动信号更有反应性和适应性，并且因此如果需要，则动态聚焦应用。 因此，现在提供了可以产生一定范围的磁束聚焦场强的磁透镜，实现动态聚焦，并且不会对磁场强度变化之间的热稳定施加不合理的延迟。

    Electron beam gun for use in an electron beam evaporation source
    18.
    发明授权
    Electron beam gun for use in an electron beam evaporation source 失效
    用于电子束蒸发源的电子束枪

    公开(公告)号：US5182488A

    公开(公告)日：1993-01-26

    申请号：US750363

    申请日：1991-08-27

    Applicant: Russell J. Hill ,  P. A. Joel Smith

    Inventor： Russell J. Hill ,  P. A. Joel Smith

    IPC: H01J37/07 ,  H01J37/305

    CPC classification number: H01J37/07 ,  H01J37/305 ,  Y10S430/143

    Abstract: The present invention provides an electron beam gun for an electron beam evaporation source in which a beam former shields a filament from an anode such that electrons emitted from the filament are accelerated past the anode in a ribbon-like beam. The filament is connected to a split cathode block having two sides for applying an electric current through the filament. The beam former has two sections which are separately connected to the two sides of the cathode block such that the cathode block acts as a heat sink for the beam former, and a thermal gradient is not produced within the beam former that would produce warpage and movement of the beam former. Preferably, the vertical gap is about 0.254 mm. to prevent electrons emitted from the filament from arcing through the gap to the anode.

    Electron beam generating source
    19.
    发明授权
    Electron beam generating source 失效
    电子束生成源

    公开(公告)号：US3808498A

    公开(公告)日：1974-04-30

    申请号：US24689572

    申请日：1972-04-24

    Applicant: JEOL LTD

    Inventor： FUJISAWA M

    IPC: G01Q30/02 ,  H01J3/02 ,  H01J37/06 ,  H01J37/065 ,  H01J37/07 ,  H01J37/24 ,  H01J19/38

    CPC classification number: H01J3/026 ,  H01J37/065 ,  H01J37/07 ,  H01J37/241

    Abstract: This specification discloses an electron beam generating source having a control electrode comprising electrically conductive and nonconductive or slightly conductive layers, said nonconductive or slightly conductive layer facing an anode. The surface of said conductive layer in contact with said nonconductive or slightly conductive layer faces a cathode, thereby preventing electron emission from said contact surface and so by eliminating or almost entirely eliminating micro discharge.

    Abstract translation: 本说明书公开了一种具有控制电极的电子束产生源，该控制电极包括导电和非导电或稍微导电的层，所述非导电或微导电层面向阳极。 与所述非导电或略导电层接触的所述导电层的表面面向阴极，从而防止从所述接触表面发射电子，因此通过消除或几乎完全消除微量放电。

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