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    Lithographic apparatus
    1.
    发明授权
    Lithographic apparatus 有权

    公开(公告)号：US10031422B2

    公开(公告)日：2018-07-24

    申请号：US14438482

    申请日：2013-09-23

    Applicant: ASML Netherlands B.V.

    Inventor： Andrey Nikipelov ,  Vadim Yevgenyevich Banine ,  Andrei Mikhailovich Yakunin

    IPC: G03F7/00 ,  G03F7/20 ,  G02B17/08 ,  H05G2/00 ,  G02B17/06

    Abstract: A radiation source for a lithographic apparatus uses a plurality of fiber lasers to ignite a fuel droplet at an ignition location to generate EUV radiation. The fiber lasers may be provided to emit parallel to an optical axis and a telescopic optical system is provided to focus the lasers at the ignition location, or the lasers may be directed towards the optical axis with a final focus lens being used to reduce beam waist. The lasers may be provided in two or more groups to allow them to be independently controlled and some of the lasers may be focused at a different location to provide a pre-pulse. Radiation from fiber lasers may also be combined using dichroic mirrors.

    Method and Apparatus for Generating Radiation
    3.
    发明申请
    Method and Apparatus for Generating Radiation 有权
    用于产生辐射的方法和装置

    公开(公告)号：US20150268559A1

    公开(公告)日：2015-09-24

    申请号：US14439476

    申请日：2013-10-03

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Ramin Badie ,  Vadim Yevgenyevich Banine ,  Johan Frederik Dijksman ,  Antonius Theodorus Wilhelmus Kempen ,  Andrei Mikhailovich Yakunin ,  Hendrikus Robertus Marie Van Greevenbroek ,  Koen Gerhardus Winkels

    IPC: G03F7/20 ,  H05G2/00

    CPC classification number: G03F7/70033 ,  H05G2/003 ,  H05G2/006 ,  H05G2/008

    Abstract: A radiation source (e.g., LPP— laser produced plasma source) for generation of extreme UV (EUV) radiation has at least two fuel particle streams having different trajectories. Each stream is directed to cross the path of an excitation (laser) beam focused at a plasma formation region, but the trajectories are spaced apart at the plasma formation region, and the streams phased, so that only one stream has a fuel particle in the plasma formation region at any time, and so that when a fuel particle from one stream is generating plasma and EUV radiation at the plasma generation region, other fuel particles are sufficiently spaced so as to be substantially unaffected by the plasma. The arrangement permits potential doubling of the radiation intensity achievable for a particular fuel particle size.

    Abstract translation: 用于产生极端UV（EUV）辐射的辐射源（例如，LPP激光产生的等离子体源）具有至少两个具有不同轨迹的燃料粒子流。 每个流被引导以跨过等离子体形成区域聚焦的激发（激光）束的路径，但是轨迹在等离子体形成区域处被间隔开，并且流被相位化，使得仅一条流在 等离子体形成区域，并且使得当来自一个流的燃料粒子在等离子体产生区域产生等离子体和EUV辐射时，其它燃料颗粒被充分间隔开，以致基本上不受等离子体的影响。 该布置允许对于特定燃料粒子尺寸可实现的辐射强度的潜在加倍。

    Radiation source
    6.
    发明授权
    Radiation source 有权

    公开(公告)号：US09860966B2

    公开(公告)日：2018-01-02

    申请号：US14400773

    申请日：2013-04-29

    Applicant: ASML Netherlands B.V.

    Inventor： Jan Bernard Plechelmus Van Schoot ,  Antonius Theodorus Wilhelmus Kempen ,  Hermanus Kreuwel ,  Andrei Mikhailovich Yakunin

    IPC: G03B27/54 ,  H05G2/00 ,  G03F7/20

    CPC classification number: H05G2/008 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/006

    Abstract: A radiation source for generating EUV radiation includes a laser configured to fire laser pulses at a target area to which is supplied a stream of fuel droplets, which may be tin droplets that emit EUV radiation when excited by the laser beam. The EUV radiation is collected by a collector. The tin droplets may be pre-conditioned by a laser pre-pulse before the main laser pulse to change the shape of the droplets so that the droplets are in an optimum condition for receiving the main laser pulse. Embodiments of the invention take into account the effect of the vaporization of one fuel droplet on succeeding droplets and allow the timing of the main and/or pre-pulse to be adjusted to take into account any delay in arrival of the subsequent droplet or oscillations in the shape of the subsequent droplet which may be caused by vaporization of the preceding droplet.

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