Invention Grant
- Patent Title: Cleaning of an extraction aperture of an ion source
- Patent Title (中): 清洁离子源的提取孔
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Application No.: US12720960Application Date: 2010-03-10
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Publication No.: US08455839B2Publication Date: 2013-06-04
- Inventor: Craig R. Chaney , Alexander S. Perel , Neil J. Bassom , Leo V. Klos
- Applicant: Craig R. Chaney , Alexander S. Perel , Neil J. Bassom , Leo V. Klos
- Applicant Address: US MA Gloucester
- Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee Address: US MA Gloucester
- Main IPC: H01J37/28
- IPC: H01J37/28 ; B08B7/00
Abstract:
An ion source includes an arc chamber housing defining an arc chamber having an extraction aperture, and a wiper. The wiper is positioned within the arc chamber in a parked position and configured to be driven from the parked position to operational positions to clean the extraction aperture. A cleaning sub-assembly for an ion source includes a wiper configured to be positioned within an arc chamber of the ion source when in a parked position and driven from the parked position to operational positions to clean an extraction aperture of the ion source.
Public/Granted literature
- US20110220144A1 CLEANING OF AN EXTRACTION APERTURE OF AN ION SOURCE Public/Granted day:2011-09-15
Information query
