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公开(公告)号：US20150192861A1
公开(公告)日：2015-07-09
申请号：US14419425
申请日：2013-07-30
Applicant: ASML Netherlands B.V.
Inventor： Vadim Yevgenyevich Banine , Arthur Winfried Eduardus Minnaert , Johannus Elisabeth Hubertus Muitjens , Andrei Mikhailovich Yakunin , Luigi Scaccabarozzi , Hans Joerg Mallmann , Kurstat Bal , Carlo Cornelis Maria Luijten , Han-Kwang Nienhuys , Alexander Marinus Arnoldus Huijberts , Paulus Albertus Maria Gasseling , Pedro Julian Rizo Diago , Maarten Van Kampen , Nicolaas Aldegonda Jan Maria Van Aerle
IPC: G03F7/20
CPC classification number: G03F7/70191 , G03F7/70308 , G03F7/70575 , G21K1/10
Abstract: There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.
Abstract translation: 公开了一种设置有光谱纯度滤光器的光刻设备，其可以设置在以下一个或多个位置：（a）在照明系统中，（b）与图案形成装置相邻，辐射束中的静态位置或 固定用于与图案形成装置一起运动，（c）在投影系统中，和（d）邻近衬底台。 光谱纯度滤光片优选为由多晶硅，多层材料，碳纳米管材料或石墨烯形成的膜。 膜可以设置有保护性盖层和/或薄金属透明层。
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公开(公告)号：US20150136324A1
公开(公告)日：2015-05-21
申请号：US14605637
申请日：2015-01-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Sander Frederik WUISTER , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
CPC classification number: B29C43/34 , B29C43/021 , B29C43/58 , B29C2043/025 , B29K2101/12 , B44C1/20 , B82Y10/00 , B82Y40/00 , G03F7/0002
Abstract: In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate.
Abstract translation: 在一个实施例中，提供了压印光刻方法，其包括在衬底的第一区域上提供第一量的可压印介质，当固定时，第一量的可压印介质具有第一蚀刻速率; 以及在所述基板的第二不同区域上提供第二量的可压印介质，所述第二量的可压印介质在固定时具有第二不同的蚀刻速率。
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13.发明申请METHODS OF PROVIDING PATTERNED TEMPLATES FOR SELF-ASSEMBLABLE BLOCK COPOLYMERS FOR USE IN DEVICE LITHOGRAPHY 有权提供用于自组装块式共聚物的图案模式的方法用于器件平台的使用公开(公告)号：US20150034594A1
公开(公告)日：2015-02-05
申请号：US14385047
申请日：2013-03-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Harmeet Singh , Vadim Yevgenyevich Banine , Jozef Maria Finders , Sander Frederik Wuister , Roelof Koole , Emiel Peeters
CPC classification number: G03F7/162 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/038 , G03F7/165 , G03F7/2022 , G03F7/2024 , G03F7/30 , G03F7/40 , H01L21/027
Abstract: A method is disclosed to form a patterned template on a substrate, to direct orientation of a self-assemblable block copolymer. The method involves providing a resist layer of a positive tone resist on the substrate and overexposing the resist with actinic (e.g. UV) radiation by photolithography to expose a continuous region of the resist layer with a sub-resolution unexposed resist portion at the interface between the resist and the substrate. The resist portion remaining at the interface, after removal of the exposed region, provides a basis for a chemical epitaxy template. The method may allow for simple, direct photolithography to form a patterned chemical epitaxy template and optionally include an accurately co-aligned graphoepitaxy feature and/or a substrate alignment feature.
Abstract translation: 公开了一种在基底上形成图案化模板以引导自组装嵌段共聚物的取向的方法。 该方法包括在衬底上提供正色调抗蚀剂的抗蚀剂层，并通过光刻法用光化（例如UV）辐射过度曝光抗蚀剂，以在抗蚀剂层的连接区域之间的界面处暴露抗蚀剂层的亚分辨率未曝光抗蚀剂部分 抗蚀剂和基材。 在除去暴露区域之后残留在界面处的抗蚀剂部分为化学外延模板提供了基础。 该方法可以允许简单的直接光刻以形成图案化的化学外延模板，并且可选地包括精确地共同对准的图案电子特征和/或衬底对准特征。
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公开(公告)号：US10422691B2
公开(公告)日：2019-09-24
申请号：US15549133
申请日：2016-02-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Vadim Yevgenyevich Banine , Willem Jakobus Cornelis Koppert , Han-Kwang Nienhuys , Ruud Martinus Van Der Horst
Abstract: A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.
