公开(公告)号：US20130082187A1

公开(公告)日：2013-04-04

申请号：US13633468

申请日：2012-10-02

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA

IPC: G21K5/04

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J2237/0213 ,  H01J2237/0435 ,  H01J2237/045

Abstract: A multi charged particle beam writing apparatus according to one aspect of the present invention includes a first aperture member to form multiple beams, a blanker array provided with a plurality of blankers which respectively perform blanking deflection of a corresponding beam in the multiple beams, a first electromagnetic lens and a second electromagnetic lens arranged between the first aperture member and the blanker array, a second aperture member arranged between the first electromagnetic lens and the second electromagnetic lens and at a position of a convergence point of the multiple beams and configured to restrict passage of charged particles deviated from the convergence point, and a third aperture member to block each beam which was deflected to be in a beam off state by the plurality of blankers.

Abstract translation: 根据本发明的一个方面的多带电粒子束写入装置包括形成多个光束的第一孔径构件，设置有分别对多个光束中的对应光束进行消隐偏转的多个消隐器的消隐器阵列，第一 电磁透镜和布置在所述第一孔径构件和所述遮蔽器阵列之间的第二电磁透镜，布置在所述第一电磁透镜和所述第二电磁透镜之间并且在所述多个光束的会聚点的位置处的第二孔径构件， 的带电粒子偏离会聚点，以及第三孔径构件，用于阻挡被多个阻挡器偏转成束束状态的每个束。

公开(公告)号：US20250095951A1

公开(公告)日：2025-03-20

申请号：US18595532

申请日：2024-03-05

Applicant: KABUSHIKI KAISHA TOSHIBA ,  NuFlare Technology, Inc.

Inventor： Kazuyuki HIGASHI ,  Kazumichi TSUMURA ,  Tomohiro SAITO ,  Takashi YODA ,  Munehiro OGASAWARA ,  Kenji HIRAKAWA ,  Masayuki IWASE

IPC: H01J37/147 ,  H01J37/04 ,  H01J37/317 ,  H01L23/00 ,  H01L23/58

Abstract: An electronic component according to an embodiment includes: a first substrate including first through holes, a first substrate surface and a second substrate surface; first electrodes provided on each of the first through holes, and including a first end and a second end; second electrodes provided on each of the first through holes, facing each of the first electrodes, and including a third end facing the first end and a fourth end facing the second end; third electrodes connected to the first end and extending toward the third end; fourth electrodes connected to the second end and extending toward the fourth end; fifth electrodes connected to the third end, provided separately from each of the third electrodes and extending toward the first end; sixth electrodes connected to the fourth end, provided separately from each of the fourth electrodes and extending toward the second end.

公开(公告)号：US20210319974A1

公开(公告)日：2021-10-14

申请号：US17194544

申请日：2021-03-08

Applicant: NuFlare Technology, Inc.

Inventor： Kazuhiko INOUE ,  Masataka SHIRATSUCHI ,  Munehiro OGASAWARA

IPC: H01J37/147 ,  H01J37/153 ,  H01J37/244 ,  H01J37/28

Abstract: A multi-charged particle beam irradiation apparatus includes a forming mechanism to form multiple charged particle beams, a multipole deflector array to individually deflect each beam of the multiple charged particle beams so that a center axis trajectory of each beam of the multiple charged particle beams may not converge in a region of the same plane orthogonal to the direction of a central axis of a trajectory of the multiple charged particle beams, and an electron optical system to irradiate a substrate with the multiple charged particle beams while maintaining a state where the multiple charged particle beams are not converged.

