知搜-全球专利检索

  1. Login
  2. Sign Up

Search Results

212 records (took 0.021 seconds)

    ARC CHAMBER WITH MULTIPLE CATHODES FOR AN ION SOURCE
    11.
    发明申请
    ARC CHAMBER WITH MULTIPLE CATHODES FOR AN ION SOURCE 有权
    具有多个阴极的电弧室用于离子源

    公开(公告)号：US20140167614A1

    公开(公告)日：2014-06-19

    申请号：US13719309

    申请日：2012-12-19

    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

    Inventor： Chin-Tsung LIN ,  Hsiao-Yin HSIEH ,  Chi-Hao HUANG ,  Hong-Hsing CHOU ,  Yeh-Chieh WANG

    IPC: H01J37/08 ,  H01J37/317

    CPC classification number: H01J37/08 ,  H01J37/244 ,  H01J37/3171 ,  H01J2237/0203 ,  H01J2237/024 ,  H01J2237/026 ,  H01J2237/08 ,  H01J2237/303 ,  H01J2237/30405

    Abstract: An apparatus for extending the useful life of an ion source, comprising an arc chamber containing a plurality of cathodes to be used sequentially and a plurality of repellers to protect cathodes when not in use. The arc chamber includes an arc chamber housing defining a reaction cavity, gas injection openings, a plurality of cathodes, and at least one repeller element. A method for extending the useful life of an ion source includes providing power to a first cathode of an arc chamber in an ion source, operating the first cathode, detecting a failure or degradation in performance of the first cathode, energizing a second cathode, and continuing operation of the arc chamber with the second cathode.

    Abstract translation: 一种用于延长离子源的使用寿命的装置，包括电弧室，其包含要顺序使用的多个阴极，以及多个防水剂，以在不使用时保护阴极。 电弧室包括限定反应腔的电弧室壳体，气体注入开口，多个阴极和至少一个排斥元件。 用于延长离子源的使用寿命的方法包括向离子源中的电弧室的第一阴极提供电力，操作第一阴极，检测第一阴极的故障或性能下降，激励第二阴极，以及 与第二阴极连续操作电弧室。

    Charged particle beam device
    15.
    发明授权
    Charged particle beam device 有权
    带电粒子束装置

    公开(公告)号：US08610060B2

    公开(公告)日：2013-12-17

    申请号：US13202554

    申请日：2009-10-23

    Applicant: Suyo Asai ,  Tsuyoshi Onishi ,  Toshihide Agemura

    Inventor： Suyo Asai ,  Tsuyoshi Onishi ,  Toshihide Agemura

    IPC: H01J37/31 ,  H01J37/00

    CPC classification number: H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/24455 ,  H01J2237/24475

    Abstract: An object of the present invention is related to detecting of a detection signal at an optimum position in such a case that a sample plane is inclined with respect to a charged particle beam.The present invention is related to a charged particle beam apparatus for irradiating a charged particle beam to a sample, in which a detector is moved to a plurality of desirable positions around the sample so as to optimize positions of the detector. In accordance with the present invention, since it is possible to obtain an optimum detection signal in response to an attitude and a shape of the sample, a highly accurate sample observation, for instance, an SEM observation, an STEM observation, and an FIB observation can be carried out. Moreover, in an FIB-SEM apparatus, it is possible to highly accurately detect an end point of an FIB process.

    Abstract translation: 本发明的目的是在样品平面相对于带电粒子束倾斜的情况下，在最佳位置检测检测信号。 本发明涉及一种用于将带电粒子束照射到样品的带电粒子束装置，其中检测器移动到样品周围的多个期望位置，以便优化检测器的位置。 根据本发明，由于可以根据样品的姿态和形状获得最佳检测信号，所以可以进行高精度的样本观察，例如SEM观察，STEM观察和FIB观察 可以进行 此外，在FIB-SEM装置中，可以高精度地检测FIB处理的终点。

    Cleaning of an extraction aperture of an ion source
    16.
    发明授权
    Cleaning of an extraction aperture of an ion source 有权
    清洁离子源的提取孔

    公开(公告)号：US08455839B2

    公开(公告)日：2013-06-04

    申请号：US12720960

    申请日：2010-03-10

    Applicant: Craig R. Chaney ,  Alexander S. Perel ,  Neil J. Bassom ,  Leo V. Klos

    Inventor： Craig R. Chaney ,  Alexander S. Perel ,  Neil J. Bassom ,  Leo V. Klos

    IPC: H01J37/28 ,  B08B7/00

    CPC classification number: H01J37/08 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/024

    Abstract: An ion source includes an arc chamber housing defining an arc chamber having an extraction aperture, and a wiper. The wiper is positioned within the arc chamber in a parked position and configured to be driven from the parked position to operational positions to clean the extraction aperture. A cleaning sub-assembly for an ion source includes a wiper configured to be positioned within an arc chamber of the ion source when in a parked position and driven from the parked position to operational positions to clean an extraction aperture of the ion source.

    Abstract translation: 离子源包括限定具有提取孔的电弧室的电弧室壳体和擦拭器。 擦拭器位于电弧室内处于停放位置，并且构造成从停放位置驱动到操作位置以清洁提取孔。 用于离子源的清洁子组件包括擦拭器，其构造成当处于停放位置时定位在离子源的电弧室内并且从停放位置驱动到操作位置以清洁离子源的提取孔。

    FLEXIBLE CATHODOLUMINESCENCE DETECTION SYSTEM AND MICROSCOPE EMPLOYING SUCH A SYSTEM
    17.
    发明申请
    FLEXIBLE CATHODOLUMINESCENCE DETECTION SYSTEM AND MICROSCOPE EMPLOYING SUCH A SYSTEM 审中-公开
    柔性阴道发光检测系统和使用这种系统的微阵列

    公开(公告)号：US20130087706A1

    公开(公告)日：2013-04-11

    申请号：US13699975

    申请日：2011-04-29

    Applicant: Mathieu Kociak ,  Luiz Fernando Zagonel ,  Marcel Tence ,  Stefano Mazzucco

    Inventor： Mathieu Kociak ,  Luiz Fernando Zagonel ,  Marcel Tence ,  Stefano Mazzucco

    IPC: H01J37/244

    CPC classification number: H01J37/244 ,  H01J37/023 ,  H01J37/228 ,  H01J37/256 ,  H01J37/26 ,  H01J2237/024 ,  H01J2237/2482

    Abstract: The invention relates to a cathodoluminescence detection system comprising: a collecting optic (112) collecting light radiation (108) from a sample illuminated by a beam of charged particles and reflecting said radiation (108) onto analysis means, said collecting optic (112) being placed in a chamber, called a vacuum chamber, wherein the pressure is below atmospheric pressure; and means (316) for adapting the light radiation, placed downstream of the collecting optic (112) and designed to adapt said light radiation (108) at the inlet of the analysis means. Said system is characterized in that all or part of the adapting means (316) is placed in an environment where the pressure is higher than the pressure in said vacuum chamber.

    Abstract translation: 本发明涉及一种阴极发光检测系统，包括：收集光学元件（112），其从由带电粒子束照射的样品收集光辐射（108），并将所述辐射（108）反射到分析装置上，所述收集光学元件（112） 放置在称为真空室的室中，其中压力低于大气压; 以及用于使放置在聚光镜（112）下游的光辐射的装置（316），并被设计成使分析装置的入口处的所述光辐射（108）适应。 所述系统的特征在于，全部或部分适应装置（316）被置于压力高于所述真空室中的压力的​​环境中。

Patent Agency Ranking