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公开(公告)号：US10031422B2
公开(公告)日：2018-07-24
申请号：US14438482
申请日：2013-09-23
Applicant: ASML Netherlands B.V.
Abstract: A radiation source for a lithographic apparatus uses a plurality of fiber lasers to ignite a fuel droplet at an ignition location to generate EUV radiation. The fiber lasers may be provided to emit parallel to an optical axis and a telescopic optical system is provided to focus the lasers at the ignition location, or the lasers may be directed towards the optical axis with a final focus lens being used to reduce beam waist. The lasers may be provided in two or more groups to allow them to be independently controlled and some of the lasers may be focused at a different location to provide a pre-pulse. Radiation from fiber lasers may also be combined using dichroic mirrors.
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Patent Agency Ranking
公开(公告)号：US09989844B2
公开(公告)日：2018-06-05
申请号：US15281056
申请日：2016-09-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Lucas Henricus Johannes Stevens , Maarten Van Kampen
IPC: G03F7/20 , G03F1/64 , B82Y10/00 , B82Y40/00 , G02B5/08 , G02B5/20 , G02B27/00 , G03F1/24 , G03F1/62 , G21K1/06 , H01B1/04 , H01B1/24 , G03B27/54 , C01B32/20
CPC classification number: G03F1/64 , B82Y10/00 , B82Y40/00 , C01B32/20 , G02B5/0816 , G02B5/0891 , G02B5/204 , G02B5/208 , G02B27/0006 , G03B27/54 , G03F1/24 , G03F1/62 , G03F7/70058 , G03F7/702 , G03F7/70916 , G03F7/70958 , G03F7/70983 , G21K1/062 , G21K2201/061 , H01B1/04 , H01B1/24
Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
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公开(公告)号：US20170264071A1
公开(公告)日：2017-09-14
申请号：US15600149
申请日：2017-05-19
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich NIKIPELOV , Vadim Yevgenyevich Banine , Pieter Willem Herman De Jager , Gosse Charles De Vries , Olav Waldemar Vladimir Frijns , Leonardus Adrianus Gerardus Grimminck , Andelko Katalenic , Johannes Antonius Gerardus Akkermans , Erik Loopstra , Wouter Joep Engelen , Petrus Rutgerus Bartraij , Teis Johan Coenen , Wilhelmus Patrick Elisabeth Maria Op 'T Root
CPC classification number: H01S3/0903 , H01J1/34 , H05H7/08 , H05H2007/084
Abstract: A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.
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公开(公告)号：US20160195823A1
公开(公告)日：2016-07-07
申请号：US15046284
申请日：2016-02-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Yvonne Wendela KRUIJT-STEGEMAN , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
Abstract: An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.
Abstract translation: 公开了一种压印光刻设备，其包括布置成保持压印模板的压印模板保持器和被配置为测量压印模板的尺寸和/或形状的变化的多个位置传感器，其中位置传感器与 印记模板 还公开了一种光刻方法，其包括使用压印模板将图案印刷到基板上，以及在将图案压印到基板上的同时测量压印模板的尺寸和/或形状的变化。
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公开(公告)号：US09363879B2
公开(公告)日：2016-06-07
申请号：US14532897
申请日：2014-11-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Tjarko Adriaan Rudolf Van Empel , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van de Vijver , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski
CPC classification number: H05G2/008 , G03F7/70175 , G03F7/70891 , G03F7/70916 , G03F7/70983 , H05G2/003 , H05G2/006 , H05K7/2039
Abstract: A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.
Abstract translation: 一种用于产生极紫外辐射源的模块，包括极紫外辐射发射源，该源提供有被配置为将点火材料的流体供应到预定的目标点火位置的供应，以及构造和布置以产生的点火机构 来自点火材料的等离子体在目标点火位置，等离子体发射极紫外线辐射; 收集器镜，构造和布置成将等离子体发射的辐射聚焦在焦点处; 以及散热器，其具有构造和布置成将热能转移离开目标点火位置的热能转向表面，其中散热器位于靠近目标点火位置的位置。
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公开(公告)号：US09278466B2
公开(公告)日：2016-03-08
申请号：US14605637
申请日：2015-01-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
IPC: C03C15/00 , B29C43/34 , B44C1/20 , B82Y10/00 , B82Y40/00 , G03F7/00 , B29C43/02 , B29C43/58 , B29K101/12
CPC classification number: B29C43/34 , B29C43/021 , B29C43/58 , B29C2043/025 , B29K2101/12 , B44C1/20 , B82Y10/00 , B82Y40/00 , G03F7/0002
Abstract: In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate.
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