公开(公告)号：US20200266033A1

公开(公告)日：2020-08-20

申请号：US16854405

申请日：2020-04-21

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA

IPC: H01J37/317 ,  H01J37/30 ,  H01J37/06 ,  H01J37/12 ,  H01J37/147

Abstract: A charged particle beam lithography apparatus, includes a plurality of multiple-beam sets, each of which including a plurality of irradiation sources each generating an independent charged particle beam, a plurality of objective deflectors, each arranged for a corresponding charged particle beam, and configured to deflect the corresponding charged particle beam to a desired position on a substrate, and a plurality of electrostatic or electromagnetic lens fields each to focus the corresponding charged particle beam on the target object; a plurality of common deflection amplifiers, arranged for each multiple-beam set, and each of the plurality of common deflection amplifiers being configured to commonly control the plurality of objective deflectors arranged in a same multiple-beam set; a plurality of individual ON/OFF mechanisms configured to individually turn ON/OFF a beam irradiated from each irradiation source; and one or more multiple-beam clusters including the plurality of multiple-beam sets.

公开(公告)号：US20180166248A1

公开(公告)日：2018-06-14

申请号：US15814950

申请日：2017-11-16

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA

IPC: H01J37/04 ,  H01J37/304 ,  H01J37/317

Abstract: A blanking deflector includes a first electrode being plate-like, a second electrode electrically separated from the first electrode, and arranged such that a first space is formed between the first and second electrodes, and a third electrode electrically separated from the first electrode, and arranged such that a second space, sufficiently wider than the first space, is formed between the first and third electrodes, wherein a transmission line, in which the second and third electrodes are electrically connected at, at least, input and output sides, is formed by the first, second, and third electrodes, multi-beams of a charged particle beam are made to pass through the second space between the first and third electrodes, and the multi-beams are deflected for blanking control by a voltage signal applied from the input side to between the first electrode, and a connected group of the second and third electrodes electrically connected.

公开(公告)号：US20160365226A1

公开(公告)日：2016-12-15

申请号：US15183130

申请日：2016-06-15

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA

IPC: H01J37/317

CPC classification number: H01J37/3174 ,  H01J37/3026 ,  H01J2237/31764 ,  H01J2237/31776

Abstract: According to one aspect of the present invention, a charged particle beam lithography method includes forming, such that a shape identical to a first figure pattern obtained using a first charged particle beam having a first resolution can be obtained by superimposing a plurality of second figure patterns, said plurality of second figure patterns that have different widths and are obtained by using a second charged particle beam having a second resolution higher than the first resolution; and performing multiple writing of the plurality of second figure patterns, which are stacked, by using the second charged particle beam.

Abstract translation: 根据本发明的一个方面，一种带电粒子束光刻法包括以下步骤：形成与使用具有第一分辨率的第一带电粒子束获得的第一图形相同的形状，可以通过将多个第二图形 所述多个第二图形图形具有不同的宽度，并且通过使用具有比第一分辨率高的第二分辨率的第二带电粒子束获得; 以及通过使用所述第二带电粒子束来进行堆叠的所述多个第二图形图案的多次写入。

公开(公告)号：US20150340196A1

公开(公告)日：2015-11-26

申请号：US14699216

申请日：2015-04-29

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO ,  Munehiro OGASAWARA ,  Ryoichi YOSHIKAWA

IPC: H01J37/147 ,  H01J37/302 ,  H01J37/317 ,  H01J37/20

CPC classification number: H01J37/1471 ,  H01J37/045 ,  H01J37/147 ,  H01J37/20 ,  H01J37/302 ,  H01J37/3026 ,  H01J37/317 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/043 ,  H01J2237/0435 ,  H01J2237/202 ,  H01J2237/20278 ,  H01J2237/20285 ,  H01J2237/20292 ,  H01J2237/304 ,  H01J2237/30483 ,  H01J2237/3175

Abstract: A multi charged particle beam writing method includes, shifting a writing position of each corresponding beam to a next writing position by performing another beam deflection of multi charged particle beams, in addition to the beam deflection for a tracking control, while continuing the beam deflection for the tracking control after the maximum writing time has passed; emitting the each corresponding beam in the “on” state to the next writing position having been shifted of the each corresponding beam, during a corresponding writing time while continuing the tracking control; and returning a tracking position such that a next tracking start position is a former tracking start position where the tracking control was started, by resetting the beam deflection for the tracking control after emitting the each corresponding beam to the next writing position having been shifted at least once of the each corresponding beam while continuing the tracking control.

