摘要:
An electron gun may include a cathode with an emitting surface configured to emit electrons. The cathode may include a through hole that goes through the emitting surface and is configured to allow back-streaming electrons of the emitted electrons to pass through. The electron gun may also include an anode configured to attract the emitted electrons from the cathode to the anode and focus the emitted electrons into an electron beam. The electron gun may also include a grid structure configured to facilitate the focusing of the emitted electrons, the grid structure being positioned corresponding to the through hole.
摘要:
The invention relates to a cathode arrangement comprising: a thermionic cathode comprising an emission portion provided with an emission surface for emitting electrons, and a reservoir for holding a material, wherein the material, when heated, releases work function lowering particles that diffuse towards the emission portion and emanate at the emission surface at a first evaporation rate; a focusing electrode comprising a focusing surface for focusing the electrons emitted from the emission surface of the cathode; and an adjustable heat source configured for keeping the focusing surface at a temperature at which accumulation of work function lowering particles on the focusing surface is prevented.
摘要:
One embodiment relates to an electron beam apparatus which includes a dual-lens electron gun for emitting an electron beam. The electron beam is a high beam-current electron beam in a first operating mode and a low beam-current electron beam in a second operating mode. The apparatus further includes a column aperture which is out of the path of the high beam-current electron beam in the first operating mode and is centered about an optical axis of the electron beam apparatus in the second operating mode. Another embodiment relates to an electron gun which includes a first gun lens, a beam limiting aperture, and a second gun lens. The first gun lens focuses the electrons before they pass through the beam-limiting aperture while the second gun lens focuses the electrons after they pass through the beam-limiting aperture. Other embodiments, aspects and features are also disclosed.
摘要:
One embodiment disclosed relates to an electron source for generating an electron beam. The electron source includes an electron emitter having a tip from which an electron beam is extracted. The electron further includes a non-planar extractor with an extractor opening and a built-in beam-limiting aperture. The extractor opening is larger than the beam-limiting aperture, and central axes of both the extractor opening and the beam-limiting aperture are aligned with the tip along a beam axis. Another embodiment relates to a method of generating an electron beam using an electron source having a non-planar extractor. Another embodiment relates to an array of electron sources for generating an array of electron beams. The array of electron sources includes an array of electron emitters and an array of non-planar extractor structures. Other embodiments, aspects and features are also disclosed.
摘要:
The invention comprises an X-ray tomography method and apparatus used in conjunction with multi-axis charged particle or proton beam radiation therapy of cancerous tumors. In various embodiments, 3-D images are generated from a series of 2-D X-rays images; the X-ray source and detector are stationary while the patient rotates; the 2-D X-ray images are generated using an X-ray source proximate a charged particle beam in a charged particle cancer therapy system; and the X-ray tomography system uses an electron source having a geometry that enhances an electron source lifetime, where the electron source is used in generation of X-rays. The X-ray tomography system is optionally used in conjunction with systems used to both move and constrain movement of the patient, such as semi-vertical, sitting, or laying positioning systems. The X-ray images are optionally used in control of a charged particle cancer therapy system.
摘要:
Disclosed is a pulsed electron beam gun for generating a high current, short duration pulse which is received by a pulse detection circuit. The gun has a gated electron beam emitting area, a beam deflection and sweeping area and a beam pulse detector. Magnetic collimating means having lines of force along an axis in the direction of the electron beam surrounds the aforementioned structure. The magnetic collimating means intensifies the density and strength of the electron beam once it is emitted from its source of emission and is gated through the electron gate. A conventional pulse source delivers a low voltage pulse and a delayed pulse. The internal impedance of the pulse source is matched at the location of the electron gun where the pulses are applied to the electron gun components. The first pulse, at the beam gate, causes a short burst of electrons to be emitted. The delayed pulse is applied to the deflection means to sweep the electron beam symmetrically across the electron passing aperture in the plate.
摘要:
Apparatus for focussing the beam of a particle accelerator. A resistive chain is connected across the high voltage source for the accelerator. This chain includes, inter alia, a potentiometer chain for supplying varying potentials to the accelerating electrodes on a pair of fixed resistors for supplying potential to the anode of the electron gun. The beam injection system includes two pairs of deflection plates which receive potential from two ganged pairs of potentiometers wired in parallel across the pair of fixed resistors.
摘要:
A plurality of strip filaments provide a source of electrons. A deflector electrode in the form of a flat dish is placed behind the filaments, and director electrodes which may be in the form of wire meshes, are placed forward of the filaments in the direction in which the electron flow is desired. Additional electrodes which may be in the form of narrow plates are placed along the ends of the filaments to compensate for fall-off in emission at the filament extremities. The various electrodes are positioned relative to the filaments and have potentials applied thereto such that the uniform distribution of electrons is provided over a predetermined area throughout which electron flow is desired.
摘要:
A laminar flow electron gun for forming an electron beam including a cathode for emitting electrons, an apertured dishshaped electrode surrounding the cathode surface and an anode spaced from said cathode and electrode and cooperating therewith to provide a substantially uniform electric field at the surface of said cathode to cause electrons to emit normally from the entire surface in a beam, said anode also forming a divergent electrostatic lens along the path of the beam and accelerating and focusing means disposed further along the path of the beam to accelerate and focus the beam at a target.
摘要:
An electron gun for a post-acceleration picture tube comprises a first electrode to which a low voltage is applied, a second electrode to which a high voltage is applied and a third electrode to which an intermediate voltage is applied. The main lens of the electron gun is composed of the first, second and third electrodes. The electron gun is particularly useful in a post-acceleration shadow-mask type color picture tube.