Invention Grant
US09455112B2 Cathode arrangement, electron gun, and lithography system comprising such electron gun
有权
阴极装置，电子枪和包括这种电子枪的光刻系统
- Patent Title: Cathode arrangement, electron gun, and lithography system comprising such electron gun
- Patent Title (中): 阴极装置，电子枪和包括这种电子枪的光刻系统
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Application No.: US14578525Application Date: 2014-12-22
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Publication No.: US09455112B2Publication Date: 2016-09-27
- Inventor: Laura Dinu-Gürtler , Eric Petrus Hogervorst
- Applicant: MAPPER LITHOGRAPHY IP B.V
- Applicant Address: NL Delft
- Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee Address: NL Delft
- Agency: Hoyng Rock Monegier LLP
- Agent David P. Owen
- Main IPC: H01J29/04
- IPC: H01J29/04 ; H01J1/15 ; G03F7/20 ; H01J37/075 ; H01J37/317 ; H01J1/28 ; H01J3/02
Abstract:
The invention relates to a cathode arrangement comprising: a thermionic cathode comprising an emission portion provided with an emission surface for emitting electrons, and a reservoir for holding a material, wherein the material, when heated, releases work function lowering particles that diffuse towards the emission portion and emanate at the emission surface at a first evaporation rate; a focusing electrode comprising a focusing surface for focusing the electrons emitted from the emission surface of the cathode; and an adjustable heat source configured for keeping the focusing surface at a temperature at which accumulation of work function lowering particles on the focusing surface is prevented.
Public/Granted literature
- US20150187541A1 Cathode arrangement, electron gun, and lithography system comprising such electron gun Public/Granted day:2015-07-02
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