Abstract translation: 多带电粒子束写入方法包括：除了用于跟踪控制的光束偏转之外，通过执行多带电粒子束的另一束偏转，将每个相应光束的写入位置移位到下一个写入位置，同时继续光束偏转 最大写入时间后的跟踪控制已过; 在相应的写入时间期间，将每个对应的波束处于“接通”状态，并将其发送到已经被移位的每个相应波束的下一个写入位置，同时继续跟踪控制; 并且返回跟踪位置，使得下一个跟踪开始位置是跟踪控制开始的前一个跟踪开始位置，通过在将每个对应的波束发射到至少已经移位的下一个写入位置之后将跟踪控制的光束偏转重置 在每个对应的光束中一次，同时继续跟踪控制。

公开(公告)号：US20240079200A1

公开(公告)日：2024-03-07

申请号：US18505216

申请日：2023-11-09

Applicant: NuFlare Technology, Inc.

Inventor： Kazuhiko INOUE ,  Atsushi ANDO ,  Munehiro OGASAWARA

IPC: H01J37/145 ,  H01J37/244

CPC classification number: H01J37/145 ,  H01J37/244 ,  H01J2237/1508 ,  H01J2237/1516

Abstract: A multi-electron beam image acquiring apparatus includes a stage configured to mount thereon a substrate, an illumination optical system configured to apply multiple primary electron beams to the substrate, a plurality of multipole lenses including at least two stages of multipole lenses, arranged at positions common to a trajectory of the multiple primary electron beams and a trajectory of multiple secondary electron beams which are emitted because the substrate is irradiated with the multiple primary electron beams and each configured to include at least four electrodes and at least four magnetic poles, and a multi-detector configured to detect the multiple secondary electron beams separated from the trajectory of the multiple primary electron beams, wherein one of the plurality of multipole lenses separates the multiple secondary electron beams from the trajectory of the multiple primary electron beams.

公开(公告)号：US20220172919A1

公开(公告)日：2022-06-02

申请号：US17651278

申请日：2022-02-16

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Kazuhiro KISHI ,  Munehiro OGASAWARA

IPC: H01J37/04 ,  H01J37/317

Abstract: A blanking deflector according to an embodiment includes: a first electrode comprising a first insulator, a first material film coating all surfaces of the first insulator and having lower resistance than the first insulator, and a first low-resistance film coating part or all of surfaces of the first material film and having lower resistance than the first material film; and a second electrode comprising a second insulator, a second material film coating all surfaces of the second insulator and having lower resistance than the second insulator, and a second low-resistance film coating part or all of surfaces of the second material film and having lower resistance than the second material film, wherein the blanking deflector controls whether to irradiate a specimen with a charged particle beam by causing the charged particle beam to pass between the first electrode and the second electrode.

公开(公告)号：US20200176216A1

公开(公告)日：2020-06-04

申请号：US16686316

申请日：2019-11-18

Applicant: NuFlare Technology, Inc.

Inventor： Kazuhiko INOUE ,  Atsushi ANDO ,  Munehiro OGASAWARA

IPC: H01J37/145 ,  H01J37/20 ,  H01J37/28

Abstract: Provided is a multiple electron beam inspection apparatus including: an irradiation source irradiating a substrate with multiple electron beams; a stage on which is cable of mounting the substrate; an electromagnetic lens provided between the irradiation source and the stage, the electromagnetic lens generating a lens magnetic field, the multiple electron beams being capable of passing through the lens magnetic field; an electrostatic lens provided in the lens magnetic field, the electrostatic lens including a plurality of through-holes and a plurality of electrodes, the plurality of through-holes having wall surfaces respectively, each of the multiple electron beams being capable of passing through the corresponding each of the plurality of through-holes, each of the plurality of electrodes provided on each of the wall surfaces of the plurality of through-holes, at least one of the through-holes provided apart from a central axis of trajectory of the multiple electron beams having a spiral shape; and a power source connected to the electrodes.