公开(公告)号：US08916837B2

公开(公告)日：2014-12-23

申请号：US14061847

申请日：2013-10-24

Applicant: Mapper Lithography IP B.V.

Inventor： Laura Dinu-Gürtler ,  Willem Henk Urbanus ,  Marco Jan-Jaco Wieland ,  Stijn Willem Herman Karel Steenbrink

IPC: H01J37/147 ,  H01J37/10 ,  G03B27/26 ,  G21K5/04 ,  H01J37/317 ,  H01J37/301 ,  H01J37/16 ,  B82Y10/00 ,  H01J37/09 ,  H01J37/18 ,  B82Y40/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/16 ,  H01J37/18 ,  H01J37/301 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/188

Abstract: A charged particle lithography system for transferring a pattern onto the surface of a target, comprising a source for generating a charged particle beam, a first chamber housing the source, a collimating system for collimating the charged particle beam, a second chamber housing the collimating system, and a first aperture array element for generating a plurality of charged particle subbeams from the collimated charged particle beam.

Abstract translation: 一种用于将图案转印到目标表面上的带电粒子光刻系统，包括用于产生带电粒子束的源，容纳源的第一室，用于准直带电粒子束的准直系统;容纳准直系统的第二室 以及用于从准直带电粒子束产生多个带电粒子子束的第一孔阵列元件。

公开(公告)号：US09455112B2

公开(公告)日：2016-09-27

申请号：US14578525

申请日：2014-12-22

Applicant: MAPPER LITHOGRAPHY IP B.V

Inventor： Laura Dinu-Gürtler ,  Eric Petrus Hogervorst

IPC: H01J29/04 ,  H01J1/15 ,  G03F7/20 ,  H01J37/075 ,  H01J37/317 ,  H01J1/28 ,  H01J3/02

CPC classification number: H01J37/3174 ,  G03F7/70058 ,  H01J1/15 ,  H01J1/28 ,  H01J3/027 ,  H01J3/029 ,  H01J37/075 ,  H01J37/3177 ,  H01J2229/481 ,  H01J2237/061

Abstract: The invention relates to a cathode arrangement comprising: a thermionic cathode comprising an emission portion provided with an emission surface for emitting electrons, and a reservoir for holding a material, wherein the material, when heated, releases work function lowering particles that diffuse towards the emission portion and emanate at the emission surface at a first evaporation rate; a focusing electrode comprising a focusing surface for focusing the electrons emitted from the emission surface of the cathode; and an adjustable heat source configured for keeping the focusing surface at a temperature at which accumulation of work function lowering particles on the focusing surface is prevented.

公开(公告)号：US09466453B2

公开(公告)日：2016-10-11

申请号：US14578533

申请日：2014-12-22

Applicant: MAPPER LITHOGRAPHY IP B.V

Inventor： Laura Dinu-Gürtler ,  Eric Petrus Hogervorst

IPC: H01J1/15 ,  H01J1/28 ,  H01J37/075 ,  H01J37/317 ,  G03F7/20 ,  H01J3/02

CPC classification number: H01J37/3174 ,  G03F7/70058 ,  H01J1/15 ,  H01J1/28 ,  H01J3/027 ,  H01J3/029 ,  H01J37/075 ,  H01J37/3177 ,  H01J2229/481 ,  H01J2237/061

Abstract: The invention relates to a cathode arrangement comprising: a cathode body housing an emission surface for emitting electrons in a longitudinal direction, wherein the emission surface is bounded by an emission perimeter; a focusing electrode at least partially enclosing the cathode body in a transversal direction and comprising an electron transmission aperture for focusing the electrons emitted by the emission surface, wherein the aperture is bounded by an aperture perimeter, wherein the cathode body is moveably arranged within the focusing electrode over a maximum transversal distance from an aligned position, and wherein the aperture perimeter transversally extends over the emission surface and beyond the emission perimeter over an overlap distance that exceeds the maximum transversal distance.